Provided is a composition for a self-suction adhering foam sheet that can be used to obtain a self-suction adhering foam laminate sheet that has excellent air releasability while also inhibiting formation of resin residue on metal after weathering. The composition for a self-suction adhering foam sheet contains a polymer including an unsaturated carboxylic acid monomer unit in a proportion of not less than 0.1 mass % and not more than 20 mass %, a cross-linker, and 1.5 parts by mass or more of a higher fatty acid salt per 100 parts by mass of the polymer.

A polymer composition including a crosslinkable thermoplastic matrix, a crosslinking agent, a blowing agent, and at least one cell opener is provided. A method of producing an open cell polymer foam from the polymer composition is also provided. The method includes heating a foamable precursor under positive pressure to a temperature greater than a decomposition temperature of the crosslinking agent and below a decomposition temperature of the chemical blowing agent to produce a primary foam. Then, the method includes heating the primary foam to a temperature greater than the decomposition temperature of the chemical blowing agent and then allowing the primary foam to cool to a temperature below a softening temperature of the crosslinkable thermoplastic polymer to form the open cell polymer foam. The produced open cell polymer foam has an open cell content of at least 80% immediately following the step of allowing the primary foam to cool.

The present invention relates to a composite film that is capable of converting mechanical energy to electrical energy. The film comprises a substrate and piezoelectric nanoparticles that are configured to form a plurality of pores. The present film is flexible and highly porous, providing high permittivity and beneficial porosity-mediated mechanical properties. When used in a piezoelectric nanogenerator (PNG), the film provides enlarged bulk film strain and reduced film impedance, resulting in a high efficiency PNG with increased output voltage and current as compared to known PNGs. A method of synthesizing the film is also described. The provided method is simple and cost-effective.

A material that includes a polymer foam and at least one polar dopant molecule included in the polymer foam, wherein the material is a piezoelectric.

An embodiment relates to a porous polyurethane polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors and a process for preparing the same. In the porous polyurethane polishing pad, the polishing performance (or polishing rate) thereof can be controlled by adjusting the size and distribution of pores in the polishing pad.

Embodiments relate to a porous polyurethane polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors and a process for producing the same. In the porous polyurethane polishing pad, it is possible to control the size and distribution of pores, whereby the polishing performance (i.e., polishing rate) of the polishing pad can be adjusted, by way of employing thermally expanded microcapsules as a solid phase foaming agent and an inert gas as a gas phase foaming agent.

Disclosed herein are matrices, compositions and methods of making matrices. The matrix comprises a biomolecule and the matrix is a dried, cross-linked foam. The matrix is not lyophilized. The method comprises foaming the composition, crosslinking the composition and drying the composition. Matrices disclosed herein are useful as wound dressings and treating wounds.

A polyurethane foam is disclosed having unique load bearing characteristics rendering it suitable for a variety of applications. The foam exhibits high surface-softness and smoothness properties, making it well-suited for use in articles such as pillows and mattress toppers. However, upon continued application of pressure, the resilience of the foam increases sharply, translating into a remarkable support characteristics that make the foam suitable for use in the seat portions of chairs and sofas, as well as in the base portion of mattresses. The foams therefore address the limitations of conventional, high-resilience and visco-elastic polyurethane foams. A process of making the foam and its use in various articles is also disclosed.

Embodiments relate to a porous polyurethane polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors and a process for preparing the same. According to the embodiments, the size and distribution of the plurality of pores contained in the porous polyurethane polishing pad can be adjusted. Thus, it is possible to provide a porous polyurethane polishing pad that has enhanced physical properties such as a proper level of withstand voltage, excellent polishing performance (i.e., polishing rate), and the like.

The invention provides a stabilising composition for polymeric materials, comprising: a. a first derivatised phenolic antioxidant; b. at least one secondary arylamine having the formula (I): NHRyRx wherein: the or each R, which may be the same or different, independently denotes an optionally substituted hydrocarbyl group; x and y are each independently from 0 to 5 provided that at least one of x and y is at least 1; and provided that at least one R is an optionally substituted hydrocarbyl group having at least 9 carbon atoms; and c. one or more antioxidant boosters independently selected from: i. a second derivatised phenolic antioxidant having lower steric hindrance than the first derivatised phenolic antioxidant; ii. a hindered amine; iii. an optionally substituted phenothiazine; and also the use of the stabilising composition for stabilising polyol and/or polyurethane; and a stabilised composition comprising a polyol and/or polyurethane and the aforementioned low emission and anti-scorch stabilising composition.

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