C08G12/40

Schiff base oligomers

Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (IV) wherein each instance of R.sup.9 is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heteroaryl, and ether. Each instance of R.sup.28 and R.sup.29 of Formula (IV) is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, and aryl. Each instance of R.sup.33 of Formula (IV) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R.sup.41 of Formula (IV) is independently —NH— or a bond and each instance of R.sup.40 is independently —NH— or —NH—NH—. Each instance of R.sup.42 of Formula (IV) is independently —NH— or a bond and each instance of R.sup.43 is independently —NH— or —NH—NH—.

UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM, AND PATTERN FORMATION METHOD

An object of the present invention is to provide a resist underlayer film forming composition for lithography that has features of having excellent smoothing performance on an uneven substrate, good embedding performance into a fine hole pattern, and a smoothed wafer surface after film formation, and the like. The object can be achieved by an underlayer film forming composition for lithography containing a compound having a protecting group.

UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM, AND PATTERN FORMATION METHOD

An object of the present invention is to provide a resist underlayer film forming composition for lithography that has features of having excellent smoothing performance on an uneven substrate, good embedding performance into a fine hole pattern, and a smoothed wafer surface after film formation, and the like. The object can be achieved by an underlayer film forming composition for lithography containing a compound having a protecting group.

MODIFIED UREA-FORMALDEHYDE BINDERS FOR NON-WOVEN FIBER GLASS MATS
20230295413 · 2023-09-21 ·

A method of forming a binder composition includes providing a urea-formaldehyde resin and combining one or more starch compounds with the urea-formaldehyde resin to form a starch modified urea-formaldehyde resin. The one or more starch compounds may be combined with the urea-formaldehyde resin so that the starch modified urea-formaldehyde resin includes about 1 wt. % to about 10 wt. % of the one or more starch compounds.

MODIFIED UREA-FORMALDEHYDE BINDERS FOR NON-WOVEN FIBER GLASS MATS
20230295413 · 2023-09-21 ·

A method of forming a binder composition includes providing a urea-formaldehyde resin and combining one or more starch compounds with the urea-formaldehyde resin to form a starch modified urea-formaldehyde resin. The one or more starch compounds may be combined with the urea-formaldehyde resin so that the starch modified urea-formaldehyde resin includes about 1 wt. % to about 10 wt. % of the one or more starch compounds.

SCHIFF BASE OLIGOMERS
20230357506 · 2023-11-09 ·

Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (I) wherein each instance of R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.10, R.sup.11, R.sup.12, R.sup.13, and R.sup.14 is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, alkoxyl, aryloxyl, ether, and heterocyclyl. Each instance of R.sup.9 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and ether. Each instance of R.sup.28 and R.sup.29 of Formula (I) is independently selected from the group consisting of hydrogen, alkyl, and aryl. Each instance of R.sup.33 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R.sup.41 of Formula (I) is independently —NH— or a bond and each instance of R.sup.40 is independently —NH— or —NH—NH—.

Schiff base oligomers

Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (I) wherein each instance of R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.10, R.sup.11, R.sup.12, R.sup.13, and R.sup.14 is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, alkoxyl, aryloxyl, ether, and heterocyclyl. Each instance of R.sup.9 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and ether. Each instance of R.sup.28 and R.sup.29 of Formula (I) is independently selected from the group consisting of hydrogen, alkyl, and aryl. Each instance of R.sup.33 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R.sup.41 of Formula (I) is independently —NH— or a bond and each instance of R.sup.40 is independently —NH— or —NH—NH—.

Schiff base oligomers

Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (I) wherein each instance of R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.10, R.sup.11, R.sup.12, R.sup.13, and R.sup.14 is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, alkoxyl, aryloxyl, ether, and heterocyclyl. Each instance of R.sup.9 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and ether. Each instance of R.sup.28 and R.sup.29 of Formula (I) is independently selected from the group consisting of hydrogen, alkyl, and aryl. Each instance of R.sup.33 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R.sup.41 of Formula (I) is independently —NH— or a bond and each instance of R.sup.40 is independently —NH— or —NH—NH—.

Method for preparing dispersant using lignin degradation products

A method for preparing dispersant using lignin degradation products includes preparation of lignin degradation products: degrading lignin which are used as raw materials using alkali through microwave-assisted activation at the presence of a metal oxide catalyst to obtain the lignin degradation products; and preparation of dispersant: preparing dispersant by molecularly reforming and chemically modifying the lignin degradation products obtained in the step of preparation of lignin degradation products.

Method for preparing dispersant using lignin degradation products

A method for preparing dispersant using lignin degradation products includes preparation of lignin degradation products: degrading lignin which are used as raw materials using alkali through microwave-assisted activation at the presence of a metal oxide catalyst to obtain the lignin degradation products; and preparation of dispersant: preparing dispersant by molecularly reforming and chemically modifying the lignin degradation products obtained in the step of preparation of lignin degradation products.