Patent classifications
C09D109/04
Latex composition for dip molding and dip-molded article
A latex composition for dip-molding obtained by mixing a latex of conjugated diene polymer (A) having a glass transition temperature of 10 C. or less and a latex of polymer (B) having a glass transition temperature above 10 C. A latex composition for dip-molding capable of providing a dip-molded article excellent in wear resistance, as well as wet grip when water and oil are deposited thereon can be provided.
Polymer latex for the preparation of an elastomeric film having excellent stress retention properties and softness
A polymer latex is described for the preparation of an elastomeric film obtained by free-radical emulsion polymerization of a mixture of ethylenically unsaturated monomers comprising: a) 15 to 99 wt.-% of conjugated dienes; b) 0 to 80 wt.-% of ethylenically unsaturated nitrile compounds; c) 0 to 70 wt.-% of vinyl aromatic monomers; the sum of ethylenically unsaturated nitrile compounds b) and vinyl aromatic monomers c) being 0.95 to 84.95 wt.-% d) 0.05 to 10 wt.-% of ethylenically unsaturated acids wherein the ethylenically unsaturated acids comprise d1) an ethylenically unsaturated acid comprising an acid functional group; and a spacer group separating the ethylenically unsaturated group and the acid functional group by at least 4 atoms; and e) 0 to 65 wt.-% of co-polymerizable ethylenically unsaturated compounds,
wherein monomers a) to e) are as defined.
Polymer latex for the preparation of an elastomeric film having excellent stress retention properties and softness
A polymer latex is described for the preparation of an elastomeric film obtained by free-radical emulsion polymerization of a mixture of ethylenically unsaturated monomers comprising: a) 15 to 99 wt.-% of conjugated dienes; b) 0 to 80 wt.-% of ethylenically unsaturated nitrile compounds; c) 0 to 70 wt.-% of vinyl aromatic monomers; the sum of ethylenically unsaturated nitrile compounds b) and vinyl aromatic monomers c) being 0.95 to 84.95 wt.-% d) 0.05 to 10 wt.-% of ethylenically unsaturated acids wherein the ethylenically unsaturated acids comprise d1) an ethylenically unsaturated acid comprising an acid functional group; and a spacer group separating the ethylenically unsaturated group and the acid functional group by at least 4 atoms; and e) 0 to 65 wt.-% of co-polymerizable ethylenically unsaturated compounds,
wherein monomers a) to e) are as defined.