Ionized radiation-absorbed, dose sensitive, highly flexible polymeric compositions are provided that exhibits multidirectional changes in refractive index. Also provided are methods of producing a precision multi-directional nanogradient of refractive index in a polymeric composition.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.

The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.

A composition for manufacturing a crosslinked ethylene tetrafluoroethylene (ETFE) copolymer with enhanced abrasion resistance and heat resistance is provided, the composition including ETFE, about 0.1-10% w/w of a metal oxide that effectively scavenges high levels of fluoride ions; and a crosslinking agent. Methods of using and making the composition are also provided.

To suppress a decrease over time in the adhesion of ink to a thermoplastic resin film, provided is a thermoplastic resin film containing an inorganic filler, wherein at least one surface of the thermoplastic resin film satisfies the following formula (1) and formula (2):

0.8≤S1/S0≤1.0  (1)

3.0≤S0  (2) wherein S0 represents an oxygen atom concentration (atm %) before a washing treatment (A) is carried out, S1 represents the oxygen atom concentration (atm %) after the washing treatment (A) is carried out, the oxygen atom concentration is a ratio of the number of oxygen atoms to a sum of the number of oxygen atoms and the number of carbon atoms measured by XPS (X-ray photoelectron spectroscopy) (number of oxygen atoms/(number of oxygen atoms+number of carbon atoms)), and the washing treatment (A) is a washing treatment carried out using distilled water.

An approach for curing ultraviolet sensitive polymer materials (e.g., polymer inks, coatings, and adhesives) using ultraviolet radiation is disclosed. The ultraviolet sensitive polymer materials curing can utilize ultraviolet light at different wavelength emissions arranged in a random, mixed or sequential arrangement. In one embodiment, an ultraviolet light C (UV-C) radiation emitter having a set of UV-C sources that emit UV-C radiation at a predetermined UV-C duration and intensity operate in conjunction with an ultraviolet light B (UV-B) radiation emitter having a set of UV-B sources configured to emit UV-B radiation at a predetermined UV-B duration and intensity and/or an ultraviolet light A (UV-A) radiation emitter having a set of UV-A sources configured to emit UV-A radiation at a predetermined UV-A duration and intensity, to cure the ultraviolet sensitive polymer materials.

Modified fluoropolymers, and methods for manufacturing modified fluoropolymers are provided. According to at least one embodiment, chemically modified fluoropolymers, via radical generation and subsequent reaction, produce fluoropolymers having fluorinated moieties and/or non-fluorinated moieties, disrupting highly coherent polar domains, wherein the non-fluorinated moieties include, for example, at least one of carbonyl, hydroxyl, alkoxy, alkyl, and/or aromatic chemical groups.

Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.