C11D3/18

Natural oil based cleaners

A composition suitable for cleaning hard surfaces comprising a natural oil solvent and a natural oil thickener is provided.

MICROEMULSION COMPRISING QUATERNARY AMMONIUM COMPOUND, ESPECIALLY FOR PRODUCTION OF FABRIC SOFTENER FORMULATIONS

The invention provides for the use of specific microemulsions comprising quaternary ammonium compounds for production of clear fabric softener formulations having improved performance properties, and also the corresponding formulations and a process for production thereof.

ANTI-VIRAL ECO-FRIENDLY COMPOSITIONS
20200283700 · 2020-09-10 ·

The present invention relates to Eco-friendly compositions for domestic and industrial applications as well as cleaning materials and detergents. In particular, the present invention relates to non-toxic green naval compositions including: about 1.0% to about 5.0% of Sodium Carbonate, about 0.1% to about 6.0% Potassium Hydroxide, up to 1.0% D-Limonene, and about to 1.5% to about 6.0% Alkyl Polyglycosides.

STABILIZING SYSTEM FOR LAUNDRY EMULSIONS

Improved liquid detergent concentrate compositions which are phosphorus free and utilize an acrylic copolymer to provide improved stability while maintaining viscosity are provided. Methods of using the same to wash textiles are also provided. The improved liquid detergent composition may be provided in the form of the concentrated emulsion or a use solution; and where the concentrated emulsion can be a water-in-oil emulsion or oil-in-water emulsion dependent on the amounts of water and oil in the emulsion.

Wash oil for use as an antifouling agent in gas compressors

The present invention relates to wash oil for use as an antifouling agent in gas compressors, in particular in cracked gas compressors, including at least one compound according to formulae (II) ##STR00001## with the moieties R.sup.2 and R.sup.3 are selected from a group of linear or branched C.sub.1-C.sub.20-alkyl, C.sub.3-C.sub.10-cycloalkyl and linear or branched C.sub.1-C.sub.10-alkyl substituted C.sub.3-C.sub.10-cycloalkyl and C.sub.6-C.sub.12 aryl and C.sub.1-C.sub.10-alkyl substituted C.sub.6-C.sub.12 aryl. The moieties can be interrupted by oxygen or nitrogen. The moieties can be functionalised with hydroxyl groups or amino groups. The moieties can be the same or different. The invention relates also to the use of such wash oil as anti-fouling agent.

Cleaning gel with glycine betaine ester and nonionic surfactant mixture

Provided are self-adhering cleaning compositions that may include (a) an adhesion promoter, (b) a glycine betaine ester, and (c) water. Commonly, the adhesion promoter may include at least one compound including one or more polyalkoxy groups and the glycine betaine ester may be a compound of formula (I): Me.sub.3N.sup.+CH.sub.2C(O)OR X.sup. (I) wherein R is an aliphatic group having 8 to 22 carbon atoms and X represents an inorganic or organic anion. Typically, the composition is a gel and may have a gel melt temperature of about 55-80 C., a viscosity at 25 C. of at least about 150,000 cP, and/or a hardness of at least about 150 g. Methods for treating a hard surface, such as a toilet bowl, using the self-adhering cleaning compositions are also provided.

Cleaning gel with glycine betaine ester and nonionic surfactant mixture

Provided are self-adhering cleaning compositions that may include (a) an adhesion promoter, (b) a glycine betaine ester, and (c) water. Commonly, the adhesion promoter may include at least one compound including one or more polyalkoxy groups and the glycine betaine ester may be a compound of formula (I): Me.sub.3N.sup.+CH.sub.2C(O)OR X.sup. (I) wherein R is an aliphatic group having 8 to 22 carbon atoms and X represents an inorganic or organic anion. Typically, the composition is a gel and may have a gel melt temperature of about 55-80 C., a viscosity at 25 C. of at least about 150,000 cP, and/or a hardness of at least about 150 g. Methods for treating a hard surface, such as a toilet bowl, using the self-adhering cleaning compositions are also provided.

Detergent composition in the form of a sheet
10717954 · 2020-07-21 · ·

The present invention describes a detergent composition in the form of a flexible sheet, which in turn is soluble in water, and the water-soluble detergent sheet. Said detergent composition in the form of a flexible sheet comprises a unique mixture of components, including: a water-soluble polymeric component, an anionic surfactant, a non-ionic surfactant, water and other components. Once mixed in the appropriate proportions, the components produce a flexible sheet with detergent characteristics that can be incorporated directly into a clothes-washing recipient, said recipient ranging from a simple bowl to an advanced automatic washing machine. Once the detergent sheet comes into contact with water inside the washing recipient, the sheet dissolves and releases the active ingredients and complementary ingredients contained therein.

Detergent composition in the form of a sheet
10717954 · 2020-07-21 · ·

The present invention describes a detergent composition in the form of a flexible sheet, which in turn is soluble in water, and the water-soluble detergent sheet. Said detergent composition in the form of a flexible sheet comprises a unique mixture of components, including: a water-soluble polymeric component, an anionic surfactant, a non-ionic surfactant, water and other components. Once mixed in the appropriate proportions, the components produce a flexible sheet with detergent characteristics that can be incorporated directly into a clothes-washing recipient, said recipient ranging from a simple bowl to an advanced automatic washing machine. Once the detergent sheet comes into contact with water inside the washing recipient, the sheet dissolves and releases the active ingredients and complementary ingredients contained therein.

PHOTORESIST PATTERN SHRINKING COMPOSITION AND PATTERN SHRINKING METHOD
20200110339 · 2020-04-09 ·

Provided is a composition for shrinking a photoresist pattern, which is capable of shrinking a photoresist pattern using a photoresist during the fabrication of a semiconductor, and to a method of shrinking a pattern using the composition, whereby a pattern to be formed can be shrunken in a photoresist-patterning process, thus remarkably decreasing the number of steps of a semiconductor fabrication process and reducing the fabrication time and costs.