A corrosion inhibitor composition is provided. The corrosion inhibitor composition includes a polycationic polymeric surfactant. The polycationic polymeric surfactant is a copolymer including polymerized units of cationic heterocyclic monomer units and dicationic heterocyclic comonomer units including a quaternary ammonium group. The cationic heterocyclic monomer units and the dicationic heterocyclic comonomer units are alkyl diallyl ammonium units. The quaternary ammonium group comprises a first C8-C16 alkyl group, a second C4-C8 alkyl group, a third C1-C2 alkyl group, and a fourth C1-C2 alkyl group. A method of corrosion inhibition is also provided.

A corrosion inhibitor composition is provided. The corrosion inhibitor composition includes a polycationic polymeric surfactant. The polycationic polymeric surfactant is a copolymer including polymerized units of cationic heterocyclic monomer units and dicationic heterocyclic comonomer units including a quaternary ammonium group. The cationic heterocyclic monomer units and the dicationic heterocyclic comonomer units are alkyl diallyl ammonium units. The quaternary ammonium group comprises a first C8-C16 alkyl group, a second C4-C8 alkyl group, a third C1-C2 alkyl group, and a fourth C1-C2 alkyl group. A method of corrosion inhibition is also provided.

Synthesis of guanidinium-based polymers is disclosed. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising guanidinium-based polymers; and water. The use of the synthesized guanidinium-based polymers in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.

Synthesis of guanidinium-based polymers is disclosed. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising guanidinium-based polymers; and water. The use of the synthesized guanidinium-based polymers in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.