C08G77/62

Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton
11466127 · 2022-10-11 · ·

[Problem] To provide a novel polymer, which fills trenches having narrow widths and high aspect ratios and can form a thicker film. [Means for Solution] The block copolymer comprises a linear or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon.

SURFACE PROPERTIES MODIFICATION OF DIGITALLY MANUFACTURED ARTICLES VIA REACTIVE SILICON-CONTAINING PRECURSOR POLYMERS
20220314273 · 2022-10-06 ·

Methods for forming a coated digitally manufactured part include forming an article by a digital manufacturing method; coating a surface of the article with a reactive silicon-containing precursor polymer; and treating the polymer to form a silica-containing coating, thereby forming the coated digitally manufactured part. An article includes a digitally manufactured part having surface striations; and a coating encapsulating the digitally manufactured part and comprising silica. An article includes a digitally manufactured part (i) formed by selective lase sintering, (ii) comprising a surface defined by coalesced particles, and (iii) having a surface roughness R.sub.a of at least 0.1 microns; and a coating encapsulating the part and comprising silica. A composition comprising polysilazane is described.

Composition and method for producing composition

The present disclosure relates to a composition including a light-emitting perovskite compound (1) which includes constituent components A, B, and X, and a silazane or modified product thereof (2).

WATER-BASED SILICONE COMBINATION SURFACE MODIFICATION COMPOSITIONS AND METHODS OF USE THEREOF

Described herein are compositions and methods for use in automotive care. In particular, the present disclosure is directed to water-based compositions comprising silicone combinations that delivery cleaning, protective, preservative and shine qualities.

SILAZANE-BASED COMPOUND, COATING COMPOSITION COMPRISING SAME, LIGHT-TRANSMITTING FILM HAVING COATING LAYER, AND DISPLAY DEVICE COMPRISING LIGHT-TRANSMITTING FILM
20230147233 · 2023-05-11 ·

Disclosed are a silazane-based compound represented by Formula 1, a coating composition containing the silazane-based compound, a light-transmitting film including a first coating layer containing the silazane-based compound, and a display apparatus including the light-transmitting film.

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METHOD FOR MANUFACTURING A COMPOSITE MATERIAL PART USING A HYBRID CROSS-LINKED COPOLYMER

A method for manufacturing a part made of composite material includes forming a ceramic matrix phase in pores of a fibrous preform by pyrolysis of a cross-linked copolymer ceramic precursor, the cross-linked copolymer including a first precursor macromolecular chain of a first ceramic having free carbon, and a second precursor macromolecular chain of a second ceramic having free silicon, the first macromolecular chain being bonded to the second macromolecular chain by cross-linking bridges including a bonding structure of formula *.sup.1—X—*.sup.2; in this formula, X designates boron or aluminium, -*.sup.1 designates the bond to the first macromolecular chain and -*.sup.2 the bond to the second macromolecular chain.

METHOD FOR MANUFACTURING A COMPOSITE MATERIAL PART USING A HYBRID CROSS-LINKED COPOLYMER

A method for manufacturing a part made of composite material includes forming a ceramic matrix phase in pores of a fibrous preform by pyrolysis of a cross-linked copolymer ceramic precursor, the cross-linked copolymer including a first precursor macromolecular chain of a first ceramic having free carbon, and a second precursor macromolecular chain of a second ceramic having free silicon, the first macromolecular chain being bonded to the second macromolecular chain by cross-linking bridges including a bonding structure of formula *.sup.1—X—*.sup.2; in this formula, X designates boron or aluminium, -*.sup.1 designates the bond to the first macromolecular chain and -*.sup.2 the bond to the second macromolecular chain.

METHOD FOR TREATING SURFACE OF SUBSTRATE, METHOD FOR REGION-SELECTIVELY PRODUCING FILM ON SURFACE OF SUBSTRATE, AND SURFACE TREATMENT AGENT
20230187200 · 2023-06-15 ·

A method for treating surface of substrate, the method including forming a film including a high molecular weight condensate of a silylation agent on the surface thereof to allow a substrate having a plurality of regions to be modified at modification degrees that are different depending on materials of the regions on a surface of the substrate. The method includes preparing a substrate having a surface including two or more regions having different materials; exposing the surface to a surface treatment agent; and baking the substrate, the method not including rinsing the surface with a liquid between the exposing and the baking, the surface treatment agent including a silylation agent and not a nitrogen-containing heterocyclic compound, the silylation agent including organomonosilane that has 2 to 4 nitrogen atoms bonded to a silicon atom.

METHOD FOR TREATING SURFACE OF SUBSTRATE, METHOD FOR REGION-SELECTIVELY PRODUCING FILM ON SURFACE OF SUBSTRATE, AND SURFACE TREATMENT AGENT
20230187200 · 2023-06-15 ·

A method for treating surface of substrate, the method including forming a film including a high molecular weight condensate of a silylation agent on the surface thereof to allow a substrate having a plurality of regions to be modified at modification degrees that are different depending on materials of the regions on a surface of the substrate. The method includes preparing a substrate having a surface including two or more regions having different materials; exposing the surface to a surface treatment agent; and baking the substrate, the method not including rinsing the surface with a liquid between the exposing and the baking, the surface treatment agent including a silylation agent and not a nitrogen-containing heterocyclic compound, the silylation agent including organomonosilane that has 2 to 4 nitrogen atoms bonded to a silicon atom.

POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME
20230174724 · 2023-06-08 ·

[Problem] To provide a polycarbosilazane making it possible to form a silicon-containing film which is bearable to acid etching, and a composition comprising the polycarbosilazane. [Means for Solution] The present invention provides a polycarbosilazane comprising a repeating unit of —[R.sup.1R.sup.2Si—(CH.sub.2).sub.n]— and —(R.sup.3R.sup.4Si—NR.sup.5)—, wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are each independently a single bond, hydrogen or C.sub.1-4 alkyl; R.sup.5 is independently a single bond or hydrogen; and n is 1-2, and a composition comprising the polycarbosilazane. The present invention also provides a method for forming a silicon-containing film, comprising coating the composition above a substrate and heating.