Patent classifications
C08G73/08
PHOTORESIST AND METHOD FOR FORMING SAME
The present disclosure provides a photoresist. The photoresist is formed by a crosslinking polymerization reaction between a reactive group-containing biimidazole molecule and a nitrogen-containing compound.
BIODEGRADABLE DRUG-POLYMER CONJUGATE
A drug-polymer conjugate, which is a copolymer of at least one monomer of formula (I): (I) where: X may be the same or different at each occurrence and represents a terminal functional group comprising an alkyne or an azide; Q is independently selected at each occurrence and may be present or absent and when present, represents a linking group; R is selected from the group consisting of linear or branched hydrocarbon, optionally substituted aryl and optionally substituted heteroaryl; D is a releasable drug selected from prostaglandins, -blockers and mixtures thereof; L is a linker group group; and at least one co-monomer of Formula III III J represents a linking functional group, n is 2 to 8, preferably 3 to 8; Y comprises a polyether of formula (ORa)m wherein Ra is independently ethylene, propylene and butylene and m is from 1 to 300 (preferably 2 to 300) and the polyether is in chain with one or more groups which are preferably selected from one or more of optionally substituted straight or branched Ci to do alkylene, amino, ether, ester, amide, carbonate and carbamate; A may be the same or different at each occurrence and represents a group comprising a terminal functional group comprising an alkyne or an azide functionality, wherein said terminal functional group is complementary to the terminal functional group X of formula (I) providing triazole moieties from reaction of X and A.
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BIODEGRADABLE DRUG-POLYMER CONJUGATE
A drug-polymer conjugate, which is a copolymer of at least one monomer of formula (I): (I) where: X may be the same or different at each occurrence and represents a terminal functional group comprising an alkyne or an azide; Q is independently selected at each occurrence and may be present or absent and when present, represents a linking group; R is selected from the group consisting of linear or branched hydrocarbon, optionally substituted aryl and optionally substituted heteroaryl; D is a releasable drug selected from prostaglandins, -blockers and mixtures thereof; L is a linker group group; and at least one co-monomer of Formula III III J represents a linking functional group, n is 2 to 8, preferably 3 to 8; Y comprises a polyether of formula (ORa)m wherein Ra is independently ethylene, propylene and butylene and m is from 1 to 300 (preferably 2 to 300) and the polyether is in chain with one or more groups which are preferably selected from one or more of optionally substituted straight or branched Ci to do alkylene, amino, ether, ester, amide, carbonate and carbamate; A may be the same or different at each occurrence and represents a group comprising a terminal functional group comprising an alkyne or an azide functionality, wherein said terminal functional group is complementary to the terminal functional group X of formula (I) providing triazole moieties from reaction of X and A.
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FRACTIONATED ANTIMICROBIAL COMPOSITIONS AND USE THEREOF
The present invention provides fractionated polymer compositions that have antibacterial, antifungal and antiviral activity. These compositions are useful in the treatment infectious diseases caused by pathogens and for other uses.
FRACTIONATED ANTIMICROBIAL COMPOSITIONS AND USE THEREOF
The present invention provides fractionated polymer compositions that have antibacterial, antifungal and antiviral activity. These compositions are useful in the treatment infectious diseases caused by pathogens and for other uses.
Positive type photosensitive siloxane composition, active matrix substrate, display apparatus, and method of manufacturing active matrix substrate
The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring. The interlayer insulating film is formed using the positive type photosensitive siloxane composition without using a resist.
Positive type photosensitive siloxane composition, active matrix substrate, display apparatus, and method of manufacturing active matrix substrate
The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring. The interlayer insulating film is formed using the positive type photosensitive siloxane composition without using a resist.
POLYMER CARBON NITRIDE, SPECIFIC CRYSTAL FORM OF SAID POLYMER CARBON NITRIDE, AND ULTRAVIOLET RAY-BLOCKING USE THEREOF
The present invention relates to a polymer carbon nitride, a specific crystal form of the polymer carbon nitride, and a cosmetic composition, an ultraviolet ray-blocking composition, and an external use skin preparation composition, which include the polymer carbon nitride. The polymer carbon nitride according to one aspect of the present invention and a crystal form produced by a specific preparation example thereof can absorb both UVA and UVB, and thus can effectively protect the skin from ultraviolet rays while also being non-toxic and thus suitable for living bodies and lacking photoactivity. Therefore, the polymer carbon nitride and the crystal form can be utilized in a cosmetic composition, an ultraviolet ray-blocking composition and an external use skin preparation composition, which are applied to the living body. Moreover, the specific crystal forms of the polymer carbon nitride have different characteristics according to the manufacturing method, and thus may be used in a variety of ways according to the characteristics. Particularly, the crystal form of the polymer carbon nitride according to one aspect can be adjusted to various colors according to the preparation method, and thus can be utilized to obtain a composition having a desired color. Therefore, the crystal form can be suitably utilized to produce products of various colors suitable for the skin tones of individuals.
POLYMER CARBON NITRIDE, SPECIFIC CRYSTAL FORM OF SAID POLYMER CARBON NITRIDE, AND ULTRAVIOLET RAY-BLOCKING USE THEREOF
The present invention relates to a polymer carbon nitride, a specific crystal form of the polymer carbon nitride, and a cosmetic composition, an ultraviolet ray-blocking composition, and an external use skin preparation composition, which include the polymer carbon nitride. The polymer carbon nitride according to one aspect of the present invention and a crystal form produced by a specific preparation example thereof can absorb both UVA and UVB, and thus can effectively protect the skin from ultraviolet rays while also being non-toxic and thus suitable for living bodies and lacking photoactivity. Therefore, the polymer carbon nitride and the crystal form can be utilized in a cosmetic composition, an ultraviolet ray-blocking composition and an external use skin preparation composition, which are applied to the living body. Moreover, the specific crystal forms of the polymer carbon nitride have different characteristics according to the manufacturing method, and thus may be used in a variety of ways according to the characteristics. Particularly, the crystal form of the polymer carbon nitride according to one aspect can be adjusted to various colors according to the preparation method, and thus can be utilized to obtain a composition having a desired color. Therefore, the crystal form can be suitably utilized to produce products of various colors suitable for the skin tones of individuals.
THERMOSET MATERIALS OBTAINED FROM SPECIFIC PHTHALONITRILE RESINS FOR HIGH-TEMPERATURE APPLICATIONS
A thermoset material obtained from a curing by heat treatment of a resin that can be obtained by polycondensation, in basic medium, of at least one phthalonitrile compound bearing on its benzene ring at least one hydroxyl group.