A film-forming composition including one selected from among a hydrolyzable silane compound, a hydrolysate of the compound, and a hydrolysis condensate of the compound, and a solvent, the film-forming composition wherein: the hydrolyzable silane compound contains a hydrolyzable silane having a cyano group in the molecule and being of the following Formula (1):

R.sup.1.sub.aR.sup.2.sub.bSi(R.sup.3).sub.4−(a+b)  (1)

(wherein R.sup.1 is a group bonded to a silicon atom and is an organic group containing a cyano group; R.sup.2 is a group bonded to a silicon atom via an Si—C bond, and is each independently a substitutable alkyl group, etc.; R.sup.3 is a group or atom bonded to a silicon atom, and is each independently a hydroxy group, an alkoxy group, an aralkyloxy group, an acyloxy group, or a halogen atom; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3).

Methods of depositing a metal film by exposing a substrate surface to a halide precursor and an organosilane reactant are described. The halide precursor comprises a compound of general formula (I): MQ.sub.zR.sub.m, wherein M is a metal, Q is a halogen selected from Cl, Br, F or I, z is from 1 to 6, R is selected from alkyl, CO, and cyclopentadienyl, and m is from 0 to 6. The aluminum reactant comprises a compound of general formula (II) or general formula (III): ##STR00001##
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.a, R.sup.b, R.sup.c, R.sup.d, R.sup.e, and R.sup.f are independently selected from hydrogen (H), substituted alkyl or unsubstituted alkyl; and X, Y, X′, and Y′ are independently selected from nitrogen (N) and carbon (C).

A composition contains a mixture of silyl hydride, a silanol and/or a silyl ether, and a Bridged Frustrated Lewis Pair.

A composition contains a mixture of silyl hydride, a silanol and/or a silyl ether, and a Bridged Frustrated Lewis Pair.

A composition contains an alpha-beta unsaturated ester, a silyl hydride, and a Bridged Frustrated Lewis Pair.

A composition contains an alpha-beta unsaturated ester, a silyl hydride, and a Bridged Frustrated Lewis Pair.

A fluoropolyether group-containing silane compound represented by the following formula (I): R.sup.F1—R.sup.4—(OR.sup.3).sub.m—R.sup.5—SiR.sup.1.sub.nR.sup.2.sub.3-n [wherein the symbols are as described in the specification]. Also disclosed is a surface-treating agent containing the silane compound; a pellet including the surface-treating agent; and an article including a substrate and a layer on a surface of the substrate, wherein the layer is formed of the silane compound or the surface-treating agent.

A fluoropolyether group-containing silane compound represented by the following formula (I): R.sup.F1—R.sup.4—(OR.sup.3).sub.m—R.sup.5—SiR.sup.1.sub.nR.sup.2.sub.3-n [wherein the symbols are as described in the specification]. Also disclosed is a surface-treating agent containing the silane compound; a pellet including the surface-treating agent; and an article including a substrate and a layer on a surface of the substrate, wherein the layer is formed of the silane compound or the surface-treating agent.

An energy-sensitive composition that yields a cured product with excellent crack resistance, a cured product of the composition, and a method of forming a cured product. The composition includes a polysilane and a thermal base generator, the thermal base generator including a compound represented by the following formula (b1),

##STR00001##

in which R.sup.b1 and R.sup.b2 each independently represents a halogen atom, a nitro group, an alkyl group, an aryl group, an arylalkyl group, or an alkoxy group, n1 represents an integer of 0 or more and 4 or less, n2 represents an integer of 0 or more and 3 or less, Z.sup.q+ represents a counter cation composed of an organic cation or a metal cation, and q represents an integer of 1 or more.

An energy-sensitive composition that yields a cured product with excellent crack resistance, a cured product of the composition, and a method of forming a cured product. The composition includes a polysilane and a thermal base generator, the thermal base generator including a compound represented by the following formula (b1),

##STR00001##

in which R.sup.b1 and R.sup.b2 each independently represents a halogen atom, a nitro group, an alkyl group, an aryl group, an arylalkyl group, or an alkoxy group, n1 represents an integer of 0 or more and 4 or less, n2 represents an integer of 0 or more and 3 or less, Z.sup.q+ represents a counter cation composed of an organic cation or a metal cation, and q represents an integer of 1 or more.