A block copolymer and a method for preparing the same are disclosed. The method comprises the following steps: (A) mixing a compound of formula (I), a catalyst of formula (II), and a first solvent to obtain a first mixture; (B) adding a first monomer into the first mixture for reaction to obtain a second mixture; and (C) adding a second monomer into the second mixture for reaction to obtain a third mixture; wherein the compound of formula (I) and the catalyst of formula (II) are as defined in the specification.

A process for anionically polymerizing a (meth)acrylic acid in the presence of a tertiary organoaluminum compound (A), an organolithium compound (B) and at least one kind of a Lewis base (C) in a polymerization system. The tertiary organoaluminum compound (A) includes a tertiary organoaluminum compound (A1) having a chemical structure in which at least two of three unshared electrons of an aluminum atom are bonded to an aromatic ring via an oxygen atom, and the tertiary organoaluminum compound (A) has a molar ratio (A2)/(A1) in the range of 0% or above and 0.8% or below between a tertiary organoaluminum compound (A2) having a chemical structure in which at most one of three unshared electrons of an aluminum atom is bonded to an aromatic ring via an oxygen atom, and the tertiary organoaluminum compound (A1).

A pattern-forming method includes: applying a radiation-sensitive composition containing a polymer and a radiation-sensitive acid generating agent on a surface of a substrate to form a coating film on the surface of the substrate; exposing the coating film; and developing the coating film exposed. The polymer has a first structural unit represented by formula (1). In the formula (1), R.sup.1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; and A represents a monovalent organic group having a nitrogen atom.

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The present application may provide a block copolymer and a use thereof. The present application may provide a block copolymer and a use thereof. The block copolymer of the present application may have excellent self-assembly properties or phase separation characteristics and simultaneously have characteristics capable of changing the self-assembly structure formed once, or provide a block copolymer capable of forming a pattern of phase separation structures in a polymer membrane.

The present application may provide a block copolymer and a use thereof. The present application may provide a block copolymer and a use thereof. The block copolymer of the present application may have excellent self-assembly properties or phase separation characteristics and simultaneously have characteristics capable of changing the self-assembly structure formed once, or provide a block copolymer capable of forming a pattern of phase separation structures in a polymer membrane.

A preparation method and uses of a high-performance water-soluble acrylic resin with high solid content and low viscosity. The method polymerizes the free radical solution in a mixed solvent by a continuous method to produce an acrylic resin and the resin is rendered water-soluble through salification. Modification with versatate introduces a large branched structure. Silicone functional monomer is used to modify the acrylic resin. Amino resin is used as a curing agent to directly prepare a waterborne amino-acrylic coating with a simple process, and the coating has good hardness, fullness, water and alcohol resistance and salt spray resistance.

The invention relates to block co-polymer comprising at least one first block and at least one second block which is different from the first block, wherein the first block comprises repeating units 1, and the second block comprises repeating units 2, wherein Z represents O or NH, R.sub.1 represents H or CH.sub.3, R.sub.2 represents a group selected from hydrocarbyl groups and ether group-containing groups, R.sub.3 represents an organic group having 2 to 4 carbon atoms, R.sub.4 and R.sub.5 independently represent an organic group, wherein R.sub.4 and R.sub.5 are optionally linked to each other to form a cyclic structure, and wherein the first block comprises at least six different types of repeating units 1.

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A viscosity index improver containing a copolymer (A) whose essential constituent monomer is a monomer (a) having a number average molecular weight of 800 to 4,000 represented by the following formula (1), the copolymer (A) having a solubility parameter in the range of 9.00 to 9.40: ##STR00001##
wherein R.sup.1 is a hydrogen atom or a methyl group; —X.sup.1— is a group represented by —O—, —O(AO).sub.m—, or —NH—, AO is a C2-C4 alkyleneoxy group, m is an integer of 1 to 10, each AO may be the same or different when m is 2 or more, and the (AO).sub.m moieties may be randomly bonded or block-bonded; R.sup.2 is a residue after removal of one hydrogen atom from a hydrocarbon polymer whose essential constituent monomer is butadiene in which the butadiene is present in a proportion of 50% by weight or more based on the weight of R.sup.2, or after removal of one hydrogen atom from a polymer formed by partial hydrogenation of the hydrocarbon polymer; and p represents a number of 0 or 1.

The present invention relates to a rapid assembled small-sized block polymer material with low quenching temperature and the preparation and application thereof. In particular, the present invention discloses a block copolymer, and glass transition temperature of the block copolymer is less than 120° C. The present invention also discloses the preparation and application of the block copolymer. The block copolymer can achieve excellent phase separation and rapid patterning at a lower annealing temperature (e.g. 80° C.) and a shorter annealing time (e.g. 30 s), and a photolithographic pattern with a very high resolution (e.g. 5 nm half-pitch) can be further obtained by etching, which provides a new photolithographic mean for further extension of Moore's Law to achieve semiconductor photolithography with a resolution of less than 10 nm, or even 5 nm (half-pitch).

Pellets of an acrylic block copolymer are provided which are imparted with sufficient antiblocking properties without deterioration in the outstanding performance of the acrylic block copolymer such as transparency. A method for producing pellets (D) including an acrylic block copolymer (A) includes bringing raw pellets of an acrylic block copolymer (A) into contact with an aqueous dispersion (C) containing acrylic resin particles (B) and no surfactants, the acrylic block copolymer (A) including at least one polymer block (a1) including acrylic acid alkyl ester units and at least one polymer block (a2) including methacrylic acid alkyl ester units, and removing water attached to the pellets.