A method of making abrasive particles includes: providing a slurry comprising non-colloidal solid particles and a liquid vehicle; forming at least a portion of the slurry into shaped bodies contacting a substrate; at least partially drying the shaped bodies to provide shaped abrasive precursor particles; separating at least a portion of the shaped abrasive precursor particles from the substrate; and converting at least a portion of the shaped abrasive precursor particles into shaped abrasive particles. The shaped abrasive particles comprise alpha alumina having an average crystal grain size of 0.8 to 8 microns and an apparent density that is at least 92 percent of the true density. Each shaped abrasive particle has a respective surface comprising a plurality of smooth sides that form at least four vertexes. Shaped abrasive particles, abrasive articles including them, and methods of using are also disclosed.

A shaped abrasive particle is presented. The shaped abrasive particle has a first and second surface. The first and second surfaces are substantially parallel to each other and separated by a thickness. Each of the first and second surfaces have a surface profile, which includes a plurality of corners and a plurality of edges connecting the plurality of corners. The shaped abrasive particle also includes a recess included wholly within one of the plurality of edges, wherein the recess is a concave void extending into the surface profile. The shaped abrasive particle also includes a magnetically responsive coating. The magnetically responsive coating causes the shaped abrasive particle to be responsive to a magnetic field. The shaped abrasive particle, when exposed to the magnetic field, experiences a net torque that causes the shaped abrasive particle to orient with respect to the magnetic field such that each of the first and second surfaces are substantially perpendicular to a backing.

Blends of abrasive media are described that can be propelled via a pressurized air stream into a surface to remove contaminants or other undesired material from the surface. In addition to other advantageous properties, the disclosed abrasive media blends are capable of providing faster abrasion than conventional composite abrasives, but with significantly less dust than raw abrasives generate. The disclosed abrasive media blends include sponge abrasive media formed of a flexible, open-cell polymeric material bonded to one or more abrasive materials.

Provided are a chemical-mechanical polishing composition and a chemical-mechanical polishing method capable of polishing a semiconductor substrate containing a conductive metal such as tungsten or cobalt flatly and at high speed as well as reducing surface defects after polishing. The composition for chemical-mechanical polishing contains (A) silica particles having a functional group represented by general formula (1) and (B) a silane compound. —COO-M+ . . . (1) (M+ represents a monovalent cation.)

The present invention provides, in polishing an object to be polished that contains an (a) material having silicon-nitrogen bonding and (b) other materials, means that is capable of improving a ratio of a polishing speed of the (a) material to a polishing speed of the (b) materials. The present invention relates to a polishing composition used for polishing an object to be polished that contains an (a) material having silicon-nitrogen bonding and (b) other materials, the polishing composition containing: organic acid-immobilized silica; a dispersing medium; a selection ratio improver that improves a ratio of a polishing speed of the (a) material to a polishing speed of the (b) materials; and an acid, in which the selection ratio improver is organopolysiloxane having a hydrophilic group.

Polycrystalline diamond compacts, polycrystalline diamond blanks, polycrystalline diamond cutters, and tools incorporating same for cutting, milling, grinding, drilling and other abrasive operations, particularly in metal cutting applications, include a diamond table having a gradient in iron content that increases as distance into the volume of the diamond table increases. The iron gradient increases resistance to wear, such as in interrupted milling tests. The disclosure further relates to methods of manufacturing polycrystalline diamond compacts having a gradient in iron concentration in the diamond table, blanks and cutters including polycrystalline diamond compacts, cutting tools incorporating such compacts, blanks and cutters, and methods of cutting, milling, grinding and drilling, particularly metal machining, using such compacts, blanks, cutters, cutting tools and drill bits.

An abrasive particle can include a coating overlying at least a portion of a core. In an embodiment, the coating can include a first portion overlying at least a portion of the core and a second portion overlying at least a portion of the core, wherein the first portion can include a ceramic material and the second portion can include a silane or a silane reaction product. In a particular embodiment, the first portion can consist essentially of silica. In another particular embodiment, the first portion can include a surface roughness of not greater than 5 nm and a crystalline content of not greater than 60%.

An abrasive article having a plurality of apertures arranged in a non-uniform distribution pattern, wherein the pattern is spiral or phyllotactic, and in particular those patterns described by the Vogel equation. Also, provided is a back-up pad having a spiral or phyllotactic patterns of air flow paths, such as in the form of open channels. The back-up pad can be specifically adapted to correspond with an abrasive article having a non-uniform distribution pattern. Alternatively, the back-up pad can be used in conjunction with conventional perforated coated abrasives. The abrasive articles having a non-uniform distribution pattern of apertures and the back-up pads can be used together as an abrasive system.

An object of the present invention is to provide a nanobubble-containing inorganic oxide fine particle dispersion having excellent concentration stability in a process used as an abrasive. The object is achieved by the nanobubble-containing inorganic oxide fine particle dispersion including: inorganic oxide fine particles having an average particle size of 1 to 500 nm and containing fine particles containing Ce; and nanobubbles having an average cell size of 50 to 500 nm and being at least one non-oxidizing gas selected from a group consisting of N.sub.2 and H.sub.2.

To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.