Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.

A thermoset barrier film including: a reaction product of the formulas (I), (II), (III), (IV), or a mixture thereof, as defined herein. Also disclosed are methods of making and using the thermoset barrier film, and devices incorporating the thermoset barrier film.

A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH—POSS) nanoparticles.

The present invention relates to a selective process for producing polyurethane prepolymers, to the polyurethane prepolymers obtainable from this process, and also to a process for producing moisture-crosslinking silylated polymers, more particularly silane-functional hybrid polymers, and also to the use thereof in CASE sectors (coatings, adhesives, sealants and elastomers).

Use of an alkyltrichlorosilane of the following formula I: R—SiCl.sub.3, wherein: R represents an alkyl group, Si represents a silicon atom and Cl represents a chlorine atom, and/or of a silsesquioxane of the following formula II: [RSiO.sub.3/2].sub.n, wherein: R represents an alkyl group, Si represents a silicon atom, O represents an oxygen atom and n represents an integer, for the removal of microplastic particles from water and/or for the treatment of water. Further, a method for the removal of microplastic particles from water and/or for the purification of water is provided, as well as an inclusion and/or intercalation compound, a kit for the removal of microplastic particles from water and/or for the purification of water as well as a water treatment system.

A gas separation membrane, a method for making the gas separation membrane, and a method for using the gas separation membrane are provided. An exemplary gas separation membrane includes a polyether-block-polyamide (PEBA) matrix and a cross-linked network including functionalized polyhedral oligomeric silsesquioxane (POSS) nanoparticles dispersed through the PEBA matrix.

A composition comprises a first siloxane compound comprising at least one cyclic siloxane moiety and a first salt, the first salt comprising a conjugate base of a volatile organic acid. A method for producing a cross-linked siloxane network comprises the steps of providing a first siloxane compound comprising at least one cyclic siloxane moiety, providing a first salt comprising a conjugate base of a volatile organic acid, combining the first siloxane compound and the first salt to produce a reaction mixture, heating the reaction mixture to a temperature sufficient for the first salt to open the ring of the cyclic siloxane moiety, and maintaining the reaction mixture at an elevated temperature so that at least a portion of the opened cyclic siloxane moieties react with each other to produce a cross-linked siloxane network.

Organoamino-polysiloxanes, which have at least three silicon atoms, oxygen atoms, as well as an organoamino group, and methods for making the organoamino-polysiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-polysiloxanes are also disclosed.

Example patterning materials and pattern films are described. One example patterning material includes polysiloxane. The polysiloxane includes at least one cyclic structure formed by silicon-oxygen (Si—O) bond repetitions and an organic group connected to a Si atom in the at least one cyclic structure. A subset of Si atoms in the at least one cyclic structure are substituted by a metal element, and/or at least one organic group includes a halogen element.

An automotive wax emulsion created by a unique cold, reverse, water-in-oil (W/O) emulsion process is described herein. The emulsion is created at room temperatures under high shear in minutes. The formulation can carry various abrasive materials, shine enhancement actives, wax and lubrication components without preservatives. The formulation provides for an emulsion with unique “Quick-Break” type characteristics. When applied by hand, the emulsion breaks upon friction with the contact surface releasing the oil-soluble actives in a controlled manner that eliminates the need for electric or pneumatic machine buffing.