A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): ##STR00001##
wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B.sup.1 and B.sup.2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B.sup.1 and B.sup.2 optionally form a ring with a carbon atom bonded to B.sup.1 and B.sup.2.

A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): ##STR00001##
wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B.sup.1 and B.sup.2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B.sup.1 and B.sup.2 optionally form a ring with a carbon atom bonded to B.sup.1 and B.sup.2.

A polymer, a hardmask composition, and a method of forming patterns, the polymer including structural units obtained by a reaction of a reaction mixture that includes a substituted or unsubstituted indole compound, a first aromatic aldehyde compound including a substituted or unsubstituted C3 to C20 branched alkyl group thereon, and a second aromatic aldehyde compound that is different from the first aromatic aldehyde compound.

A polymer, a hardmask composition, and a method of forming patterns, the polymer including structural units obtained by a reaction of a reaction mixture that includes a substituted or unsubstituted indole compound, a first aromatic aldehyde compound including a substituted or unsubstituted C3 to C20 branched alkyl group thereon, and a second aromatic aldehyde compound that is different from the first aromatic aldehyde compound.

There is described an acrylic polyester resin, obtainable by grafting an acrylic polymer with a polyester material. The polyester material is obtainable by polymerizing (i) a polyacid component, with (ii) a polyol component, including—2,2,4,4-tetraallcylcyclobutane-1,3-diol. One of the polyacid component or the polyol component comprises a functional monomer operable to impart functionality on to the polyester resin, such that an acrylic polymer may be grafted with the polyester material via the use of said functionality. Also provided is an aqueous coating composition comprising the acrylic polyester resin and a metal packaging containing coated with the composition.

A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):

##STR00001##

wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B.sup.1 and B.sup.2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B.sup.1 and B.sup.2 optionally form a ring with a carbon atom bonded to B.sup.1 and B.sup.2.

A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):

##STR00001##

wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B.sup.1 and B.sup.2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B.sup.1 and B.sup.2 optionally form a ring with a carbon atom bonded to B.sup.1 and B.sup.2.

There is described an aqueous coating composition, the aqueous coating composition comprising an acrylic polyester resin, obtainable by grafting an acrylic polymer and a polyester material, the polyester material being obtainable by polymerizing: (i) a polyacid component, with (ii) a polyol component. At least one of the polyacid component and/or the polyol component comprises a functional monomer operable to impart functionality on to the polyester resin, such that an acrylic polymer may be grafted with the polyester material via the use of said functionality. The coating composition further containing a crosslinking material, wherein the crosslinking material comprises material according to formula (I); as shown in claim 1; wherein R.sub.1 is selected from aryl (such as C.sub.4 to C.sub.24 aryl), or aralkyl (such as C.sub.5 to C.sub.25 aralkyl); R.sub.2 to R.sub.5 are each independently hydrogen, alkyl (such as C.sub.1 to C.sub.20 alkyl), aryl (such as C.sub.4 to C.sub.24 aryl), aralkyl (such as C.sub.5 to C.sub.25 aralkyl) or —CHR.sub.8OR.sub.9; wherein R.sub.8 and R.sub.9 are each independently hydrogen, alkyl (such as C.sub.1 to C.sub.20 alkyl), aryl (such as C.sub.4 to C.sub.24 aryl), aralkyl (such as C.sub.5 to C.sub.25 aralkyl), alkoxyalkyl (such as C.sub.2 to C.sub.40 alkoxyalkyl) or an alkaryl (such as C.sub.5 to C.sub.25 alkaryl); wherein at least one of R.sub.2 to R.sub.5, is —CHR.sub.8OR.sub.9, suitably all of R.sub.2 to R.sub.5, are —CHR.sub.8OR.sub.9.

A solvent borne coating composition comprising: from 15-40 wt. % of a polyester resin, from 5-15 wt. % of a guanamine formaldehyde resin having no polyester groups, from 22-72 wt. % solvents with a boiling point of 50-98° C. and a curing catalyst. The composition is advantageously used of the application of multiple coloured layers on a metal or metal alloy foil. After the application of the composition, the metal or metal alloy foil can be further processed.

A coated polymer film, such as a coated polyester film, is disclosed. In one embodiment, the coated film may be used as a substrate for digital printing. In one embodiment, the coating contains an anionic anti-static agent comprising a sulphonated copolyester resin. In an alternative embodiment, the coating contains an anti-static agent comprising an organometallic, such as an organo zirconate, in combination with metal oxide particles. The metal oxide particles may comprise nanoparticles. In one embodiment, the coating can further contain a print enhancing agent and an adhesion promoter.