In view of the problem with the prior art, the present invention addresses the following problems: providing a method that can suppress the generation of fine silver particles in a silver nanowire dispersion better than prior methods; and inhibiting, by a convenient method, particulation of silver nanowires on the anode side. A solution is a silver nanowire dispersion that contains silver nanowires, a dispersion solvent, and a chelating agent with the average diameter of the silver nanowires being not more than 100 nm, the silver nanowire dispersion being characterized in that the chelating agent content is 0.1 to 1,000 μmol/g with reference to the silver nanowire content, and the chelating agent is a prescribed aromatic heterocyclic compound having at least one imine skeleton in the molecule.

The present invention relates to a composition, textile, and mask for reducing the inhalation of pollutants. The composition includes an aqueous solution of an inorganic iodide compound, a metal phthalocyanine, and a polymeric binder. The inorganic iodide can be cuprous iodide, the metal phthalocyanine can be iron phthalocyanine, and the polymeric binder can be polyvinylpyrrolidone or polyvinyl alcohol. This pollutant-inactivating composition neutralizes pollutants such as nitrogen dioxide, sulfur dioxide, ozone, volatile organic compounds and other unpleasant airborne agents, without requiring elevated temperatures or bulky canisters containing adsorbents. Optionally, a humectant can also be incorporated into the coating solution to retain moisture in the active filter matrix, which enhances the activity of the composition to inactivate oxidizing gases and other toxic constituents of air pollution.

A conductive composition including a conductive polymer (A), a water-soluble polymer (B) other than the conductive polymer (A), and a solvent (C), wherein a peak area ratio is 0.44 or less, which is determined based on results of analysis performed using a high performance liquid chromatograph mass spectrometer with respect to a test solution obtained by extracting the water-soluble polymer (B) from the conductive composition with n-butanol, and calculated by formula (I):

Area ratio=Y/(X+Y)

wherein X is a total peak area of an extracted ion chromatogram prepared with respect to ions derived from compounds having a molecular weight (M) of 600 or more from a total ion current chromatogram, Y is a total peak area of an extracted ion chromatogram prepared with respect to ions derived from compounds having a molecular weight (M) of less than 600 from the total ion current chromatogram.

Embodiments of the present invention relate to methods for preparing high optical density solutions of nanoparticle, such as nanoplates, silver nanoplates or silver platelet nanoparticles, and to the solutions and substrates prepared by the methods. The process can include the addition of stabilizing agents (e.g., chemical or biological agents bound or otherwise linked to the nanoparticle surface) that stabilize the nanoparticle before, during, and/or after concentration, thereby allowing for the production of a stable, high optical density solution of silver nanoplates. The process can also include increasing the concentration of silver nanoplates within the solution, and thus increasing the solution optical density.

Embodiments of the present invention relate to methods for preparing high optical density solutions of nanoparticle, such as nanoplates, silver nanoplates or silver platelet nanoparticles, and to the solutions and substrates prepared by the methods. The process can include the addition of stabilizing agents (e.g., chemical or biological agents bound or otherwise linked to the nanoparticle surface) that stabilize the nanoparticle before, during, and/or after concentration, thereby allowing for the production of a stable, high optical density solution of silver nanoplates. The process can also include increasing the concentration of silver nanoplates within the solution, and thus increasing the solution optical density.

After there is prepared a conductive paste which contains fine copper particles having an average particle diameter of 1 to 100 nm, each of the fine copper particles being coated with an azole compound, such as benzotriazole, coarse copper particles having an average particle diameter of 0.3 to 20 μm, at least one of a polyvinylpyrrolidone (PVP) resin and a polyvinyl butyral (PVB) resin, a chlorine compound, and a glycol solvent, such as ethylene glycol, the total amount of the fine copper particles and the coarse copper particles being 50 to 90% by weight, and the weight ratio of the fine copper particles to the coarse copper particles being in the range of from 1:9 to 5:5, the conductive paste thus prepared is applied on a substrate by screen printing to be preliminary-fired by vacuum drying, and then, fired with light irradiation by irradiating with light having a wavelength of 200 to 800 nm at a pulse period of 500 to 2000 μs and a pulse voltage of 1600 to 3800 V to form a conductive film on the substrate.

After there is prepared a conductive paste which contains fine copper particles having an average particle diameter of 1 to 100 nm, each of the fine copper particles being coated with an azole compound, such as benzotriazole, coarse copper particles having an average particle diameter of 0.3 to 20 μm, at least one of a polyvinylpyrrolidone (PVP) resin and a polyvinyl butyral (PVB) resin, a chlorine compound, and a glycol solvent, such as ethylene glycol, the total amount of the fine copper particles and the coarse copper particles being 50 to 90% by weight, and the weight ratio of the fine copper particles to the coarse copper particles being in the range of from 1:9 to 5:5, the conductive paste thus prepared is applied on a substrate by screen printing to be preliminary-fired by vacuum drying, and then, fired with light irradiation by irradiating with light having a wavelength of 200 to 800 nm at a pulse period of 500 to 2000 μs and a pulse voltage of 1600 to 3800 V to form a conductive film on the substrate.

After there is prepared a conductive paste which contains fine copper particles having an average particle diameter of 1 to 100 nm, each of the fine copper particles being coated with an azole compound, such as benzotriazole, coarse copper particles having an average particle diameter of 0.3 to 20 μm, at least one of a polyvinylpyrrolidone (PVP) resin and a polyvinyl butyral (PVB) resin, a chlorine compound, and a glycol solvent, such as ethylene glycol, the total amount of the fine copper particles and the coarse copper particles being 50 to 90% by weight, and the weight ratio of the fine copper particles to the coarse copper particles being in the range of from 1:9 to 5:5, the conductive paste thus prepared is applied on a substrate by screen printing to be preliminary-fired by vacuum drying, and then, fired with light irradiation by irradiating with light having a wavelength of 200 to 800 nm at a pulse period of 500 to 2000 μs and a pulse voltage of 1600 to 3800 V to form a conductive film on the substrate.

A multilevel antimicrobial polymeric colloidal particle includes a polymer scaffold and at least one antimicrobial polymer carried on the polymer scaffold, where the polymer scaffold and the at least one antimicrobial polymer form a hollow colloidal particle. An antimicrobial core may be received within the hollow colloidal particle. The multilevel antimicrobial polymeric colloidal particles may be incorporated into an optically clear acrylic material to form an antimicrobial coating. The antimicrobial coating may be coated and ultraviolet cured onto a glass, metal or plastic substrate or the like to form a screen for electronic devices or the like which has antimicrobial properties.

A multilevel antimicrobial polymeric colloidal particle includes a polymer scaffold and at least one antimicrobial polymer carried on the polymer scaffold, where the polymer scaffold and the at least one antimicrobial polymer form a hollow colloidal particle. An antimicrobial core may be received within the hollow colloidal particle. The multilevel antimicrobial polymeric colloidal particles may be incorporated into an optically clear acrylic material to form an antimicrobial coating. The antimicrobial coating may be coated and ultraviolet cured onto a glass, metal or plastic substrate or the like to form a screen for electronic devices or the like which has antimicrobial properties.