Patent classifications
C08L61/06
Run flat tire
A run flat tire having improved run flat durability is provided. The run flat tire has a side wall part reinforced by a side reinforcing rubber part, and the side reinforcing rubber part is formed by a rubber composition which comprises 100 parts by mass of a diene rubber containing natural rubber and polybutadiene rubber, and from 0.1 to 4.0 parts by mass of a mercaptobenzimidazole compound.
Aqueous adhesive composition based on polyaldehyde and polyphenol
An aqueous adhesive composition includes: a phenol/aldehyde resin; and an unsaturated elastomer latex. The phenol/aldehyde resin is based on: an aromatic polyaldehyde bearing at least two aldehyde functional groups and including at least one aromatic nucleus; and a polyphenol including at least one aromatic nucleus. If there is just one aromatic nucleus, the nucleus bears two or three hydroxyl functional groups in a meta position with respect to each other or with respect to one another, with a remainder of the nucleus being unsubstituted. If there are plural aromatic nuclei, at least two of the nuclei each bear two or three hydroxyl functional groups in the meta position with respect to each other or with respect to one another, with two positions ortho to at least one of these hydroxyl functional groups being unsubstituted. The adhesive composition is useable to adhere a textile material to a crosslinkable rubber composition.
WAX-ORGANIC EXTENDER EMULSION AND METHOD FOR MANUFACTURE THEREOF
A wax-extender emulsion including a plurality of wax-extender complex particles suspended in water is described. A wax-extender complex includes a wax component, an organic extender component and a surfactant that stabilizes the wax component and the organic extender component collectively to form the wax-extender complex. The wax-extender emulsion comprises from 2 wt % to 30 wt % organic extender. During manufacturing, the organic extender and wax component are emulsified and homogenized together to produce the wax-extender emulsion. The wax-extender emulsion can be co-applied as a mixture with adhesive resin during wood-based composite manufacturing.
Powdered resins with fillers
Particulate binder compositions and methods for making and using same are provided. The binder composition for producing composite lignocellulose products can include an aldehyde based resin and a filler, an extender, or a combination thereof. The binder composition can be in the form of particulates. The particulates can each comprises the filler, the extender, or the combination thereof and the aldehyde based resin.
Powdered resins with fillers
Particulate binder compositions and methods for making and using same are provided. The binder composition for producing composite lignocellulose products can include an aldehyde based resin and a filler, an extender, or a combination thereof. The binder composition can be in the form of particulates. The particulates can each comprises the filler, the extender, or the combination thereof and the aldehyde based resin.
Powdered resins with fillers
Particulate binder compositions and methods for making and using same are provided. The binder composition for producing composite lignocellulose products can include an aldehyde based resin and a filler, an extender, or a combination thereof. The binder composition can be in the form of particulates. The particulates can each comprises the filler, the extender, or the combination thereof and the aldehyde based resin.
THERMOPLASTIC COMPOSITION HAVING HIGH FLUIDITY
The invention concerns a thermoplastic composition having high fluidity in the molten state, comprising at least: (a) one thermoplastic polymer matrix; (b) one oligomer selected from cyclic ester oligomers, ether oligomers and mixtures thereof, said oligomer having a degree of polymerization of between 2 and 25; and (c) one phenolic polymer; said compounds (b) and (c) being present in a weight ratio (c)/(b) varying from 0.25 to 6, and preferably from approximately 0.75 to 2.75.
The invention also concerns a process for producing a composite article from such a composition by impregnating a reinforcement such as a fabric or a preform, the composite article obtained according to this process, and the use of an oligomer (b) in combination with at least one phenolic polymer (c), as a plasticizing additive in a thermoplastic polymer matrix.
THERMOPLASTIC COMPOSITION HAVING HIGH FLUIDITY
The invention concerns a thermoplastic composition having high fluidity in the molten state, comprising at least: (a) one thermoplastic polymer matrix; (b) one oligomer selected from cyclic ester oligomers, ether oligomers and mixtures thereof, said oligomer having a degree of polymerization of between 2 and 25; and (c) one phenolic polymer; said compounds (b) and (c) being present in a weight ratio (c)/(b) varying from 0.25 to 6, and preferably from approximately 0.75 to 2.75.
The invention also concerns a process for producing a composite article from such a composition by impregnating a reinforcement such as a fabric or a preform, the composite article obtained according to this process, and the use of an oligomer (b) in combination with at least one phenolic polymer (c), as a plasticizing additive in a thermoplastic polymer matrix.
Composition for forming resist overlayer film for EUV lithography
There is provided a composition for forming an EUV resist overlayer film that is used in an EUV lithography process, that does not intermix with the EUV resist, that blocks unfavorable exposure light for EUV exposure, for example, UV light and DUV light and selectively transmits EUV light alone, and that can be developed with a developer after exposure. A composition for forming an EUV resist overlayer film used in an EUV lithography process including a resin containing a naphthalene ring in a main chain or in a side chain and a solvent, in which the resin may include a hydroxy group, a carboxy group, a sulfo group, or a monovalent organic group having at least one of these groups as a hydrophilic group.
Composition for forming resist overlayer film for EUV lithography
There is provided a composition for forming an EUV resist overlayer film that is used in an EUV lithography process, that does not intermix with the EUV resist, that blocks unfavorable exposure light for EUV exposure, for example, UV light and DUV light and selectively transmits EUV light alone, and that can be developed with a developer after exposure. A composition for forming an EUV resist overlayer film used in an EUV lithography process including a resin containing a naphthalene ring in a main chain or in a side chain and a solvent, in which the resin may include a hydroxy group, a carboxy group, a sulfo group, or a monovalent organic group having at least one of these groups as a hydrophilic group.