Methods are provided to inhibit corrosion in low hardness water systems. The corrosion inhibiting treatment comprises: calcium salts of low molecular weight polymer polycarboxylic acids. These calcium salts may be added preformed to the water system in need of treatment or formed in-situ in the system. This method of corrosion inhibition is not a source of addition phosphorous or heavy metal to the treated system.

The present invention relates to stabilizers for thiol-ene compositions and to radiation curable thiol-ene compositions based thereon. Such radiation curable compositions can advantageously be used in inks, overprint varnishes, coatings, adhesives, for the making of 3D objects and for the making of solder resist and gel nails. Provided in particular is an inhibitor system (I) for thiol-ene compositions based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one acidic compound (ii) having a pKa between 1 and 3, and —at least one compound (iii) selected from the group consisting of phosphites and phosphonites, with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring. Also provided is an inhibitor system (II) for thiol-ene compositions based on that is based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one compound (iv) selected from the group consisting of spirophosphites, and —optionally, at least one acidic compound (ii) having a pKa between 1 and 3, and with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring.

The present invention relates to stabilizers for thiol-ene compositions and to radiation curable thiol-ene compositions based thereon. Such radiation curable compositions can advantageously be used in inks, overprint varnishes, coatings, adhesives, for the making of 3D objects and for the making of solder resist and gel nails. Provided in particular is an inhibitor system (I) for thiol-ene compositions based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one acidic compound (ii) having a pKa between 1 and 3, and —at least one compound (iii) selected from the group consisting of phosphites and phosphonites, with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring. Also provided is an inhibitor system (II) for thiol-ene compositions based on that is based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one compound (iv) selected from the group consisting of spirophosphites, and —optionally, at least one acidic compound (ii) having a pKa between 1 and 3, and with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring.

A rust inhibitor for a gasket, a gasket for a secondary battery including the same, and a secondary battery are provided. The rust inhibitor includes an anti-rust material and a polymer resin, wherein the polymer resin includes at least one of polyethylene or a copolymer which includes 2 or more derived units selected from the group consisting of an ethylene-derived unit, a propylene-derived unit, a butylene terephthalate-derived unit, an ethylene terephthalate-derived unit, and a methyl acrylate-derived unit.

A rust inhibitor for a gasket, a gasket for a secondary battery including the same, and a secondary battery are provided. The rust inhibitor includes an anti-rust material and a polymer resin, wherein the polymer resin includes at least one of polyethylene or a copolymer which includes 2 or more derived units selected from the group consisting of an ethylene-derived unit, a propylene-derived unit, a butylene terephthalate-derived unit, an ethylene terephthalate-derived unit, and a methyl acrylate-derived unit.

An improved a method of treating a patient having a disorder responsive to PDE-4 inhibition by administering roflumilast. The improvement involves administering the roflumilast topically in a composition having a roflumilast release profile that produces in the patient a flattened plasma concentration time curve and a reduced Cmax relative to oral administration of a PDE4-inhibiting amount of roflumilast. Such disorders include inflammatory disorders such as inflammatory dermatoses, including psoriasis, atopic dermatitis and seborrheic dermatitis. Such disorders also include inflammatory diseases in a variety of organs, especially the lungs (asthma, COPD). Because of reduced side effects with topical administration due to the improved pharmacokinetics (PK) characteristics, it may be possible to provide higher systemic exposures (AUCs) with topical administration, resulting in greater therapeutic efficacy than with the oral route of administration.

An improved a method of treating a patient having a disorder responsive to PDE-4 inhibition by administering roflumilast. The improvement involves administering the roflumilast topically in a composition having a roflumilast release profile that produces in the patient a flattened plasma concentration time curve and a reduced Cmax relative to oral administration of a PDE4-inhibiting amount of roflumilast. Such disorders include inflammatory disorders such as inflammatory dermatoses, including psoriasis, atopic dermatitis and seborrheic dermatitis. Such disorders also include inflammatory diseases in a variety of organs, especially the lungs (asthma, COPD). Because of reduced side effects with topical administration due to the improved pharmacokinetics (PK) characteristics, it may be possible to provide higher systemic exposures (AUCs) with topical administration, resulting in greater therapeutic efficacy than with the oral route of administration.

Methods may include admixing an additive composition with a hydrocarbon fluid, wherein the additive composition contains at least one inhibitor and at least one sub-micron particle. Additional methods may include providing an additive composition containing at least one inhibitor and at least one sub-micron particle; adding the additive composition to a fluid capable of precipitating at least one of at least of asphaltenes, wax, scale, and gas hydrates; and transporting the fluid containing the additive composition.

Methods may include admixing an additive composition with a hydrocarbon fluid, wherein the additive composition contains at least one inhibitor and at least one sub-micron particle. Additional methods may include providing an additive composition containing at least one inhibitor and at least one sub-micron particle; adding the additive composition to a fluid capable of precipitating at least one of at least of asphaltenes, wax, scale, and gas hydrates; and transporting the fluid containing the additive composition.

A method for preparing a hybrid inorganic-organic nanostructured inhibitive pigment, includes premixing a first stock solution containing one or more cations and a second stock solution containing one or more oxoanions to form a premixture under pH control in the presence of polymers as surface modifiers. The premixture is then reacted to form a slurry. The slurry is then quenched to separate nanoparticles from the slurry, followed by surface functionalization in organic inhibitors.