Provided is a modified hydroxy naphthalene novolak resin which is optimal for a photosensitive composition and a resist material having high optical sensitivity, resolution, and alkali developability, and excellent heat resistance and moisture absorption resistance, and the modified hydroxy naphthalene novolak resin includes a structural moiety (I) represented by Structural Formula as a repeating unit: ##STR00001## wherein R.sup.1is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group; m is 1 or 2; R.sup.2's each independently is any one of a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group, and a halogen atom; and at least one of the R.sup.1's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

The invention relates to a composition for the production of foams based on phenolic resin, use thereof, and a process for the production of the composition. For provision of a composition for the production of foams based on phenolic resin, where the said composition delivers improved reaction to fire with, in essence, no alteration of further important foam properties, it is proposed that the composition comprises an alkoxylated novolak, wherein the novolak is produced using phenol, cresol and/or xylenol.

The invention relates to a composition for the production of foams based on phenolic resin, use thereof, and a process for the production of the composition. For provision of a composition for the production of foams based on phenolic resin, where the said composition delivers improved reaction to fire with, in essence, no alteration of further important foam properties, it is proposed that the composition comprises an alkoxylated novolak, wherein the novolak is produced using phenol, cresol and/or xylenol.

This invention relates to compositions and a process for stabilizing or solubilize a phenolic resin containing a mixture of linear phenolic resins and calixarenes. The process comprises contacting the phenolic resin with an epoxide, to at least partially alkoxylate the phenolic hydroxyl groups of the calixarenes. This process forms a stabilized or solubilized phenolic resin with an increased solubility in a hydrocarbon solvent.

This invention relates to compositions and a process for stabilizing or solubilize a phenolic resin containing a mixture of linear phenolic resins and calixarenes. The process comprises contacting the phenolic resin with an epoxide, to at least partially alkoxylate the phenolic hydroxyl groups of the calixarenes. This process forms a stabilized or solubilized phenolic resin with an increased solubility in a hydrocarbon solvent.

Esterified arylhydroxy compounds for the production of polyurethane or polyisocyanurate. In order to provide aromatic polyols for the production of polyurethanes or polyisocyanurates which are process-technically suitable in terms of their viscosity and at the same time give the end product good physical properties and a good reaction to fire, esterified arylhydroxy compounds are proposed as polyols.

A cross-linked polymer including a structure wherein at least a portion of phenolic hydroxyl groups in the polymer is protected by a group represented by the following formula (1):

##STR00001##

wherein R.sup.1 represents an alkyl group having 1 to 5 carbons and n represents an integer from 1 to 5; and * represents a bond part of the phenolic hydroxyl group to a residue other than a hydrogen atom, and a structure wherein at least a portion of phenolic hydroxyl groups in the polymer is protected by a group represented by the following formula (2):

##STR00002##

wherein R.sup.2 represents a divalent saturated hydrocarbon group having 2 to 17 carbons, containing an aromatic ring; and * represents a bond part of the phenolic hydroxyl group to a residue other than a hydrogen atom, and the polymers are cross-linked to each other.

A cross-linked polymer including a structure wherein at least a portion of phenolic hydroxyl groups in the polymer is protected by a group represented by the following formula (1):

##STR00001##

wherein R.sup.1 represents an alkyl group having 1 to 5 carbons and n represents an integer from 1 to 5; and * represents a bond part of the phenolic hydroxyl group to a residue other than a hydrogen atom, and a structure wherein at least a portion of phenolic hydroxyl groups in the polymer is protected by a group represented by the following formula (2):

##STR00002##

wherein R.sup.2 represents a divalent saturated hydrocarbon group having 2 to 17 carbons, containing an aromatic ring; and * represents a bond part of the phenolic hydroxyl group to a residue other than a hydrogen atom, and the polymers are cross-linked to each other.

Disclosed herein are polymers formed by the condensation of bis(hydroxycarbyl)-aminophenolic compounds with aldehydes. The condensation polymers include one or more repeat units having bis(hydroxycarbyl)amino functionality. The hydroxyl groups of the bis(hydroxycarbyl)amino functionalities are available for further condensation with an epoxide, such as ethylene oxide, to yield a polyalkoxylated polymer. The polymers are useful as antipolymerants, polymerization retardants, surfactants, or a combination of these in one or more industrial systems.

Disclosed herein are polymers formed by the condensation of bis(hydroxycarbyl)-aminophenolic compounds with aldehydes. The condensation polymers include one or more repeat units having bis(hydroxycarbyl)amino functionality. The hydroxyl groups of the bis(hydroxycarbyl)amino functionalities are available for further condensation with an epoxide, such as ethylene oxide, to yield a polyalkoxylated polymer. The polymers are useful as antipolymerants, polymerization retardants, surfactants, or a combination of these in one or more industrial systems.