Patent classifications
C08F214/14
ION EXCHANGE MEMBRANE AND METHOD OF MANUFACTURING AN ION EXCHANGE MEMBRANE
A method of manufacturing an anion exchange membrane comprises the following steps: grafting side chains onto a TPE; purifying the grafted TPE; casting the purified grafted TPE; and functionalising the grafted TPE to obtain a cationic moiety. The anion exchange membrane may be used in electrochemical devices including electrolysers, fuel cells or compressors, and is particularly suited to anion exchange membrane electrolysers operating with a dry-cathode.
ION EXCHANGE MEMBRANE AND METHOD OF MANUFACTURING AN ION EXCHANGE MEMBRANE
A method of manufacturing an anion exchange membrane comprises the following steps: grafting side chains onto a TPE; purifying the grafted TPE; casting the purified grafted TPE; and functionalising the grafted TPE to obtain a cationic moiety. The anion exchange membrane may be used in electrochemical devices including electrolysers, fuel cells or compressors, and is particularly suited to anion exchange membrane electrolysers operating with a dry-cathode.
Method of manufacturing patterned substrate
Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.
Method of manufacturing patterned substrate
Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.
Redox active colloidal particles for flow batteries
The invention provides a redox flow battery comprising a microporous or nanoporous size-exclusion membrane, wherein one cell of the battery contains a redox-active colloidal particle dispersed in a non-aqueous solvent. The redox flow battery provides enhanced ionic conductivity across the electrolyte separator and reduced redox-active species crossover, thereby improving the performance and enabling widespread utilization of the battery. Redox active colloidal particles (RACs) were prepared, analyzed, and were found to be highly effective redox species for use in redox flow batteries.
Redox active colloidal particles for flow batteries
The invention provides a redox flow battery comprising a microporous or nanoporous size-exclusion membrane, wherein one cell of the battery contains a redox-active colloidal particle dispersed in a non-aqueous solvent. The redox flow battery provides enhanced ionic conductivity across the electrolyte separator and reduced redox-active species crossover, thereby improving the performance and enabling widespread utilization of the battery. Redox active colloidal particles (RACs) were prepared, analyzed, and were found to be highly effective redox species for use in redox flow batteries.
PHOTORESIST POLYMERS, METHODS OF FORMING PATTERNS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES
A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.
PHOTORESIST POLYMERS, METHODS OF FORMING PATTERNS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES
A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.
Photoresist polymers and methods of forming patterns
A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.
Photoresist polymers and methods of forming patterns
A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.