The present invention relates to a copolymer (A) having a glass transition temperature T.sub.g of at least −30° C. obtainable by copolymerization of a mixture of olefinically unsaturated monomers (a) in at least one organic solvent and in the presence of at least one initiator, where the mixture of monomers (a) to be polymerized comprises (a1) 10 to 60 mol % of at least one monomer of the formula (I) below

##STR00001## where R.sub.1=C.sub.1 to C.sub.4 alkoxy, R.sub.2=C.sub.1 to C.sub.4 alkyl, and m=0 to 2, and (a2) 40 to 90 mol % of at least one olefinically unsaturated monomer selected from the group consisting of monomers of the formulae H.sub.2C═CH.sub.2—(C═O)—O—R.sub.x, H.sub.2C═CH(CH.sub.3)—(C═O)—O—R.sub.x, and H.sub.2C═CH.sub.2—O—(C═O)—R.sub.x, where R.sub.x is an alkyl radical having 1 to 20 carbon atoms,
and where the sum total of the molar fractions of the monomers (a1) and (a2), based on the total molar amount of monomers (a) used, is at least 90 mol %, and where the copolymerization is carried out at a temperature from 60 to 200° C. and at a pressure of at least 2 bar.

The present invention relates to a copolymer (A) having a glass transition temperature T.sub.g of at least −30° C. obtainable by copolymerization of a mixture of olefinically unsaturated monomers (a) in at least one organic solvent and in the presence of at least one initiator, where the mixture of monomers (a) to be polymerized comprises (a1) 10 to 60 mol % of at least one monomer of the formula (I) below

##STR00001## where R.sub.1=C.sub.1 to C.sub.4 alkoxy, R.sub.2=C.sub.1 to C.sub.4 alkyl, and m=0 to 2, and (a2) 40 to 90 mol % of at least one olefinically unsaturated monomer selected from the group consisting of monomers of the formulae H.sub.2C═CH.sub.2—(C═O)—O—R.sub.x, H.sub.2C═CH(CH.sub.3)—(C═O)—O—R.sub.x, and H.sub.2C═CH.sub.2—O—(C═O)—R.sub.x, where R.sub.x is an alkyl radical having 1 to 20 carbon atoms,
and where the sum total of the molar fractions of the monomers (a1) and (a2), based on the total molar amount of monomers (a) used, is at least 90 mol %, and where the copolymerization is carried out at a temperature from 60 to 200° C. and at a pressure of at least 2 bar.

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##

A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##

Provided is a copolymer which has a mass average molecular weight (Mw) of 240,000 or greater and 3,500,000 or less, a structural unit derived from an acrylate (B1) and a structural unit derived from aromatic vinyl (B2), and a branched structure.

A foundry mix includes a major amount of a foundry aggregate and an effective binding amount of a binder system. The binder system cures in the presence of sulfur dioxide and a free radical initiator. The binder system may include (1) 10 to 70 parts by weight of an epoxy novolac resin; (2) 0.5 to 10 parts by weight of resorcinol; (3) 20 to 70 parts by weight of a monomeric or polymeric acrylate; and (4) an effective amount of a free radical initiator. Notably, (1), (2), (3) and (4) are separate components or mixed with another of said components, provided (4) is not mixed with (3) until a foundry mix is to be created, where said parts by weight are based upon 100 parts of the binder system.

A foundry mix includes a major amount of a foundry aggregate and an effective binding amount of a binder system. The binder system cures in the presence of sulfur dioxide and a free radical initiator. The binder system may include (1) 10 to 70 parts by weight of an epoxy novolac resin; (2) 0.5 to 10 parts by weight of resorcinol; (3) 20 to 70 parts by weight of a monomeric or polymeric acrylate; and (4) an effective amount of a free radical initiator. Notably, (1), (2), (3) and (4) are separate components or mixed with another of said components, provided (4) is not mixed with (3) until a foundry mix is to be created, where said parts by weight are based upon 100 parts of the binder system.

Expandable chlorinated vinyl chloride-based resin particles from which a chlorinated vinyl chloride-based resin foamed molded product achieving both high expansion ratio and excellent surface appearance are provided. The expandable chlorinated vinyl chloride-based resin particles have a porosity of not more than 5.5 (ml/100 g).

Expandable chlorinated vinyl chloride-based resin particles from which a chlorinated vinyl chloride-based resin foamed molded product achieving both high expansion ratio and excellent surface appearance are provided. The expandable chlorinated vinyl chloride-based resin particles have a porosity of not more than 5.5 (ml/100 g).

An apparatus and methods for using coatings for metal applications are disclosed. According to one embodiment, an article comprises a cured polymeric film having a first reaction product of a cationic photoinitiator and a compound suitable for cationic polymerization. The article has a second reaction product of a free-radical photoinitiator and a compound suitable for free-radical polymerization; The article has a metal substrate, wherein the cured polymeric film coats the metal substrate.