A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having the formula (1) or an iodonium salt having the formula (2). ##STR00001##

A coated article is disclosed that includes a metal substrate and a coating composition disposed on at least a portion of the metal substrate. The coating can be formed from a composition that includes an acrylic copolymer, which is preferably the reaction product of ethylenically unsaturated monomers and a functional monomer. The functional monomer can be the reaction product of a multifunctional isocyanate and an ethylenically unsaturated nucleophilic monomer. The functional monomer preferably includes a blocked isocyanate group. The articles can be useful for packaging foods and beverages.

A coated article is disclosed that includes a metal substrate and a coating composition disposed on at least a portion of the metal substrate. The coating can be formed from a composition that includes an acrylic copolymer, which is preferably the reaction product of ethylenically unsaturated monomers and a functional monomer. The functional monomer can be the reaction product of a multifunctional isocyanate and an ethylenically unsaturated nucleophilic monomer. The functional monomer preferably includes a blocked isocyanate group. The articles can be useful for packaging foods and beverages.

A water dispersion of gel particles, in which the gel particles having a polymerizable group, having a three-dimensional crosslinked structure including at least one bond selected from a urethane bond and a urea bond, and including at least a photopolymerization initiator and a resin are dispersed in water, a method of producing the water dispersion, and an image forming method using the water dispersion.

A pattern forming method includes: applying an actinic ray-sensitive or radiation- sensitive resin composition onto a substrate to form a resist film; forming an upper layer film on the resist film, using a composition for forming an upper layer film; exposing the resist film having the upper layer film formed thereon; and developing the exposed resist film using a developer including an organic solvent to form a pattern. The composition for forming an upper layer film contains a resin having a repeating unit (a) with a ClogP value of 2.85 or more and a compound (b) with a ClogP of 1.30 or less, and the receding contact angle of the upper layer film with water is 70 degrees or more, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method.

A pattern forming method includes: applying an actinic ray-sensitive or radiation- sensitive resin composition onto a substrate to form a resist film; forming an upper layer film on the resist film, using a composition for forming an upper layer film; exposing the resist film having the upper layer film formed thereon; and developing the exposed resist film using a developer including an organic solvent to form a pattern. The composition for forming an upper layer film contains a resin having a repeating unit (a) with a ClogP value of 2.85 or more and a compound (b) with a ClogP of 1.30 or less, and the receding contact angle of the upper layer film with water is 70 degrees or more, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method.

A window according to an exemplary embodiment of the present disclosure includes: a substrate; and a protective layer provided in one side of the substrate, wherein the protective layer includes at least one of a first compound represented as given in Chemical Formula 1 and a derivative thereof and at least one of a second compound represented as given in Chemical Formula 2 and a derivative thereof:

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A window according to an exemplary embodiment of the present disclosure includes: a substrate; and a protective layer provided in one side of the substrate, wherein the protective layer includes at least one of a first compound represented as given in Chemical Formula 1 and a derivative thereof and at least one of a second compound represented as given in Chemical Formula 2 and a derivative thereof:

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According to one aspect, a composite film may include a substrate, and a protection coating overlying the substrate. The protection coating may include a urethane acrylate 6-functional oligomer, and a urethane acrylate 2-functional oligomer. The protection coating may further include a urethane acrylate oligomer ratio UAC.sub.6/UAC.sub.2 of at least about 0.5 and not greater than about 3, where UAC.sub.6 is equal to the content of the urethane acrylate 6-functional oligomer in wt. % for a total weight of the protection coating and UAC.sub.2 is equal to the content of the urethane acrylate 2-functional oligomer in wt. % for a total dry weight of the protection coating.

Disclosed herein are compositions to use in biofouling-resistant coatings, biofouling-resistant coatings, methods of making biofouling-resistant coatings, biofouling-resistant devices, and methods of making biofouling-resistant devices.