The present invention relates to a composition comprising an aqueous dispersion of polymeric composite microspheres comprising an aqueous dispersion of polymeric composite microspheres that comprise a polysiloxane and a polymer, as defined herein, and a suspension polymerization process for making the composition. The composition is useful for making defect free coatings with a relatively low coefficient of friction.

A coating including a composition of 5% to 10% by weight of water, 5% to 20% by weight of silica sol, 0.05% to 0.2% by weight of KH-560 silane coupling agent, and 20% to 60% by weight of quartz powder is disclosed. The forming method for the coating includes mixing the water, the silica sol, and the KH560-silane coupling agent into a decomposing agent; adding a wetting agent, phthalein white powder, modified bentonite, quartz powder, and a styrene-acrylate emulsion or a pure acrylate emulsion into the decomposing agent to form a mixing agent; adding a carboxymethyl cellulose, a crosslinking agent, a fungicide and a deodorant into the mixing agent to form a thickened mixing agent; and adding a deforming agent into the thickened mixing agent to form the coating. The quartz coating has advantages of effectively improve living environment and good covering ability.

The invention is related to azetidinium-containing copolymers and vinylic monomers and their uses in formation of non-silicone hydrogel coatings on silicone hydrogel contact lenses.

Aqueous dispersions of copolymers of ethylenically unsaturated monomers and silicone resins bearing functional groups which are free radically polymerizable are prepared by forming an aqueous miniemulsion of the silicone resin dissolved in an ethylenically unsaturated monomer, the miniemulsion having a D.sub.50 droplet size <350 nm, and polymerizing using a free radical polymerization initiator.

The invention is related to azetidinium-containing copolymers and vinylic monomers and their uses in formation of non-silicone hydrogel coatings on silicone hydrogel contact lenses.

Provided is a heat-dissipating coating composition having capability of forming a coating film having a high heat-dissipating effect, and having capability of forming the coating film also excellent in heat resistance and UV resistance. The heat-dissipating coating composition of the present application contains a filler of an orthorhombic silicate mineral; and an acrylic resin and a curing agent. Either the acrylic resin or the curing agent is silicone-modified.

The invention relates to copolymers obtainable from polyether-polysiloxane containing macromonomers, and a process for preparation thereof. The invention further relates to the use of the copolymers as additives in compositions such as coating compositions and polymeric molding compounds as well as such compositions containing at least one inventive copolymer.

Durable, anti-fouling, crosslinked zwitterionic coatings that are grafted to the surface of a substrate through covalent bonding are disclosed. When exposed to a light source, zwitterionic monomers react with a crosslinker and with activated radicals at the surface of the substrate, simultaneously forming the crosslinked zwitterionic coating and anchoring it to the surface of the substrate. Photomasking techniques can be used to micropattern the zwitterionic coatings. The zwitterionic coatings can be applied to a variety of substrates, including medical devices and systems.

A composition to be applied onto a resist pattern comprising a polysiloxane obtained by hydrolytically condensing a hydrolyzable silane and a carboxylic ester solvent or an ether solvent, wherein the hydrolyzable silane includes a vinyl group- or (meth)acryloxy group-containing hydrolyzable silane. A hydrolyzable silane includes the vinyl group- or (meth)acryloxy group-containing hydrolyzable silane at a content of 20 to 100 mol % in the total hydrolyzable silane. A method for producing a semiconductor device, the method includes: a step (1) of applying a resist onto a substrate; a step (2) of exposing a resist film to light and subsequently developing the resist film to form a resist pattern; a step (3) of applying the composition as described above onto the resist pattern during the development or after the development; and a step (4) of removing the resist pattern by etching to reverse the pattern.

The invention relates to copolymers obtainable from polyether-polysiloxane containing macromonomers, and a process for preparation thereof. The invention further relates to the use of the copolymers as additives in compositions such as coating compositions and polymeric moulding compounds as well as such compositions containing at least one inventive copolymer.