Cleaning agents, preferably dishwashing detergents, in particular the automatic dishwashing detergent, having at least one low-water, preferably substantially anhydrous gel-like phase which contains at least one water-soluble zinc salt, preferably zinc sulfate and/or zinc acetate, particularly preferably zinc acetate.

This disclosure describes a composition which can provide real-time feedback during medical device cleaning or reprocessing. The composition can be used to monitor the amount of biological material cleaned from medical devices and to determine when cleaning is complete. The disclosure also relates to a method of cleaning, or assessing the cleanliness of, a medical device such as an endoscope. Cleanliness can be assessed by contacting the medical device with the composition, shining an excitation light on the composition, and measuring intensity of resulting fluorescence over time.

Improved stripper solutions for removing photoresists from substrates are provided that typically have freezing points below about 0° C. and high loading capacities. The stripper solutions comprise dimethyl sulfoxide, quaternary ammonium hydroxide, and an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to two different carbon atoms. Some formulations can additionally contain a secondary solvent. The formulations do not contain tetramethylammonium hydroxide. Methods for use of the stripping solutions are additionally provided.

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

An automatic dishwashing product comprising a bleaching agent and a compound in accordance with formula (1) or a salt or tautomer thereof, wherein A and B are independently selected from the group consisting of H, OR.sup.1, and NHR.sup.2, wherein R.sup.1 and R.sup.2 are independently selected from the group consisting of H and C.sub.1-C.sub.4 alkyl, with the proviso that A and B are not both H and are not both OH.

The invention relates to compositions, methods of manufacture, and methods for reducing metal corrosion during alkaline cleaning. In particular, the method employs an alkylamino hydroxy acid, secondary amine, or combination thereof in alkaline cleaning of hard surfaces.

Warewash detergent compositions with reducing agents to overcome corrosion challenges in stainless steel dish machines subject to conditions from chlorine sanitizing rinse steps (or other oxidizing chlorine containing compositions) are provided. Liquid and solid detergent composition beneficially containing a reducing agent that reacts with chlorine introduced in sanitizing rinse steps that follow detergent cleaning steps are provided. Methods for ware washing using the detergent compositions with reducing agents and methods for reducing residual chlorine in a ware washing cycle are also provided.

The present invention provides: a rust inhibitor that has excellent rust inhibiting and anti-corrosive properties, not only on iron members, but also on non-iron metal members, and can prevent rust and corrosion over long periods; a rust inhibitor composition that contains the rust inhibitor, a coating formation material; a coating obtained from the rust inhibitor, the rust inhibitor composition, or the coating formation material; and a metal component that comprises the coating. This rust inhibitor contains at least one compound represented by a Chemical Formula (1). ##STR00001##
(In the formula: R.sup.1 is a hydrogen atom or an aliphatic hydrocarbon group with a carbon number of 1-33; R.sup.2 is an aliphatic hydrocarbon group with a carbon number of 1-33; the total carbon number of R.sup.1 and R.sup.2 is 1-34; X is a single bond or an aliphatic hydrocarbon group with a carbon number of 1-5; either A.sup.1 or A.sup.2 is —OH; and the other is —O—CH.sub.2—CH(OH)—CH.sub.2OH or —O—CH(—CH.sub.2—OH).sub.2.)

A cleaning composition for removing post-etch or post-ash residues from a semiconductor substrate, and a cleaning method using the same are disclosed. The cleaning composition can comprise water; a fluorine compound; an alkanolamine compound; and a corrosion inhibitor. The corrosion inhibitor is a mixture of a first corrosion inhibitor and a second corrosion inhibitor. When using the cleaning composition, it is possible to efficiently remove the residues of various aspects existing on a surface of the substrate or the semiconductor device without damage to a substrate or a semiconductor device including various metal layers, insulating layers, etc. Accordingly, when a highly integrated and miniaturized semiconductor device is manufactured, it may be advantageously applied to the removal of residues generated on the surface of the substrate or the semiconductor device.

A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10.sup.−10 to 1.0×10.sup.−4.