A water-based polyurethane resin and a method for manufacturing the same are provided. The method for manufacturing the water-based polyurethane includes: a preparation step of a prepolymer, a dilution step of the prepolymer, a water dispersion and chain extension step, and an acrylic synthesis step. The method further includes mixing polyol and polyisocyanate to obtain a prepolymer, and diluting the prepolymer by adding acrylic monomer in the prepolymer. In the water-based polyurethane resin, at least one of the polyhydric alcohol, polyisocyanate, and the acrylic monomer includes a compound with a cyclic structure.

An anti-fogging and anti-fouling laminate including: a substrate; and an anti-fogging and anti-fouling layer on the substrate, the anti-fogging and anti-fouling layer having a flat surface, wherein a hexadecane contact angle of the anti-fogging and anti-fouling layer is 10° or less, the anti-fogging and anti-fouling layer is a cured product of an active energy ray-curable resin composition, and the active energy ray-curable resin composition includes a hydrophilic monomer.

An anti-fogging and anti-fouling laminate including: a substrate; and an anti-fogging and anti-fouling layer on the substrate, the anti-fogging and anti-fouling layer having a flat surface, wherein a hexadecane contact angle of the anti-fogging and anti-fouling layer is 10° or less, the anti-fogging and anti-fouling layer is a cured product of an active energy ray-curable resin composition, and the active energy ray-curable resin composition includes a hydrophilic monomer.

The present invention discloses a resin composition containing an isocyanurate ring-containing urethane (meth)acrylate compound A, an isocyanurate ring-containing tri(meth)acrylate compound B, and a triazine ultraviolet light absorber C, wherein the isocyanurate ring-containing urethane (meth)acrylate compound A contains a compound A-1 having a specific structure, and the isocyanurate ring-containing tri(meth)acrylate compound B contains a compound B-1 having a specific structure.

The present invention discloses a resin composition containing an isocyanurate ring-containing urethane (meth)acrylate compound A, an isocyanurate ring-containing tri(meth)acrylate compound B, and a triazine ultraviolet light absorber C, wherein the isocyanurate ring-containing urethane (meth)acrylate compound A contains a compound A-1 having a specific structure, and the isocyanurate ring-containing tri(meth)acrylate compound B contains a compound B-1 having a specific structure.

Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

The purpose of the present invention is to provide a coating material composition that is suitable for in-mold coating applications, and is capable of forming a coating film particularly having excellent adhesion properties to materials. This thermosetting coating material composition is for a plastic material and contains a urethane (meth)acrylate (A) having 2-4 polymerizable unsaturated groups and an aliphatic structure, a polymerizable unsaturated compound (B) having one polymerizable unsaturated group per molecule, and a polymerization initiator (C), and is characterized in that the polymerizable unsaturated compound (B) contains a polymerizable unsaturated compound (b1) that (i) has a boiling point equal to or higher than the curing temperature thereof, (ii) has a rate of permeation with respect to a plastic material of at least 1 mass %, and (iii) has a coating liquid turbidity of at most 50 degrees when mixed with the urethane (meth)acrylate (A).

A resin composition has a viscosity of equal to or less than about 20 mPa.Math.s at a temperature in a range of about 30° C. to about 50° C. as measured according to JIS Z8803, a storage modulus in a range of about 1.7×10.sup.5 Pa to about 3×10.sup.5 Pa at about −20° C., and a storage modulus in a range of about 1.5×10.sup.4 Pa to about 6×10.sup.4 Pa at about 25° C. An adhesive member formed of the resin composition is also provided.

Methods and formulations for manufacturing polishing articles used in polishing processes are provided. In one implementation, a UV curable resin precursor composition is provided. The UV curable resin precursor comprises a precursor formulation. The precursor formulation comprises a first resin precursor component that comprises a semi-crystalline radiation curable oligomeric material, wherein the semi-crystalline radiation curable oligomeric material is selected from a semi-crystalline aliphatic polyester urethane acrylate, a semi-crystalline aliphatic polycarbonate urethane acrylate, a semi-crystalline aliphatic polyether urethane acrylate, or combinations thereof. The precursor formulation further comprises a second resin precursor component that comprises a monofunctional or multifunctional acrylate monomer. The resin precursor formulation further comprises a photoinitiator, wherein the precursor formulation has a viscosity that enables the precursor formulation to be dispensed to form a portion of a polishing article by an additive manufacturing process.