Provided are a heat-resistant synthetic resin microporous film that has both good heat resistance and good mechanical strength and exhibits a suppressed decrease in mechanical strength over time, and a method for producing the heat-resistant synthetic resin microporous film. The heat-resistant synthetic resin microporous film of the present invention includes a synthetic resin microporous film, and a coating layer formed on at least part of the surface of the synthetic resin microporous film and containing a polymer of a polymerizable compound having two or more radically polymerizable functional groups per molecule. The maximum thermal shrinkage rate of the heat-resistant synthetic resin microporous film when heated from 25° C. to 180° C. at a temperature rising rate of 5° C./min is 15% or less. The piercing strength thereof is 0.6 N or more. The rate of retention of the piercing strength after heating at 70° C. for 168 hours is 85% or more.

The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.

The present invention relates to a decorative material having excellent printability, and the decorative material according to the present invention has an ink-receiving layer having a radially fine sloping structure having a dendritic shape, whereby the absorbing and/or fixing property, i.e., printability, of the ink printed on the ink-receiving layer is improved, and clarity is excellent, so that aesthetic effects are excellent. In addition, since the ink-receiving layer is manufactured through UV curing, it can be directly coated on a substrate layer, and can include various kinds of substrate layers; and since it is manufactured using a solvent-free type resin composition without using an organic solvent, and has an excellent absorbing and/or fixing property with respect to a water soluble ink, it has environmental friendly advantages.

This disclosure is directed to methods for preparing thermoplastic surfaces suitable for the application of paint, adhesives, or surfacing films and the structures derived or derivable from these methods. The disclosure is also directed to composite structures comprising a thermoplastic substrate comprising a chemical sealant direct bonded to a surface thereof, the chemical sealant providing a surface suitable for adhering adhesives, paints, and/or surfacing films to the thermoplastic surfaces.

A method is used to provide an electrically-conductive polyaniline pattern by providing a uniform layer of a photocurable composition on a substrate. The photocurable composition comprises a water-soluble reactive polymer comprising (a) greater than 40 mol % of recurring units comprising sulfonic acid or sulfonate groups, and (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The photocurable composition is exposed to cause crosslinking via [2+2] photocycloaddition of the (b) recurring units, thereby forming a crosslinked polymer. Any remaining water-soluble reactive polymer is removed. The crosslinked polymer is contacted with an aniline reactive composition having aniline monomer and up to 0.5 molar of an aniline oxidizing agent, thereby forming an electrically-conductive polyaniline disposed either within, on top of, or both within and on top of, the crosslinked polymer.

The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.

The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

Methods of making crosslinked polymeric materials and crosslinked interlocked hybrid polymeric materials using photoinitiator, antioxidant, additive, and photoirradiation of polymeric blend and/or interlocked hybrid materials are provided. Methods of spatially controlling macroscopic properties and morphology of polymeric materials, and products made by the methods also are provided.

The instant invention provides a multilayer structure comprising: (a) a substrate, wherein said substrate is optionally surface treated on at least one surface and has a surface energy in the range of at least 32 dyn, (b) a sealing layer derived from the application of one or more aqueous dispersions to at least a portion of said at least one surface of said substrate, and wherein the one or more aqueous dispersion comprise the melt kneading product of: (a) one or more a base polymers selected from the group consisting of ethylene and optionally one or more α-olefins, propylene and optionally one or more α-olefins; (b) one or more a stabilizing agents; (c) in the presence of a neutralizing agent and (d) water.

The polymer film of the present invention has through holes extending from one principal surface of the polymer film to the other principal surface of the polymer film. The through holes are straight holes having a central axis extending straight, and have a shape in which the area of a cross-section perpendicular to the direction of the central axis increases from the one principal surface of the polymer film toward the other principal surface. This polymer film has passages in its thickness direction, has an unconventional structure, and can be used in various applications, such as in a waterproof sound-permeable membrane, in a waterproof gas-permeable membrane, and in a suction sheet. The ratio a/b of the opening diameter a of the through holes at the one principal surface to the opening diameter b of the through holes at the other principal surface is 80% or is less than 80%.