An optical resin material for chromatic aberration correction is provided including at least 5% by mass of a compound (component A) represented by formula (1) or formula (3), in which R.sub.1 to R.sub.6 each independently represent a structure represented by formula (2), in which the broken line represents a binding site; n1 represents an integer of 0 to 3; n2 represents an integer of 0 or 1; n3 represents an integer of 0 to 4; R.sub.7 represents hydrogen, an acryl group, a methacryl group, a cyanoacryl group, a cyclic ether group, an allyl group, a propargyl group, a hydroxy group, an isocyanate group, chlorine, or an optionally branched alkyl group having 1 to 8 carbon atoms; and X represents an alkylene glycol chain having 2 to 7 carbon atoms or a lactone-modified ketone chain, in which R.sub.1 to R.sub.6 each independently represent a structure represented by formula (2).

An optical resin material for chromatic aberration correction is provided including at least 5% by mass of a compound (component A) represented by formula (1) or formula (3), in which R.sub.1 to R.sub.6 each independently represent a structure represented by formula (2), in which the broken line represents a binding site; n1 represents an integer of 0 to 3; n2 represents an integer of 0 or 1; n3 represents an integer of 0 to 4; R.sub.7 represents hydrogen, an acryl group, a methacryl group, a cyanoacryl group, a cyclic ether group, an allyl group, a propargyl group, a hydroxy group, an isocyanate group, chlorine, or an optionally branched alkyl group having 1 to 8 carbon atoms; and X represents an alkylene glycol chain having 2 to 7 carbon atoms or a lactone-modified ketone chain, in which R.sub.1 to R.sub.6 each independently represent a structure represented by formula (2).

A resist composition comprising a base polymer and an acid generator containing a sulfonium or iodonium salt of iodized benzamide group-containing fluorinated sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and an acid generator containing a sulfonium or iodonium salt of iodized benzamide group-containing fluorinated sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Provided is a particle suitable for a specimen test, which has high sensitization efficiency in a reaction with an antibody, shows high detection sensitivity as a latex reagent, hardly agglutinates during its storage, and hardly causes nonspecific adsorption even when not post-coated. The particle is a particle including a copolymer containing a monomer unit derived from a styrene-based monomer and a monomer unit derived from a glycidyl group-containing monomer, the particle being represented by the following general formula (1): ##STR00001##
in the general formula (1), L.sub.1 represents a copolymer moiety containing the monomer unit derived from the styrene-based monomer and the monomer unit derived from the glycidyl group-containing monomer, “n” represents from 4 to 11, and R.sup.1 and R.sup.2 each represent a hydrogen atom, an alkyl group, or a halogen.

Provided is a particle suitable for a specimen test, which has high sensitization efficiency in a reaction with an antibody, shows high detection sensitivity as a latex reagent, hardly agglutinates during its storage, and hardly causes nonspecific adsorption even when not post-coated. The particle is a particle including a copolymer containing a monomer unit derived from a styrene-based monomer and a monomer unit derived from a glycidyl group-containing monomer, the particle being represented by the following general formula (1): ##STR00001##
in the general formula (1), L.sub.1 represents a copolymer moiety containing the monomer unit derived from the styrene-based monomer and the monomer unit derived from the glycidyl group-containing monomer, “n” represents from 4 to 11, and R.sup.1 and R.sup.2 each represent a hydrogen atom, an alkyl group, or a halogen.

The present invention pertains to composition suitable for manufacturing membranes based on vinylidene fluoride (VDF) polymers, to porous membranes thereof, to methods for their manufacture and to uses thereof, especially for the filtration of water phases. Said composition comprising vinylidene fluoride (VDF) polymers and polymer additives comprising zwitterionic moieties delivers outstanding hydrophilization performances of manufactured membranes.

The present invention pertains to composition suitable for manufacturing membranes based on vinylidene fluoride (VDF) polymers, to porous membranes thereof, to methods for their manufacture and to uses thereof, especially for the filtration of water phases. Said composition comprising vinylidene fluoride (VDF) polymers and polymer additives comprising zwitterionic moieties delivers outstanding hydrophilization performances of manufactured membranes.

The present disclosure relates to an antibacterial polymer composition, and more particularly, to an antibacterial polymer composition that enables the preparation of a coating layer exhibiting excellent antibacterial properties.

The present disclosure relates to an antibacterial polymer composition, and more particularly, to an antibacterial polymer composition that enables the preparation of a coating layer exhibiting excellent antibacterial properties.