The present invention provides a liquid polysiloxane comprising a siloxane-thiourea segment and a crosslinkable functional group(s) selected from one or more ethylenically unsaturated groups, silyl hydride groups, alkylenethiol groups and combinations thereof.

The present invention provides a liquid polysiloxane comprising a siloxane-thiourea segment and a crosslinkable functional group(s) selected from one or more ethylenically unsaturated groups, silyl hydride groups, alkylenethiol groups and combinations thereof.

Organoamino-polysiloxanes, which have at least three silicon atoms, oxygen atoms, as well as an organoamino group, and methods for making the organoamino-polysiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-polysiloxanes are also disclosed.

Organoamino-polysiloxanes, which have at least three silicon atoms, oxygen atoms, as well as an organoamino group, and methods for making the organoamino-polysiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-polysiloxanes are also disclosed.

Provided is a barrier film and a manufacturing method thereof. The barrier film has a structure comprising a polysilazane barrier layer, which can exhibit excellent running properties in a so-called roll-to-roll process or the like, and can maintain or improve the performance of the barrier layer even during an unwinding and/or winding process, and the like.

Provided is a barrier film and a manufacturing method thereof. The barrier film has a structure comprising a polysilazane barrier layer, which can exhibit excellent running properties in a so-called roll-to-roll process or the like, and can maintain or improve the performance of the barrier layer even during an unwinding and/or winding process, and the like.

A silirane-functionalized compound that consists of a substrate to which a least two silirane groups of the formula (1) are covalently bonded, a mixture containing the silirane-functionalized compounds, and a process for preparing siloxanes using the mixture are described herein.

The present invention is a normal temperature-curable hard coat composition containing at least (A) a polysilazane compound having structures shown by the following formula (1) and (B) an alkoxysilane compound. The ratio of [a] the number of Si—H bonds in the polysilazane compound and [b] the number of alkoxy groups in the alkoxysilane compound is in a range of [b]/[a]=1.5 to 3. The present invention provides the normal temperature-curable hard coat composition which has excellent workability on outdoors, cures at normal temperature, improves surface hardness of plastic materials, and is used as an alternative material to glass.

##STR00001##

The present invention is a normal temperature-curable hard coat composition containing at least (A) a polysilazane compound having structures shown by the following formula (1) and (B) an alkoxysilane compound. The ratio of [a] the number of Si—H bonds in the polysilazane compound and [b] the number of alkoxy groups in the alkoxysilane compound is in a range of [b]/[a]=1.5 to 3. The present invention provides the normal temperature-curable hard coat composition which has excellent workability on outdoors, cures at normal temperature, improves surface hardness of plastic materials, and is used as an alternative material to glass.

##STR00001##

A photosensitive resin composition containing (A) an acid-crosslinkable group-containing silicone resin, (B) a photo-acid generator, and (C) quantum dot particles. Thus, a photosensitive resin composition is capable of easily forming a film having favorable heat resistance, lithography resolution, and luminous properties; a photosensitive resin film and a photosensitive dry film are obtained by using the photosensitive resin composition; patterning processes use these; and a light emitting device is obtained by using the photosensitive resin composition.