C08F299/08

VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER

A layer including a block copolymer in which a microphase-separated structure of the block copolymer has been induced perpendicular to a substrate, this process being difficult in heating under atmospheric pressure; a method for producing the layer; and a method for producing a semiconductor device in which is used a vertically phase-separated layer of a block copolymer. A vertically phase-separated layer of a block copolymer formed by heating at a pressure below atmospheric pressure and a temperature at which induced self-assembly can occur.

VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER

A layer including a block copolymer in which a microphase-separated structure of the block copolymer has been induced perpendicular to a substrate, this process being difficult in heating under atmospheric pressure; a method for producing the layer; and a method for producing a semiconductor device in which is used a vertically phase-separated layer of a block copolymer. A vertically phase-separated layer of a block copolymer formed by heating at a pressure below atmospheric pressure and a temperature at which induced self-assembly can occur.

Electrophoresis dispersion liquid, electrophoresis sheet, electrophoresis device, and electronic apparatus

An electrophoresis dispersion liquid includes first electrophoretic particle of a scattering system having an ionic group on a surface thereof; second electrophoretic particle of a coloring system having a polarization group on the surface thereof; and a dispersion medium. It is preferable that the ionic group is an acidic group, and further includes a ring structure that forms an acidic group and a salt. It is preferable that the polarization group is an organic group having a main skeleton, and a substituent bonded to the main skeleton.

CURABLE COMPOSITION, RESIST MATERIAL AND RESIST FILM
20170306062 · 2017-10-26 ·

A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

Method of manufacturing electrophoretic particle, electrophoretic particle, electrophoretic dispersion, electrophoretic sheet, electrophoretic device, and electronic apparatus
09798215 · 2017-10-24 · ·

There is provided a method of manufacturing an electrophoretic particle, in which the electrophoretic particle includes a mother particle and a block copolymer, including: a step of polymerizing a monomer M having a site contributing to dispersibility into a dispersion medium, a monomer M including a second functional group having reactivity with the first functional group, a charged monomer M by living polymerization without random copolymerizing the monomer M1 and the monomer M2 so as to obtain the block copolymer; and a step of reacting the first functional group and the second functional group to a bonding section to a mother particle so as to connect the block copolymer to the mother particle.

Method of manufacturing electrophoretic particle, electrophoretic particle, electrophoretic dispersion, electrophoretic sheet, electrophoretic device, and electronic apparatus
09798215 · 2017-10-24 · ·

There is provided a method of manufacturing an electrophoretic particle, in which the electrophoretic particle includes a mother particle and a block copolymer, including: a step of polymerizing a monomer M having a site contributing to dispersibility into a dispersion medium, a monomer M including a second functional group having reactivity with the first functional group, a charged monomer M by living polymerization without random copolymerizing the monomer M1 and the monomer M2 so as to obtain the block copolymer; and a step of reacting the first functional group and the second functional group to a bonding section to a mother particle so as to connect the block copolymer to the mother particle.

Active energy ray-curable resin composition, resin molded article, and method for producing resin molded article

An active energy ray-curable resin composition which contains (A) inorganic oxide particles each having an organic functional group on the surface, (B) a siloxane oligomer which has at least one functional group selected from the group consisting of a (meth)acryloyl group, an epoxy group and a vinyl group, while having a weight average molecular weight of 200-3,000, (C) a polyfunctional (meth)acrylate having a specific structure, (D) a urethane (meth)acrylate having two or more (meth)acryloyl groups in each molecule, and (E) an ultraviolet absorbent.

Active energy ray-curable resin composition, resin molded article, and method for producing resin molded article

An active energy ray-curable resin composition which contains (A) inorganic oxide particles each having an organic functional group on the surface, (B) a siloxane oligomer which has at least one functional group selected from the group consisting of a (meth)acryloyl group, an epoxy group and a vinyl group, while having a weight average molecular weight of 200-3,000, (C) a polyfunctional (meth)acrylate having a specific structure, (D) a urethane (meth)acrylate having two or more (meth)acryloyl groups in each molecule, and (E) an ultraviolet absorbent.

MAGNETIC CARRIER, TWO-COMPONENT DEVELOPER, AND REPLENISHMENT DEVELOPER

A magnetic carrier including: a magnetic core; and a coating resin that coats a surface of the magnetic core, wherein the resin coating layer has a thickness of 50 nm or more, a coating resin, which forms the resin coating layer, contains a resin S having an organosilicon polymer moiety, and when a surface and a position at a depth of 20 nm from the surface of the magnetic carrier are analyzed by X-ray photoelectron spectroscopy, an amount of silicon element as determined by the analysis has a ratio within a specific range at respective positions.

MAGNETIC CARRIER, TWO-COMPONENT DEVELOPER, AND REPLENISHMENT DEVELOPER

A magnetic carrier including: a magnetic core; and a coating resin that coats a surface of the magnetic core, wherein the resin coating layer has a thickness of 50 nm or more, a coating resin, which forms the resin coating layer, contains a resin S having an organosilicon polymer moiety, and when a surface and a position at a depth of 20 nm from the surface of the magnetic carrier are analyzed by X-ray photoelectron spectroscopy, an amount of silicon element as determined by the analysis has a ratio within a specific range at respective positions.