The present invention encompasses compositions comprising a polyurethane and a block copolymer with at least two homopolymer subunits. In one aspect, compositions of the present disclosure are coating compositions. In another aspect, compositions of the present disclosure are adhesive compositions.

The invention relates a polyacrylate-polysilane block copolymer of general structure (I): wherein m and n independent of one another, are integers ranging from 2 to 4000; p is an integer ranging from 0 to 5; q is an integer ranging from 1 to 5; R.sup.1 represents hydrogen, straight-chain or branched alkyl group having 1 to 4 carbon atoms; R.sup.2 represents hydrogen, straight-chain or branched alkyl group having 1 to 18 carbon atoms; R3 represents hydrogen, hydroxyl group, straight-chain or branched alkyl group having 1 to 4 carbon atoms, or an C.sub.6-C.sub.14 aryl group; L is a linking moiety representing amine (NH) group, amide (C(O)NH) group, urea (NHC(O)NH) group, urethane (OC(O)NH) group or methylene (CH.sub.2) group; R.sup.4, R.sup.5 and R.sup.6 independent of one another, represents hydrogen, straight-chain or branched, alkyl group having 1 to 8 carbon atoms or polydimethylsiloxane group; and R.sup.7 represents hydrogen or methyl group.

##STR00001##

The present invention provide a composition comprising: a polyacrylate-polysilane block copolymer of structure (I) and an organic polymer which is different from the block copolymer of formula (I) wherein m and n independent of one another, are integers ranging from 2 to 4000; p is an integer ranging from 0 to 5; q is an integer ranging from 1 to 5; R.sub.1 represents hydrogen, straight-chain or branched alkyl group having 1 to 4 carbon atoms; R.sub.2 represents hydrogen, straight-chain or branched alkyl group having 1 to 18 carbon atoms; R.sub.3 represents hydrogen, hydroxyl group, straight-chain or branched alkyl group having 1 to 4 carbon atoms, or an C.sub.6-C.sub.14-aryl group; L is a single bond or a bivalent group NH, C(O)NH, NHC(O)NH, OC(O)NH or CH.sub.2; R.sup.4, R.sup.5 and R.sup.6 independent of one another, represent hydrogen, straight-chain or branched alkyl group having 1 to 8 carbon atoms or a polydimethylsiloxane residue; and R.sup.7 represents hydrogen or methyl group.

##STR00001##

Provided herein are methods of forming solid-state ionically conductive composite materials that include particles of an inorganic phase in a matrix of an organic phase. The methods involve forming the composite materials from a precursor that is polymerized in-situ after being mixed with the particles. The polymerization occurs under applied pressure that causes particle-to-particle contact. In some embodiments, once polymerized, the applied pressure may be removed with the particles immobilized by the polymer matrix. In some implementations, the organic phase includes a cross-linked polymer network. Also provided are solid-state ionically conductive composite materials and batteries and other devices that incorporate them. In some embodiments, solid-state electrolytes including the ionically conductive solid-state composites are provided. In some embodiments, electrodes including the ionically conductive solid-state composites are provided.

One or more embodiments relate to an electrically conductive polymer with a crosslinkable additive. The electrically conductive polymer is a directly photopatternable Poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) PEDOT:PSS film with cross-linked network made of a plurality of monomers. The directly photopatternable PEDOT:PSS film PEDOT as such has a better conductivity and stretchability compared to its other counterparts. The directly photopatternable PEDOT:PSS film can further be supplemented with poly(ethylene glycol) diacrylate (PEGDA) which can help with the removal of PSS. Advantageously, the PEGDA supplemented PEDOT:PSS film can exhibit a larger charge storage capacity.

The present invention provides chemical mechanical (CMP) polishing pads for polishing a substrate chosen from a semiconductor substrate comprising the CMP polishing pad and having one or more endpoint detection windows which is the cured product of a reaction mixture of a linear cycloaliphatic urethane macromonomer having two (meth)acrylate endgroups bound via cycloaliphatic dicarbamate esters to a polyether, polycarbonate or polyester chain having an average molecular weight of from 450 to 2,000, or an cycloaliphatic urethane oligomer thereof, and an aliphatic initiator, wherein the total isocyanate content in the urethane macromonomer ranges from 3.3 to 10 wt. %, and, further wherein, the composition comprises less than 5 wt. % of unreacted (meth)acrylate monomer and is substantially free of unreacted isocyanate. Regardless of their hardness or lack thereof, the endpoint detection windows provide excellent durability when wet.

Provided herein are methods of forming solid-state ionically conductive composite materials that include particles of an inorganic phase in a matrix of an organic phase. The methods involve forming the composite materials from a precursor that is polymerized in-situ after being mixed with the particles. The polymerization occurs under applied pressure that causes particle-to-particle contact. In some embodiments, once polymerized, the applied pressure may be removed with the particles immobilized by the polymer matrix. In some implementations, the organic phase includes a cross-linked polymer network. Also provided are solid-state ionically conductive composite materials and batteries and other devices that incorporate them. In some embodiments, solid-state electrolytes including the ionically conductive solid-state composites are provided. In some embodiments, electrodes including the ionically conductive solid-state composites are provided.

In various embodiments, the present invention is directed to new low cost initiator compositions for use with the production of well-defined telechelic PIBs (by LC.sup.+P of isobutylene). In various other embodiments, the present invention is directed to methods for using these novel compositions as initiators for isobutylene (IB) and other cationically polymerizable monomers, such as styrene and its derivatives. In still other embodiments, the present invention is directed to structurally new, allyl (and chlorine) telechelic PIBs formed from these new initiator compositions and their derivatives (in particular, hydroxyl telechelic PIB and amine telechelic PIB). In yet other embodiments, the present invention is directed to structurally new polyurethanes, polyureas, and polyurethane ureas made using telechelic PIBs formed from these new initiator compositions.

A sulfonated nanocellulose or sulfonated cellulose may be synthesized. A polyaniline emeraldine may be doped with the sulfonated nanocellulose or sulfonated cellulose to form a sulfonated nanocellulose-doped polyaniline or a sulfonated cellulose-doped polyaniline.

In one embodiment, a silicone-based ink for additive manufacturing includes a vinyl-terminated siloxane macromer, a hydrophobic reinforcing filler, and a rheology modifying additive. In another embodiment, a method of additive manufacturing with silicone-based ink includes adding a mixture that includes a vinyl-terminated siloxane macromer, a hydrophobic reinforcing filler, and a rheology modifying additive to a cartridge for additive manufacturing, extruding the mixture through the cartridge to form a structure, and curing the mixture to at least a predefined extent.