C09K15/32

SURFACE PROTECTION COMPOSITION AND TERMINAL FITTED ELECTRIC WIRE

Provided is a surface protection composition excellent in anticorrosion property for preventing metal corrosion as well as excellent in uniform applicability and heat resistance, and a terminal-fitted electric wire treated with the composition. The surface protection composition contains a phosphorus compound (a) represented by the general formula (1) in an amount of 0.1 to 10 mass % in terms of phosphorus element with respect to the total amount of the composition, at least one selected from the group consisting of a phosphorus compound (b1) represented by the general formula (2) and a carboxylic acid compound (b2) represented by the general formula (3) in an amount of 5.0 to 60 mass % with respect to the total amount of the composition, a metal-containing compound (c) in an amount of 0.1 to 10 mass % in terms of metal element with respect to the total amount of the composition, and a lubricant base oil (d).

POLYMERIC AGENTS AND COMPOSITIONS FOR INHIBITING CORROSION

The present disclosure is directed to processes, compositions and agents for inhibiting corrosion in various substrates, for example metal substrates. The present disclosure is also directed to corrosion inhibitors comprising organometallic polymers such as metal-organic frameworks (MOFs), including compositions and processes comprising MOFs for inhibiting corrosion in metal substrates.

Controlled release materials for anti-corrosion agents

Corrosion inhibitor materials are provided that release active corrosion inhibitor compounds when they are most neededin response to changes in conditions, including acid or basic pH, that cause corrosion or occur at the early stages of corrosion. The materials comprise particles that can be dispersed in paints and coatings for metals. The particles in some cases include ionic water-soluble anti-corrosion agents complexed to oppositely charged surfactants and entrapped in silica oxide or metal oxide gels.

COMPOSITION FOR WASHING PICKLED STEEL PLATE, METHOD FOR WASHING PICKLED STEEL PLATE BY USING SAME, AND STEEL PLATE OBTAINED THEREBY

A composition for washing a pickled steel plate and a method for washing a pickled steel plate using the same are provided. The composition for washing a pickled steel plate includes a phosphoric acid ester compound, an amine-based compound, sodium carbonate, ammonium acetate, ethylene diamine tetraacetic acid (EDTA) and a remainder of water, and the method for washing a pickled steel plate is performed using the same.

COMPOSITION FOR WASHING PICKLED STEEL PLATE, METHOD FOR WASHING PICKLED STEEL PLATE BY USING SAME, AND STEEL PLATE OBTAINED THEREBY

A composition for washing a pickled steel plate and a method for washing a pickled steel plate using the same are provided. The composition for washing a pickled steel plate includes a phosphoric acid ester compound, an amine-based compound, sodium carbonate, ammonium acetate, ethylene diamine tetraacetic acid (EDTA) and a remainder of water, and the method for washing a pickled steel plate is performed using the same.

SUBSTITUTED BENZOTRIAZOLE PHENOLATE SALTS AND ANTIOXIDANT COMPOSITIONS FORMED THEREFROM

A class of antioxidant compositions include benzotriazole phenolate salts with substituents either ortho to the phenol hydroxide group and/or para to the phenol hydroxide group can be prepared from substituted benzotriazole phenols. The ortho substituent group can be a simple hydrocarbon, alkoxy or amino group, or the ortho substituent group can be a linking group, linking the benzotriazole phenolate to another benzotriazole phenolate group.

SUBSTITUTED BENZOTRIAZOLE PHENOLATE SALTS AND ANTIOXIDANT COMPOSITIONS FORMED THEREFROM

A class of antioxidant compositions include benzotriazole phenolate salts with substituents either ortho to the phenol hydroxide group and/or para to the phenol hydroxide group can be prepared from substituted benzotriazole phenols. The ortho substituent group can be a simple hydrocarbon, alkoxy or amino group, or the ortho substituent group can be a linking group, linking the benzotriazole phenolate to another benzotriazole phenolate group.

Thermal stabilizer composition and synthetic resin composition comprising same

Provided are: a thermal stabilizer composition which does not generate an odor of a phosphorus-based antioxidant; and a synthetic resin composition comprising the same. The thermal stabilizer composition comprises: 100 parts by mass of a phosphorus-based antioxidant having a phosphite structure; and 0.001 to 10 parts by mass of a phenolic antioxidant having a substructure represented by the following Formula (1): ##STR00001## (wherein, R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; a represents an integer of 0 to 2; and, when a is 2, plural R.sup.3s are optionally the same or different).

STABILIZED DCD AND/OR ALKYL THIOPHOSPHORIC TRIAMIDE SOLVENT SYSTEMS AND USE IN AGRICULTURAL APPLICATIONS

An inhibitor composition contains alkyl thiophosphoric triamide (or a mixture of alkyl thiophosphoric triamide and dicyandiamide), dissolved in a liquid medium comprising at least one organic solvent, at least one amine stabilizer and, optionally, at least one dye and/or at least one odor masking agent, is useful in making fertilizer compositions and in a method of fertilizing target plants.

STABILIZER FOR THIOL-ENE COMPOSITIONS

The present invention relates to stabilizers for thiol-ene compositions and to radiation curable thiol-ene compositions based thereon. Such radiation curable compositions can advantageously be used in inks, overprint varnishes, coatings, adhesives, for the making of 3D objects and for the making of solder resist and gel nails. Provided in particular is an inhibitor system (I) for thiol-ene compositions based onat least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, at least one acidic compound (ii) having a pKa between 1 and 3, andat least one compound (iii) selected from the group consisting of phosphites and phosphonites, with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring. Also provided is an inhibitor system (II) for thiol-ene compositions based on that is based onat least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, at least one compound (iv) selected from the group consisting of spirophosphites, andoptionally, at least one acidic compound (ii) having a pKa between 1 and 3, and with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring.