Patent classifications
C08G77/452
AMPHIPHILIC POLYMER SYSTEMS
The preparation of poly-2-oxazoline amphiphilic polymers and copolymers is described. Self-assembled particles comprising these amphiphilic polymers and which are useful for the targeted delivery of therapeutic and diagnostic agents are also described.
AMPHIPHILIC POLYMER SYSTEMS
The preparation of poly-2-oxazoline amphiphilic polymers and copolymers is described. Self-assembled particles comprising these amphiphilic polymers and which are useful for the targeted delivery of therapeutic and diagnostic agents are also described.
COSMETIC COMPOSITION FOR SKIN
The present invention relates to a cosmetic composition for skin containing a solvent A, a solvent B, and a polymer C, wherein a boiling point of the solvent A is lower than 99° C., and a distance Ra of the Hansen solubility parameter of the solvent A to water is 36 or less; a boiling point of the solvent B is 150° C. or higher, and a distance Ra of the Hansen solubility parameter of the solvent B to water is 40 or more; and the solvent B is compatible with the solvent A, and the polymer C is soluble in the solvent A but insoluble in the solvent B; and to a cosmetic coating film for skin,
SILICOUS FILM FORMING COMPOSITION COMPRISING BLOCK COPOLYMER AND METHOD FOR PRODUCING SILICEOUS FILM USING SAME
According to the present invention, a siliceous film forming composition, which is capable of filling trenches having narrow widths and high aspect ratios and forming a thick film, can be provided. A siliceous film forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, and (b) a solvent.
SILICOUS FILM FORMING COMPOSITION COMPRISING BLOCK COPOLYMER AND METHOD FOR PRODUCING SILICEOUS FILM USING SAME
According to the present invention, a siliceous film forming composition, which is capable of filling trenches having narrow widths and high aspect ratios and forming a thick film, can be provided. A siliceous film forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, and (b) a solvent.
BLOCK-MODIFIED POLYSILOXANES AND COMPOSITIONS FORMED THEREOF
Block-modified polysiloxanes and compositions comprising the block-modified polysiloxanes are useful in the field of textile finishing. Emulsions comprising the compositions have a very small and narrowly distributed particle size which increases penetration, and provide good softening properties coupled with good hydrophilicity.
BLOCK-MODIFIED POLYSILOXANES AND COMPOSITIONS FORMED THEREOF
Block-modified polysiloxanes and compositions comprising the block-modified polysiloxanes are useful in the field of textile finishing. Emulsions comprising the compositions have a very small and narrowly distributed particle size which increases penetration, and provide good softening properties coupled with good hydrophilicity.
Polysiloxazane compound, method for producing the same, and composition containing the same and cured product thereof
A polysiloxazane compound including a repeating unit of the following general formula (1), and having a number average molecular weight of 500 to 100,000 as measured by gel permeation chromatography versus polystyrene standards, ##STR00001##
wherein R.sup.1 and R.sup.2 each independently represent a substituted or unsubstituted C.sub.1-C.sub.50 monovalent hydrocarbon group optionally containing a hetero atom, Xs each independently represent a methyl group, an oxygen atom, NH—SiX.sub.2, or (NH).sub.(3-r)/2—SiR.sup.1R.sup.2.sub.r (R.sup.1 and R.sup.2 have the same meaning as provided above), or Xs are joined to one another to represent an oxygen atom, n is an integer of 0 to 8, when the number of NH—SiX.sub.2 is denoted by p, p satisfies 0≤p/(2n+4)≤0.5, r is an integer of 0, 1, or 2, and a and b are numbers satisfying 0<a≤1, 0≤b<1, and a+b=1.
AMORPHOUS SILICON FORMING COMPOSITION COMPRISING BLOCK COPOLYMER AND METHOD FOR PRODUCING AMORPHOUS SILICON FILM USING SAME
To provide an amorphous silicon forming composition, which has high affinity with a substrate, is excellent in filling properties, and is capable of forming a thick film. [Means for Solution] An amorphous silicon forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, wherein at least one silicon in the block A and at least one silicon in the block B are connected by a single bond and/or a crosslinking group comprising silicon, and (b) a solvent.
AMORPHOUS SILICON FORMING COMPOSITION COMPRISING BLOCK COPOLYMER AND METHOD FOR PRODUCING AMORPHOUS SILICON FILM USING SAME
To provide an amorphous silicon forming composition, which has high affinity with a substrate, is excellent in filling properties, and is capable of forming a thick film. [Means for Solution] An amorphous silicon forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, wherein at least one silicon in the block A and at least one silicon in the block B are connected by a single bond and/or a crosslinking group comprising silicon, and (b) a solvent.