Patent classifications
C08G2261/76
Fabrication of dental appliances
A dental appliance made of an olefin polymer is directly formed via rapid prototyping without the use of an intermediary physical mold. A polymer precursor solution includes one or more olefin-containing monomers and/or oligomers, an olefin polymerization catalyst, and a UV absorbing agent to limit penetration of the UV light through the polymer precursor solution. One or more reactions of the polymer precursor solution are modulated in response to UV light, and the polymer precursor solution may further include an inhibitor (quenching agent) configured to modulate those reactions. The polymer precursor solution can be deposited using UV-cured stereolithographic or 3D printing methods to form appliances exhibiting improved elongation at break characteristics and suitable stress resistance.
HYDROCARBON-CONTAINING POLYMERS WITH TWO ALKOXYSILANE END GROUPS
The invention relates to a hydrocarbon polymer containing two alcoxysilane end groups having the following Formula (I). The invention also relates to a method for preparing said polymer, to an adhesive composition containing said polymer, and to the use of said adhesive composition.
MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE
A material for forming an underlayer film according to the present invention is a material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the material including a cyclic olefin polymer which has a repeating structural unit [A] represented by Formula (1) and a repeating structural unit [B] represented by Formula (2), in which a molar ratio [A]/[B] of the structural unit [A] to the structural unit [B] in the cyclic olefin polymer is greater than or equal to 5/95 and less than or equal to 95/5.
##STR00001##
OLIGOMER, COMPOSITION AND COMPOSITE MATERIAL EMPLOYING THE SAME
An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be
##STR00001##
or a combination thereof, wherein a is 0 or 1, and R.sup.1 is independently hydrogen
##STR00002##
or and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is
##STR00003##
wherein R.sup.2 is C.sub.5-10 alkyl group. The reactant (d) is
##STR00004##
wherein e is 0-10.
POLYBENZOXAZINE PRECURSOR AND METHOD FOR PREPARING SAME
This invention relates to a polybenzoxazine precursor and a method of preparing the same, and more particularly, to a polybenzoxazine precursor which includes benzoxazine obtained by reacting a phenol novolak resin with an aldehyde compound and allylamine and diaminodiphenylmethane as an amine compound, and to a method of preparing the same. The polybenzoxazine precursor may serve to prepare a hardened material having excellent thermal and electrical characteristics and dimensional stability. Accordingly, the polybenzoxazine precursor may be available for use in a copper clad laminate, a semiconductor encapsulant, a printed circuit board, an adhesive, a paint, and a mold.
Materials for electronic devices
The present application relates to a polymer containing at least one structural unit of a formula (I) and at least one further structural unit selected from structural units A, B and C. The present application further relates to the use of the polymer in an electronic device and to a process for preparing the polymer. The present application further relates to an electronic device comprising the polymer.
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER HAVING ARYLENE GROUP
A resist underlayer film-forming composition for lithography process having characteristics of enabling wafer surface planarization after film formation, excellent planarization performance on substrate with level difference, and good embeddability in fine hole pattern. The resist underlayer film-forming composition including polymer having unit structure of Formula (1) and solvent,
##STR00001##
wherein each of R.sup.1 to R.sup.4 is independently hydrogen atom or methyl group, and X.sup.1 is divalent organic group having at least one arylene group optionally substituted by alkyl group, amino group, or hydroxyl group, and wherein X.sup.1 in Formula (1) is organic group of Formula (2),
##STR00002##
wherein A.sup.1 is phenylene group or naphthylene group, A.sup.2 is phenylene group, naphthylene group, or organic group of Formula (3), and dotted line is bond, and
##STR00003##
wherein each of A.sup.3 and A.sup.4 is independently phenylene group or naphthylene group, and dotted line is bond.
Isocyanate Free Binder
The present invention relates to a resin composition that comprises an acetoacetate ester compound with at least two acetoacetate ester functional groups, an acrylate compound with at least two acrylate functional groups, and a tertiary amine curing catalyst. This resin composition acts as an isocyanate-free binder that is less toxic to the environment. The invention further discloses a method for preparation fiber reinforced parts comprising fibers and said resin composition as well as a method for the preparation of foundry molds for the casting industry, which is based on said binder.
THREE-DIMENSIONAL INKJET PRINTING USING RING-OPENING METATHESIS POLYMERIZATION
Methods for fabricating three-dimensional objects by 3D-inkjet printing technology are provided. The methods utilize curable materials that polymerize via ring-opening metathesis polymerization (ROMP) for fabricating the object. Systems suitable for performing these methods and kits containing modeling material formulations usable in the methods are also provided.
ORGANIC LIGHT EMITTING DEVICE
An organic light-emitting device (100) comprising an anode (103); a cathode (109); a light-emitting layer (107) between the anode and the cathode; a first hole-transporting layer (105A) comprising a first conjugated hole-transporting polymer between the anode and the light-emitting layer; and a second hole-transporting layer (105B) comprising a second conjugated hole-transporting polymer between the first hole-transporting layer and the light-emitting layer, wherein a lowest excited state energy level of the first hole-transporting polymer is lower than the lowest excited state energy of the second hole-transporting polymer.