Patent classifications
C08F299/08
VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER
A layer including a block copolymer in which a microphase-separated structure of the block copolymer has been induced perpendicular to a substrate, this process being difficult in heating under atmospheric pressure; a method for producing the layer; and a method for producing a semiconductor device in which is used a vertically phase-separated layer of a block copolymer. A vertically phase-separated layer of a block copolymer formed by heating at a pressure below atmospheric pressure and a temperature at which induced self-assembly can occur.
VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER
A layer including a block copolymer in which a microphase-separated structure of the block copolymer has been induced perpendicular to a substrate, this process being difficult in heating under atmospheric pressure; a method for producing the layer; and a method for producing a semiconductor device in which is used a vertically phase-separated layer of a block copolymer. A vertically phase-separated layer of a block copolymer formed by heating at a pressure below atmospheric pressure and a temperature at which induced self-assembly can occur.
Electrophoresis dispersion liquid, electrophoresis sheet, electrophoresis device, and electronic apparatus
An electrophoresis dispersion liquid includes first electrophoretic particle of a scattering system having an ionic group on a surface thereof; second electrophoretic particle of a coloring system having a polarization group on the surface thereof; and a dispersion medium. It is preferable that the ionic group is an acidic group, and further includes a ring structure that forms an acidic group and a salt. It is preferable that the polarization group is an organic group having a main skeleton, and a substituent bonded to the main skeleton.
CURABLE COMPOSITION, RESIST MATERIAL AND RESIST FILM
A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.
Method of manufacturing electrophoretic particle, electrophoretic particle, electrophoretic dispersion, electrophoretic sheet, electrophoretic device, and electronic apparatus
There is provided a method of manufacturing an electrophoretic particle, in which the electrophoretic particle includes a mother particle and a block copolymer, including: a step of polymerizing a monomer M having a site contributing to dispersibility into a dispersion medium, a monomer M including a second functional group having reactivity with the first functional group, a charged monomer M by living polymerization without random copolymerizing the monomer M1 and the monomer M2 so as to obtain the block copolymer; and a step of reacting the first functional group and the second functional group to a bonding section to a mother particle so as to connect the block copolymer to the mother particle.
Method of manufacturing electrophoretic particle, electrophoretic particle, electrophoretic dispersion, electrophoretic sheet, electrophoretic device, and electronic apparatus
There is provided a method of manufacturing an electrophoretic particle, in which the electrophoretic particle includes a mother particle and a block copolymer, including: a step of polymerizing a monomer M having a site contributing to dispersibility into a dispersion medium, a monomer M including a second functional group having reactivity with the first functional group, a charged monomer M by living polymerization without random copolymerizing the monomer M1 and the monomer M2 so as to obtain the block copolymer; and a step of reacting the first functional group and the second functional group to a bonding section to a mother particle so as to connect the block copolymer to the mother particle.
Active energy ray-curable resin composition, resin molded article, and method for producing resin molded article
An active energy ray-curable resin composition which contains (A) inorganic oxide particles each having an organic functional group on the surface, (B) a siloxane oligomer which has at least one functional group selected from the group consisting of a (meth)acryloyl group, an epoxy group and a vinyl group, while having a weight average molecular weight of 200-3,000, (C) a polyfunctional (meth)acrylate having a specific structure, (D) a urethane (meth)acrylate having two or more (meth)acryloyl groups in each molecule, and (E) an ultraviolet absorbent.
Active energy ray-curable resin composition, resin molded article, and method for producing resin molded article
An active energy ray-curable resin composition which contains (A) inorganic oxide particles each having an organic functional group on the surface, (B) a siloxane oligomer which has at least one functional group selected from the group consisting of a (meth)acryloyl group, an epoxy group and a vinyl group, while having a weight average molecular weight of 200-3,000, (C) a polyfunctional (meth)acrylate having a specific structure, (D) a urethane (meth)acrylate having two or more (meth)acryloyl groups in each molecule, and (E) an ultraviolet absorbent.
MAGNETIC CARRIER, TWO-COMPONENT DEVELOPER, AND REPLENISHMENT DEVELOPER
A magnetic carrier including: a magnetic core; and a coating resin that coats a surface of the magnetic core, wherein the resin coating layer has a thickness of 50 nm or more, a coating resin, which forms the resin coating layer, contains a resin S having an organosilicon polymer moiety, and when a surface and a position at a depth of 20 nm from the surface of the magnetic carrier are analyzed by X-ray photoelectron spectroscopy, an amount of silicon element as determined by the analysis has a ratio within a specific range at respective positions.
MAGNETIC CARRIER, TWO-COMPONENT DEVELOPER, AND REPLENISHMENT DEVELOPER
A magnetic carrier including: a magnetic core; and a coating resin that coats a surface of the magnetic core, wherein the resin coating layer has a thickness of 50 nm or more, a coating resin, which forms the resin coating layer, contains a resin S having an organosilicon polymer moiety, and when a surface and a position at a depth of 20 nm from the surface of the magnetic carrier are analyzed by X-ray photoelectron spectroscopy, an amount of silicon element as determined by the analysis has a ratio within a specific range at respective positions.