The present invention provides radiation curable hybrid ink and coating compositions comprising large amounts of inert hard resin. The radiation hybrid ink and coating compositions have good lithographic properties, low roller swelling, and a low gloss-back effect when overprinted with a UV varnish. The ink and coating compositions are useful for lithographic wet and waterless printing.

In a method of manufacturing a semiconductor device, an underlying structure is formed. A surface grafting layer is formed on the underlying structure. A photo resist layer is formed on the surface grafting layer. The surface grafting layer includes a coating material including a backbone polymer, a surface grafting unit coupled to the backbone polymer and an adhesion unit coupled to the backbone polymer.

In a method of manufacturing a semiconductor device, an underlying structure is formed. A surface grafting layer is formed on the underlying structure. A photo resist layer is formed on the surface grafting layer. The surface grafting layer includes a coating material including a backbone polymer, a surface grafting unit coupled to the backbone polymer and an adhesion unit coupled to the backbone polymer.

In a method of manufacturing a semiconductor device, an underlying structure is formed. A surface grafting layer is formed on the underlying structure. A photo resist layer is formed on the surface grafting layer. The surface grafting layer includes a coating material including a backbone polymer, a surface grafting unit coupled to the backbone polymer and an adhesion unit coupled to the backbone polymer.

In a method of manufacturing a semiconductor device, an underlying structure is formed. A surface grafting layer is formed on the underlying structure. A photo resist layer is formed on the surface grafting layer. The surface grafting layer includes a coating material including a backbone polymer, a surface grafting unit coupled to the backbone polymer and an adhesion unit coupled to the backbone polymer.

The invention belongs to the technical field of the preparation of lithium ion batteries, and particularly relates to a water-based composition used for modifying diaphragm of lithium ion batteries and a polyolefin diaphragm for lithium ion batteries and lithium ion batteries. The invention aims to improve the strength of the battery cell, to reduce the expansion of thickness of battery cell at high temperature and to simplify the battery production process. The water-based composition for modifying the diaphragm for the lithium ion battery comprises a water-based adhesive for the lithium ion battery and organic nano-particle fillings dispersed in the water-based adhesive; the organic nano-particle fillings are nano-particles of the polymers 1 or nano-particles at least wrapped with the polymers 1 on the surfaces; and the particle sizes of the organic nano-particles are 50 to 2000 nm. The polymers 1 are selected from at least one of polymethyl methacrylate (PMMA), ethylene-vinyl acetate copolymer (EVA), ethylene-acrylate copolymer (EAA), ethylene-butyl acrylate copolymer (EBA), ethylene-methyl acrylate copolymer (EMA), ethylene-ethyl acrylate copolymer (EEA) or polyurethane (PTU) polymer.

The invention belongs to the technical field of the preparation of lithium ion batteries, and particularly relates to a water-based composition used for modifying diaphragm of lithium ion batteries and a polyolefin diaphragm for lithium ion batteries and lithium ion batteries. The invention aims to improve the strength of the battery cell, to reduce the expansion of thickness of battery cell at high temperature and to simplify the battery production process. The water-based composition for modifying the diaphragm for the lithium ion battery comprises a water-based adhesive for the lithium ion battery and organic nano-particle fillings dispersed in the water-based adhesive; the organic nano-particle fillings are nano-particles of the polymers 1 or nano-particles at least wrapped with the polymers 1 on the surfaces; and the particle sizes of the organic nano-particles are 50 to 2000 nm. The polymers 1 are selected from at least one of polymethyl methacrylate (PMMA), ethylene-vinyl acetate copolymer (EVA), ethylene-acrylate copolymer (EAA), ethylene-butyl acrylate copolymer (EBA), ethylene-methyl acrylate copolymer (EMA), ethylene-ethyl acrylate copolymer (EEA) or polyurethane (PTU) polymer.

An underlayer film-forming composition which exhibits excellent solvent resistance, and which is capable of orthogonally inducing, with respect to a substrate, a microphase separation structure in a layer formed on the substrate, said layer including a block copolymer. The underlayer film-forming composition includes a copolymer which includes: (A) unit structures derived from styrene compounds including tert-butyl groups; (B) unit structures, other than those in (A) above, which are derived from aromatic-containing vinyl compounds which do not include hydroxy groups; (C) unit structures derived from compounds which include (meth)acryloyl groups, and do not include hydroxy groups; and (D) unit structures derived from compounds including crosslink-forming groups. The copolymerization ratios with respect to the whole copolymer are: (A) 25-90 mol %; (B) 0-65 mol %; (C) 0-65 mol %; and (D) 10-20 mol %. Unit structures including aromatics account for 81-90 mol % of (A)+(B)+(C).

Provided are a resist composition that can improve coatability (coating film formability) with respect to a substrate in spin coating and close adherence of a resist film and that can form a good pattern, and a resist film in which a good pattern is formed. The resist composition contains a polymer, a solvent, and an aromatic vinyl monomer, and has a content of the aromatic vinyl monomer relative to the polymer of not less than 10 mass ppm and not more than 30,000 mass ppm.

Fluorescent resin particles which comprise a water-soluble fluorescent dye and a polymer made from a monomer mixture.