A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; a method for producing a resist pattern and producing a semiconductor device, which uses this composition for forming a resist underlayer film. A composition for forming an EUV resist underlayer film, said composition containing an organic solvent and a reaction product of a diepoxy compound and a compound represented by formula (1). (In formula (1), Y1 represents an alkylene group having from 1 to 10 carbon atoms, wherein at least one hydrogen atom is substituted by a fluorine atom; each of T1 and T2 independently represents a hydroxy group or a carboxy group; each of R1 and R2 independently represents an alkyl group having from 1-10 carbon atoms, said alkyl group being optionally substituted by a fluorine atom; and each of n1 and n2 independently represents an integer from 0 to 4.)

A resin includes a unit represented by Chemical Formula 1, a method for preparing the same, a resin composition including the same, and a molded article including the resin composition

##STR00001## in Chemical Formula 1, Ar1, Ar2, R1, r1, X1 to X4, Z1, Z2, a and b are described herein.

A curing agent composition and a curing agent coating formula thereof are provided. The curing agent composition includes 5 to 25 wt % of an ester group-containing amine end group adduct, 2 to 25 wt % of a C8-C22 hydrophobic saturated or unsaturated fatty amine, 2 to 25 wt % of a polyamine compound, 2 to 20 wt % of a silane compound, and 10 to 60 wt % of an ether solvent.

A curing agent composition and a curing agent coating formula thereof are provided. The curing agent composition includes 5 to 25 wt % of an ester group-containing amine end group adduct, 2 to 25 wt % of a C8-C22 hydrophobic saturated or unsaturated fatty amine, 2 to 25 wt % of a polyamine compound, 2 to 20 wt % of a silane compound, and 10 to 60 wt % of an ether solvent.

Provided is a triblock copolymer comprising a poly(3-hydroxypropionate) block, and polylactide blocks bonded to both ends of the poly(3-hydroxypropionate) block. Also provided is a method for preparing a triblock copolymer by ring-opening polymerization of lactide monomers in the presence of a poly(3-hydroxypropionate) initiator having hydroxy groups at both ends.

The present invention is directed to bioresorbable polymers to be used as bone and tissue adhesives. The present invention is also directed to the synthesis of bioresorbable polymeric molecules bearing adhesive moieties and the use of such compounds in methods to glue and stabilize fractured bones and damaged tissues. The present invention is also directed to the use of such compounds as adhesive sealants for applications in wound care. The present invention is also directed to the use of such compounds as biodegradable ink for applications in tissue engineering and 3D printing. The present invention also relates to the use of such compounds as drug delivery platforms.

Disclosed are poly(ester urea)s containing two or more units containing two amino acid monomers linked by a linker. At least two units of the poly(ester urea)s are covalently bonded via a urea bond. Suitable amino acid monomers are lysine, arginine, aspartic acid, phenylalanine, or a side chain protected derivative thereof, and suitable linkers are selected from a 1,4-butane diol group, a 1,6-hexane diol group, diethylene glycol group, a triethylene glycol group, or an N-methyl diethanolamine group. The poly(ester urea)s are used to form polyplexes for the improved complexation and delivery of drugs to a subject in need thereof.

In various embodiments, the present invention is directed to a degradable poly(ester urea) (PEU)-based adhesion barrier, particularly suitable for use in connection with surgical mesh repair in the treatment of hernias and other soft tissue injuries comprising an amino acid based poly(ester urea) backbone and one or more zwitterionic side chains connected to the amino acid based poly(ester urea) backbone through a sulfide bond. In some other embodiments, the present invention is directed to method of making the PEU-based adhesion barriers comprising: preparing an amino acid based PEU polymer or terpolymer having one or more allyl functional groups; preparing a thiol functionalized zwitterionic compound; and reacting the allyl functionalized PEU polymer or terpolymer with the thiol functionalized zwitterionic compound to form a degradable PEU-based adhesion barrier having an amino acid based PEU backbone having zwitterionic side chains.

In various embodiments, the present invention is directed to a degradable poly(ester urea) (PEU)-based adhesion barrier, particularly suitable for use in connection with surgical mesh repair in the treatment of hernias and other soft tissue injuries comprising an amino acid based poly(ester urea) backbone and one or more zwitterionic side chains connected to the amino acid based poly(ester urea) backbone through a sulfide bond. In some other embodiments, the present invention is directed to method of making the PEU-based adhesion barriers comprising: preparing an amino acid based PEU polymer or terpolymer having one or more allyl functional groups; preparing a thiol functionalized zwitterionic compound; and reacting the allyl functionalized PEU polymer or terpolymer with the thiol functionalized zwitterionic compound to form a degradable PEU-based adhesion barrier having an amino acid based PEU backbone having zwitterionic side chains.

A compound comprising an oligomer formed from a biocompatible multifunctional carboxylic acid comprising a hydroxyl group and at least one carboxylic acid, an polyol (e.g., an aliphatic diol), and a linker. One or more conductive oligomers (e.g., polyanilines) are covalently bonded to the oligomer. The compounds can have various forms (e.g., articles of manufacture, films, scaffolds, and the like). The compounds have various uses. For example, the compounds are used in photoacoustic imaging methods.