The present invention relates to a method for preparing a macromolecular composition comprising indene-derivatives. The invention also relates to the macromolecular compositions per se, and to methods of using the macromolecular compositions. The macromolecular compositions are useful for undergoing subsequent reactions with small molecules.

The present invention relates to a method for preparing a macromolecular composition comprising indene-derivatives. The invention also relates to the macromolecular compositions per se, and to methods of using the macromolecular compositions. The macromolecular compositions are useful for undergoing subsequent reactions with small molecules.

The present invention relates to a method for preparing a macromolecular composition comprising indene-derivatives. The invention also relates to the macromolecular compositions per se, and to methods of using the macromolecular compositions. The macromolecular compositions are useful for undergoing subsequent reactions with small molecules.

A chemically-amplified negative resist composition includes: (A) an acid generator containing an onium salt (s) shown by the following formula(e) (A-1) and/or (A-2); and (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2). Thus, the present invention provides: a chemically-amplified negative resist composition which provides a pattern with high sensitivity, low LWR and CDU, and favorable profile; and a resist patterning process using the composition. ##STR00001##

A chemically-amplified negative resist composition includes: (A) an acid generator containing an onium salt (s) shown by the following formula(e) (A-1) and/or (A-2); and (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2). Thus, the present invention provides: a chemically-amplified negative resist composition which provides a pattern with high sensitivity, low LWR and CDU, and favorable profile; and a resist patterning process using the composition. ##STR00001##

The block copolymer intermediate represented by the following general formula (1) or (2) is used. In the formulae, R.sup.1 and R.sup.7 each independently represent a polymerization initiator residue, R.sup.2 and R.sup.8 each independently represent an aromatic group or an alkyl group, Y.sup.1 represents a polymer block of (meth)acrylic ester: Y.sup.2 represents a polymer block of styrene or a derivative thereof, and m and n each independently represent in an integer from 1 to 5. In the formulae, R.sup.3 represents an alkylene group having 1 to 6 carbon atoms, L represents a linking group, R.sup.4 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or an aromatic group, and R.sup.5 and R.sup.6 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.

##STR00001##

The block copolymer intermediate represented by the following general formula (1) or (2) is used. In the formulae, R.sup.1 and R.sup.7 each independently represent a polymerization initiator residue, R.sup.2 and R.sup.8 each independently represent an aromatic group or an alkyl group, Y.sup.1 represents a polymer block of (meth)acrylic ester: Y.sup.2 represents a polymer block of styrene or a derivative thereof, and m and n each independently represent in an integer from 1 to 5. In the formulae, R.sup.3 represents an alkylene group having 1 to 6 carbon atoms, L represents a linking group, R.sup.4 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or an aromatic group, and R.sup.5 and R.sup.6 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.

##STR00001##

In one aspect, the disclosure relates to the production of alternating polymers of maleic anhydride or an N-substituted maleimide with a stilbene.

In one aspect, the disclosure relates to the production of alternating polymers of maleic anhydride or an N-substituted maleimide with a stilbene.

The present invention is a resist composition comprises a polymer compound having one or two repeating units selected from repeating units represented by the following general formulae (p-1), (p-2) and (p-3), a repeating unit represented by the following formula (a-1) and the formula (a-2) polarities of which are changed by an action of an acid, and a repeating unit represented by the following formula (b-1); a salt represented by the following general formula (B); and a solvent, wherein a difference of a C log P of the repeating unit (a-1) before and after changing the polarity is 3.0 to 4.5, and a difference of a C log P of the repeating unit (a-2) before and after changing the polarity is 2.5 to 3.2. This provides a resist composition which has high sensitivity, wide DOF and high resolution, reduces LER, LWR and CDU, and has good pattern shape after exposure and excellent etching resistance. ##STR00001##