Cleaning solution for cleaning and/or wetting metal surfaces, comprising at least one acid, a first surfactant, which is an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≤25° C., a second surfactant, which is selected from the group consisting of i) an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≥30° C., ii) an alkyl-polyethyleneglycol-ether having a cloud point of ≥45° C.
wherein the cloud points are determined according to European Standard EN 1890:2006, item 8.2 of German Version, with the modification that 10 wt % H.sub.2SO.sub.4 is used as solvent and that the concentration of the surfactant is 1000 mg/L.

The present invention relates to new alkaline, preferably highly alkaline, cleaning solutions comprising surfactants with improved stability and cleaning performance under such conditions. It further relates to novel surfactants.

The present invention relates to new alkaline, preferably highly alkaline, cleaning solutions comprising surfactants with improved stability and cleaning performance under such conditions. It further relates to novel surfactants.

A processing solution composition for reducing collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source and a method of forming a pattern using the same are proposed. The processing solution composition includes 0.0001 to 1 wt % of a nonionic surfactant having an HLB (Hydrophilic-Lipophilic Balance) value of 9 to 16, 0.0001 to 1 wt % of an alkaline material selected from the group consisting of tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, and mixtures thereof, and 98 to 99.9998 wt % of water, and is effective at reducing the collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source.

A processing solution composition for reducing collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source and a method of forming a pattern using the same are proposed. The processing solution composition includes 0.0001 to 1 wt % of a nonionic surfactant having an HLB (Hydrophilic-Lipophilic Balance) value of 9 to 16, 0.0001 to 1 wt % of an alkaline material selected from the group consisting of tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, and mixtures thereof, and 98 to 99.9998 wt % of water, and is effective at reducing the collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source.

The present disclosure is related to a surfactant comprising at least one C8 to C30 branched alkanol alkoxylate, a process for the preparation of the surfactant, an article comprising the surfactant, and a use of the surfactant. Also disclosed are readily biodegradable surfactants obtained from branched aliphatic alcohols and including a polyethylene oxide block.

A method for the synthesis of a substituted poly(alkylene oxide) comprises reacting a substituted alcohol of formula (1) with an alkylene oxide of formula (2) in the presence of a catalyst and under conditions effective to provide the substituted poly(alkylene oxide) of formula (3) wherein in the foregoing formulas, each R is independently hydrogen, C.sub.1-60 alkyl, or C.sub.3-12 cycloalkyl, ring A is cyclohexane or phenyl, each R.sup.1 is independently hydrogen, methyl, ethyl, propyl, butyl, hexyl, decyl, dodecyl, tetradecyl, or hexadecyl, preferably hydrogen or methyl, and n is 2 to 60.

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Disclosed herein is a solid surfactant composition including at least one polymer P1) that includes polymerized units of at least one monomer A), selected from the group consisting of α, β-ethylenically unsaturated carboxylic acids, salts of α,β-ethylenically un-saturated carboxylic acids, α, β-ethylenically unsaturated carboxylic acid anhydrides and mixtures thereof, and at least one nonionic surfactant of the general formula (I), characterized in that the solid surfactant composition has a glass transition temperature (Tg) of at least 50° C., determined by differential scanning calorimetry according to DIN EN ISO 11357-2, at a heating rate of 20 K/min. Additionally disclosed herein is a method of using the solid surfactant composition in a cleaning formulation.

Disclosed herein is a solid surfactant composition including at least one polymer P1) that includes polymerized units of at least one monomer A), selected from the group consisting of α, β-ethylenically unsaturated carboxylic acids, salts of α,β-ethylenically un-saturated carboxylic acids, α, β-ethylenically unsaturated carboxylic acid anhydrides and mixtures thereof, and at least one nonionic surfactant of the general formula (I), characterized in that the solid surfactant composition has a glass transition temperature (Tg) of at least 50° C., determined by differential scanning calorimetry according to DIN EN ISO 11357-2, at a heating rate of 20 K/min. Additionally disclosed herein is a method of using the solid surfactant composition in a cleaning formulation.

A unit dose detergent pack includes a pouch and a detergent composition encapsulated within the pouch. The detergent composition includes a surfactant component including an alcohol ethoxy sulfate having a C.sub.8-C.sub.20 backbone that is ethoxylated with from about 1 to about 10 moles of ethylene oxide and is present in an amount of from about 5 to about 30 weight percent actives, water present in a total amount of from about 5 to about 30 weight percent, and a particular tertiary amine present in an amount of at least about 0.5 weight percent actives. The detergent composition has a viscosity of less than about 5,000 cps when diluted with additional water at about a 2:1 weight ratio of the detergent composition:water. The block copolymer is incorporated as a rheology modifying agent.