Embodiments of the present disclosure provide a method of manufacturing a metal column using 3D printing technology. The method of manufacturing a metal column includes steps of: creasing a 3D-CAD design for printing the metal column; printing the metal column; pretreating the inner surface of a channel inside the metal column at low temperature; and coating the inner surface of the channel with a stationary phase so that the metal column is capable of separating a gas mixture into components.

The composition of the present invention is a mixed composition including at least one metal compound (G) selected from a metal compound represented by the following formula (G1) and a condensate thereof, a polysilazane (F), and a solvent (I), in which an amount of the polysilazane (F) is 0.01% by mass or more and less than 50% by mass.

M(R.sup.g10).sub.r(A.sup.g1).sub.m-r  (G1)

In formula (G1), M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta, R.sup.g10 represents a hydrocarbon chain-containing group or a hydrogen atom, r is 0 or 1, a plurality of A.sup.g1 each independently represent a hydrolyzable group, and m is an integer of 3 to 5 in accordance with the metal atom M.

The composition of the present invention is a mixed composition including at least one metal compound (G) selected from a metal compound represented by the following formula (G1) and a condensate thereof, a polysilazane (F), and a solvent (I), in which an amount of the polysilazane (F) is 0.01% by mass or more and less than 50% by mass.

M(R.sup.g10).sub.r(A.sup.g1).sub.m-r  (G1)

In formula (G1), M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta, R.sup.g10 represents a hydrocarbon chain-containing group or a hydrogen atom, r is 0 or 1, a plurality of A.sup.g1 each independently represent a hydrolyzable group, and m is an integer of 3 to 5 in accordance with the metal atom M.

A mixed composition including an organosilicon compound (A) in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, a metal compound (B), an acid (C), and water (D), in which a ratio [D/(A+B)] of a molar amount of the water (D) to a total molar amount of the organosilicon compound (A) and the metal compound (B) is 3.1 to 130.

Provided are a silylamine compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition, and more particularly, to a silylamine compound capable of being usefully used as a precursor of a silicon-containing thin film, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition.

Provided are a silylamine compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition, and more particularly, to a silylamine compound capable of being usefully used as a precursor of a silicon-containing thin film, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition.

A polysiloxazane compound including a repeating unit of the following general formula (1), and having a number average molecular weight of 500 to 100,000 as measured by gel permeation chromatography versus polystyrene standards, ##STR00001##
wherein R.sup.1 and R.sup.2 each independently represent a substituted or unsubstituted C.sub.1-C.sub.50 monovalent hydrocarbon group optionally containing a hetero atom, Xs each independently represent a methyl group, an oxygen atom, NH—SiX.sub.2, or (NH).sub.(3-r)/2—SiR.sup.1R.sup.2.sub.r (R.sup.1 and R.sup.2 have the same meaning as provided above), or Xs are joined to one another to represent an oxygen atom, n is an integer of 0 to 8, when the number of NH—SiX.sub.2 is denoted by p, p satisfies 0≤p/(2n+4)≤0.5, r is an integer of 0, 1, or 2, and a and b are numbers satisfying 0<a≤1, 0≤b<1, and a+b=1.

A polysiloxazane compound including a repeating unit of the following general formula (1), and having a number average molecular weight of 500 to 100,000 as measured by gel permeation chromatography versus polystyrene standards, ##STR00001##
wherein R.sup.1 and R.sup.2 each independently represent a substituted or unsubstituted C.sub.1-C.sub.50 monovalent hydrocarbon group optionally containing a hetero atom, Xs each independently represent a methyl group, an oxygen atom, NH—SiX.sub.2, or (NH).sub.(3-r)/2—SiR.sup.1R.sup.2.sub.r (R.sup.1 and R.sup.2 have the same meaning as provided above), or Xs are joined to one another to represent an oxygen atom, n is an integer of 0 to 8, when the number of NH—SiX.sub.2 is denoted by p, p satisfies 0≤p/(2n+4)≤0.5, r is an integer of 0, 1, or 2, and a and b are numbers satisfying 0<a≤1, 0≤b<1, and a+b=1.

A Si-containing film forming composition comprising a catalyst and/or a polysilane and a N—H free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising N—H free repeating units having the formula [—N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y=0, 1, or 2 with x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 with x+y=3. Also disclosed are synthesis methods and applications for using the same.

A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor; introducing into the reactor at least one silicon-containing compound and at least one multifunctional organoamine compound to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon carbonitride coating has excellent mechanical properties.