Disclosed herein are compositions and methods of making phenolic compounds and phenolic resins. The resins include multifunctional epoxies, amino glycidyl derivatives, alkanoate derivatives, alkyl ether derivatives, and multi-functional amines prepared from hydroxymethyl derivatives of novolac resin.

Disclosed herein are compositions and methods of making phenolic compounds and phenolic resins. The resins include multifunctional epoxies, amino glycidyl derivatives, alkanoate derivatives, alkyl ether derivatives, and multi-functional amines prepared from hydroxymethyl derivatives of novolac resin.

The resol type modified phenol resin composition contains a resol type modified phenol resin having a structural unit A by General Formula (1) which is modified by dimethylphenols and a structural unit B represented by General Formula (2). In Formula (1), m representing an integer of 1 or more, wherein in a case where m is 1, R represents a methylol group; in a case where m is 2 or more, R's independently represent a hydrogen atom or a methylol group, and at least one of R's is a methylol group. In Formula (2), n representing an integer of 1 or more, wherein in a case where n is 1, R represents a methylol group; in a case where n is 2 or more, R's independently represent a hydrogen atom or a methylol group, and at least one of R's is a methylol group.

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A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described.

A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described.

Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes.

Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes.

Giant p-(R)calixarenes, a process for the preparation of giant p-(R)calixarenes with high yields, and their use as the constitution of a material or in the context of the reinforcement of the material.

Giant p-(R)calixarenes, a process for the preparation of giant p-(R)calixarenes with high yields, and their use as the constitution of a material or in the context of the reinforcement of the material.

Disclosed herein are compositions and methods of making phenolic compounds and phenolic resins. The resins include multifunctional epoxies, amino glycidyl derivatives, alkanoate derivatives, alkyl ether derivatives, and multi-functional amines prepared from hydroxymethyl derivatives of novolac resin.