Provided are a pattern forming method for obtaining a pattern which is excellent in etching resistance and in which occurrence of pattern collapse can be suppressed, and a method for manufacturing an electronic device including the pattern forming method. The pattern forming method includes a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin A having a repeating unit represented by General Formula (I) and a repeating unit represented by General Formula (BII), a step of exposing the film, and a step of developing the exposed film using a developer containing an organic solvent, to form a pattern.

An object of the present invention is to provide a polymer obtained from novel monomers, a composition containing the polymer, an electronic material composition, and an electronic element, the polymer, by being added to the electronic material composition or ink applied for coating film formation, improving the smoothness (leveling property) of a coating film to be obtained without deteriorating a driving stability of the electronic element. With the novel siloxane monomers, the polymer thereof, the composition containing the polymer, and the electronic material composition according to the present invention, it is possible to produce a smooth organic thin film. The electronic element including either of these compositions has a prolonged element lifetime and improved driving stability.

An object of the present invention is to provide a polymer obtained from novel monomers, a composition containing the polymer, an electronic material composition, and an electronic element, the polymer, by being added to the electronic material composition or ink applied for coating film formation, improving the smoothness (leveling property) of a coating film to be obtained without deteriorating a driving stability of the electronic element. With the novel siloxane monomers, the polymer thereof, the composition containing the polymer, and the electronic material composition according to the present invention, it is possible to produce a smooth organic thin film. The electronic element including either of these compositions has a prolonged element lifetime and improved driving stability.

A copolymer including a unit represented by Formula 1 and a unit represented by Formula 2:

##STR00001##

wherein, in Formulae 1 and 2, groups and variables are the same as described in the specification.

A copolymer including a unit represented by Formula 1 and a unit represented by Formula 2:

##STR00001##

wherein, in Formulae 1 and 2, groups and variables are the same as described in the specification.

An optical element material which is obtained by curing a resin composition for photoimprinting containing a photocurable monomer (A) of the formula (1) and a photocurable monomer (B) of the formula (2) in a weight ratio of from 30/70 to 87/13, and containing a photopolymerization initiator (C) in a content of from 0.01 to 30 parts by weight per 100 parts by weight of the total weight of the monomer (A) and the monomer (B), and which has a shrinkage on curing of at most 4.5%, and a method for producing it: ##STR00001## wherein R.sub.1 is CHCH.sub.2, CH.sub.2CH.sub.2OCHCH.sub.2, CH.sub.2C(CH.sub.3) CH.sub.2 or a glycidyl group; R.sub.2 and R.sub.3 are each independently hydrogen or a C.sub.1-4 alkyl group; R.sub.4 and R.sub.5 are each independently OCHCH.sub.2, OCH.sub.2CH.sub.2OCHCH.sub.2, OCOCHCH.sub.2, OCOC(CH.sub.3)CH.sub.2, OCH.sub.2CH.sub.2OCOCHCH.sub.2, OCH.sub.2CH.sub.2OCOC(CH.sub.3)CH.sub.2 or a glycidyl ether group; and R.sub.6 and R.sub.7 are each independently hydrogen or a C.sub.1-4 alkyl group.

An optical element material which is obtained by curing a resin composition for photoimprinting containing a photocurable monomer (A) of the formula (1) and a photocurable monomer (B) of the formula (2) in a weight ratio of from 30/70 to 87/13, and containing a photopolymerization initiator (C) in a content of from 0.01 to 30 parts by weight per 100 parts by weight of the total weight of the monomer (A) and the monomer (B), and which has a shrinkage on curing of at most 4.5%, and a method for producing it: ##STR00001## wherein R.sub.1 is CHCH.sub.2, CH.sub.2CH.sub.2OCHCH.sub.2, CH.sub.2C(CH.sub.3) CH.sub.2 or a glycidyl group; R.sub.2 and R.sub.3 are each independently hydrogen or a C.sub.1-4 alkyl group; R.sub.4 and R.sub.5 are each independently OCHCH.sub.2, OCH.sub.2CH.sub.2OCHCH.sub.2, OCOCHCH.sub.2, OCOC(CH.sub.3)CH.sub.2, OCH.sub.2CH.sub.2OCOCHCH.sub.2, OCH.sub.2CH.sub.2OCOC(CH.sub.3)CH.sub.2 or a glycidyl ether group; and R.sub.6 and R.sub.7 are each independently hydrogen or a C.sub.1-4 alkyl group.

An optical element material which is obtained by curing a resin composition for photoimprinting containing a photocurable monomer (A) of the formula (1) and a photocurable monomer (B) of the formula (2) in a weight ratio of from 30/70 to 87/13, and containing a photopolymerization initiator (C) in a content of from 0.01 to 30 parts by weight per 100 parts by weight of the total weight of the monomer (A) and the monomer (B), and which has a shrinkage on curing of at most 4.5%, and a method for producing it: ##STR00001## wherein R.sub.1 is CHCH.sub.2, CH.sub.2CH.sub.2OCHCH.sub.2, CH.sub.2C(CH.sub.3) CH.sub.2 or a glycidyl group; R.sub.2 and R.sub.3 are each independently hydrogen or a C.sub.1-4 alkyl group; R.sub.4 and R.sub.5 are each independently OCHCH.sub.2, OCH.sub.2CH.sub.2OCHCH.sub.2, OCOCHCH.sub.2, OCOC(CH.sub.3)CH.sub.2, OCH.sub.2CH.sub.2OCOCHCH.sub.2, OCH.sub.2CH.sub.2OCOC(CH.sub.3)CH.sub.2 or a glycidyl ether group; and R.sub.6 and R.sub.7 are each independently hydrogen or a C.sub.1-4 alkyl group.

Systems for fabricating orthodontic appliances are provided. In some embodiments, a system includes a build platform configured to receive a polymerizable composition, the polymerizable composition including a first polymerizable component and a second polymerizable component, the polymerizable composition characterized by an initial ratio of the first polymerizable component to the second polymerizable component. The system can also include a light source configured to form a portion of an orthodontic appliance from the polymerizable composition by: forming a first region by exposing the polymerizable composition to radiation, where the first region includes a first ratio of the first polymerizable component to the second polymerizable component, the first ratio being different from the initial ratio; and forming a second region, where the second region includes a second ratio of the first polymerizable component to the second polymerizable component, the second ratio being different from the initial ratio and the first ratio.

Systems for fabricating orthodontic appliances are provided. In some embodiments, a system includes a build platform configured to receive a polymerizable composition, the polymerizable composition including a first polymerizable component and a second polymerizable component, the polymerizable composition characterized by an initial ratio of the first polymerizable component to the second polymerizable component. The system can also include a light source configured to form a portion of an orthodontic appliance from the polymerizable composition by: forming a first region by exposing the polymerizable composition to radiation, where the first region includes a first ratio of the first polymerizable component to the second polymerizable component, the first ratio being different from the initial ratio; and forming a second region, where the second region includes a second ratio of the first polymerizable component to the second polymerizable component, the second ratio being different from the initial ratio and the first ratio.