A rubber composition capable of forming a foam such as a roller main body which has a low rubber hardness and is soft in a state in which an average cell diameter thereof is small is provided. The rubber composition includes NBR whose Mooney viscosity is 15 to 50 having a proportion being 10 parts by mass or more in 100 parts by mass of the total amount of rubber, epichlorohydrin rubber whose Mooney viscosity is 5 to 35 having a proportion being 10 parts by mass or more in 100 parts by mass of the total amount of rubber, and 10 parts by mass or less of carbon black and 7 parts by mass or less of a foaming agent with respect to 100 parts by mass of the total amount of rubber, and has a Mooney viscosity of 35 or less.

A highly damping homogenous elastomeric polymer blend. The elastomeric polymer blend comprises from about 50% to about 95 wt % epihalohydrin and from about 5% to about 50 wt % polymethylmethacrylate. The blend is homogenous and has a vertical rebound between 0 and about 10% and a Tg between about 20 C. and about 45 C. when measured by rheology.

A highly damping homogenous elastomeric polymer blend. The elastomeric polymer blend comprises from about 50% to about 95 wt % epihalohydrin and from about 5% to about 50 wt % polymethylmethacrylate. The blend is homogenous and has a vertical rebound between 0 and about 10% and a Tg between about 20 C. and about 45 C. when measured by rheology.

A highly damping homogenous elastomeric polymer blend. The elastomeric polymer blend comprises from about 50% to about 95 wt % epihalohydrin and from about 5% to about 50 wt % polymethylmethacrylate. The blend is homogenous and has a vertical rebound between 0 and about 10% and a Tg between about 20 C. and about 45 C. when measured by rheology.

An aqueous electrolytic composition and a process for electrodeposition of copper on a dielectric or semiconductor base structure using the aqueous electrolytic composition. The process includes (i) contacting a metalizing substrate comprising a seminal conductive layer on the base structure with an aqueous electrolytic deposition composition; and (ii) supplying electrical current to the electrolytic deposition composition to deposit copper on the substrate. The aqueous electrolytic composition comprises: (a) copper ions; (b) an acid; (c) a suppressor; and (d) a quaternized poly(epihalohydrin) comprising n repeating units corresponding to structure 1N and p repeating units corresponding to structure 1P:

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An aqueous electrolytic composition and a process for electrodeposition of copper on a dielectric or semiconductor base structure using the aqueous electrolytic composition. The process includes (i) contacting a metalizing substrate comprising a seminal conductive layer on the base structure with an aqueous electrolytic deposition composition; and (ii) supplying electrical current to the electrolytic deposition composition to deposit copper on the substrate. The aqueous electrolytic composition comprises: (a) copper ions; (b) an acid; (c) a suppressor; and (d) a quaternized poly(epihalohydrin) comprising n repeating units corresponding to structure 1N and p repeating units corresponding to structure 1P:

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Provided is a polymer composition, wherein the polymer composition has a refractive index difference (BA) of 0.04 or greater but 0.1 or less between a minimum refractive index A of the polymer composition in a temperature range of 5 degrees C. or higher but lower than 30 degrees C. and a maximum refractive index B of the polymer composition in a temperature range of 30 degrees C. or higher but lower than 50 degrees C.

Provided is a polymer composition, wherein the polymer composition has a refractive index difference (BA) of 0.04 or greater but 0.1 or less between a minimum refractive index A of the polymer composition in a temperature range of 5 degrees C. or higher but lower than 30 degrees C. and a maximum refractive index B of the polymer composition in a temperature range of 30 degrees C. or higher but lower than 50 degrees C.

An anti-static agent containing a polyether compound having a cationic group is provided. According to the present invention, an anti-static agent can be provided which has excellent compatibility with a resin material and a rubber material as well as excellent anti-static properties.

A laminate of different kinds of halogen-containing rubbers (polymers) excellent in bonding strength. The laminate including the following layers (1) and (2) directly bonded to each other: layer (1): a layer of a composition including 100 parts by mass of a halogen-based rubber (A) (excluding a fluorine-based rubber), and 1 to 30 parts by mass of an inorganic compound (B) containing at least one element selected from Group 2 elements and Group 13 elements, and an oxygen atom; and layer (2): a layer of a halogen-containing polymer (C) (excluding the halogen-based rubber of the layer (1)).