Patent classifications
C08G61/10
ORGANIC POLYMERIC COMPOSITIONS
A polymer comprising recurring units derived from organic unsaturated planar ring monomers. The recurring units are stacked, linked to one another by linkers, and are capable of undergoing oxidation and/or reduction, and the polymer is electrically conducting.
ORGANIC POLYMERIC COMPOSITIONS
A polymer comprising recurring units derived from organic unsaturated planar ring monomers. The recurring units are stacked, linked to one another by linkers, and are capable of undergoing oxidation and/or reduction, and the polymer is electrically conducting.
IONIC COPOLYMER, CURABLE MEMBRANE PRECURSOR COMPOSITION, MEMBRANE COMPOSITION, AND ELECTRONIC DEVICE
A cationic copolymer comprises the divalent monomer units: wherein: each Ar.sup.1 independently represents phenylene; each L independently represents a direct bond or wherein each R.sup.1 independently represents an alkyl group having 1 to 4 carbon atoms, and each R.sup.2 independently represents an alkylene group having from 1 to 6 carbon atoms, and each Z.sup.− represents a non-interfering anion; each Ar.sup.2 independently represents an optionally substituted divalent aryl ring, with the proviso that if L represents a direct bond, then Ar.sup.2 represents an optionally substituted cationic divalent aryl ring accompanied by Z; each R.sup.3 independently represents H or an alkyl group having 1 to 6 carbon atoms; and each D independently represents a direct bond or Ar.sup.2, wherein adjacent D and L are not both direct bonds, and wherein if L is a direct bond, then D is Ar.sup.2. The cationic copolymer can be free-radially cured and used in a membrane.
IONIC COPOLYMER, CURABLE MEMBRANE PRECURSOR COMPOSITION, MEMBRANE COMPOSITION, AND ELECTRONIC DEVICE
A cationic copolymer comprises the divalent monomer units: wherein: each Ar.sup.1 independently represents phenylene; each L independently represents a direct bond or wherein each R.sup.1 independently represents an alkyl group having 1 to 4 carbon atoms, and each R.sup.2 independently represents an alkylene group having from 1 to 6 carbon atoms, and each Z.sup.− represents a non-interfering anion; each Ar.sup.2 independently represents an optionally substituted divalent aryl ring, with the proviso that if L represents a direct bond, then Ar.sup.2 represents an optionally substituted cationic divalent aryl ring accompanied by Z; each R.sup.3 independently represents H or an alkyl group having 1 to 6 carbon atoms; and each D independently represents a direct bond or Ar.sup.2, wherein adjacent D and L are not both direct bonds, and wherein if L is a direct bond, then D is Ar.sup.2. The cationic copolymer can be free-radially cured and used in a membrane.
Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer
A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1) as a repeating unit, and an organic solvent. Each of AR1 and AR2 represents a benzene ring or naphthalene ring which optionally have a substituent; W.sub.1 represents a particular partial structure having a triple bond, and the polymer optionally contains two or more kinds of W.sub.1; and W.sub.2 represents a divalent organic group having 6 to 80 carbon atoms and at least one aromatic ring. This invention provides: a polymer curable even under film formation conditions in an inert gas and capable of forming an organic film which has not only excellent heat resistance and properties of filling and planarizing a pattern formed in a substrate, but also favorable film formability onto a substrate with less sublimation product; and a composition for forming an organic film, containing the polymer. ##STR00001##
Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer
A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1) as a repeating unit, and an organic solvent. Each of AR1 and AR2 represents a benzene ring or naphthalene ring which optionally have a substituent; W.sub.1 represents a particular partial structure having a triple bond, and the polymer optionally contains two or more kinds of W.sub.1; and W.sub.2 represents a divalent organic group having 6 to 80 carbon atoms and at least one aromatic ring. This invention provides: a polymer curable even under film formation conditions in an inert gas and capable of forming an organic film which has not only excellent heat resistance and properties of filling and planarizing a pattern formed in a substrate, but also favorable film formability onto a substrate with less sublimation product; and a composition for forming an organic film, containing the polymer. ##STR00001##
Polyaromatic electrolytes for alkaline membrane fuel cells
A polyaromatic electrolyte for a fuel cell electrode includes a structure represented by Formula 1, wherein in Formula 1, Ar is a neutral unit represented by one of Formula 2A and Formula 2B: ##STR00001##
The fuel cell electrode may include a catalyst suspended in the polyaromatic electrolyte.
Polyaromatic electrolytes for alkaline membrane fuel cells
A polyaromatic electrolyte for a fuel cell electrode includes a structure represented by Formula 1, wherein in Formula 1, Ar is a neutral unit represented by one of Formula 2A and Formula 2B: ##STR00001##
The fuel cell electrode may include a catalyst suspended in the polyaromatic electrolyte.
TWIN-MONOMER COMPOSITION AND DIELECTRIC FILM THEREOF
A composition comprising a monomer of the general formula (M1) wherein M is a metal or semimetal of main group 3 or 4 of the periodic table; X.sup.M1, X.sup.M2 are each O; R.sup.M1, R.sup.M2 are the same or different and are each an —CR.sup.aR.sup.b—Ar—O—R.sup.c; Ar is a C.sub.6 to C.sub.30 carbocyclic ring system; R.sup.a, R.sup.b are the same or different and are each H or C.sub.1 to C.sub.6 alkyl; R.sup.c is C.sub.1-C.sub.22-alkyl, benzyl or phenyl; q according to the valency and charge of M is 0 or 1; X.sup.M3, X.sup.M4 are the same or different and are each O, C.sub.6 to C.sub.10 aryl, or —CH.sub.2—; R.sup.M3, R.sup.M4 are the same or different and are each R.sup.M1, H, C.sub.1-C.sub.22 alkyl, or a polymer selected from a polyalkylene, a polysiloxane, or a polyether.
##STR00001##
TWIN-MONOMER COMPOSITION AND DIELECTRIC FILM THEREOF
A composition comprising a monomer of the general formula (M1) wherein M is a metal or semimetal of main group 3 or 4 of the periodic table; X.sup.M1, X.sup.M2 are each O; R.sup.M1, R.sup.M2 are the same or different and are each an —CR.sup.aR.sup.b—Ar—O—R.sup.c; Ar is a C.sub.6 to C.sub.30 carbocyclic ring system; R.sup.a, R.sup.b are the same or different and are each H or C.sub.1 to C.sub.6 alkyl; R.sup.c is C.sub.1-C.sub.22-alkyl, benzyl or phenyl; q according to the valency and charge of M is 0 or 1; X.sup.M3, X.sup.M4 are the same or different and are each O, C.sub.6 to C.sub.10 aryl, or —CH.sub.2—; R.sup.M3, R.sup.M4 are the same or different and are each R.sup.M1, H, C.sub.1-C.sub.22 alkyl, or a polymer selected from a polyalkylene, a polysiloxane, or a polyether.
##STR00001##