Patent classifications
C
CHEMISTRY; METALLURGY
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C08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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C08F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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283/00
Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
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C08F283/10
on to polymers containing more than one epoxy radical per molecule
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C08F283/105
on to unsaturated polymers containing more than one epoxy radical per molecule
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C08F283/105

PHOTOCURABLE COMPOSITION AND ITS APPLICATION IN PHOTOCURING FIELDS
20260055222 · 2026-02-26 · ·

The present invention generally relates to a photosensitive material. More particularly it relates to a photosensitive composition comprising a photoinitiator compound having a structure (I) and at least one monomer/oligomer wherein the monomer/oligomer is having photopolymerizable ethylenic unsaturated double bonds and its application in the field of photosensitive curing.

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