A cleaning composition for a semiconductor substrate contains a solvent, and a polymer that includes a fluorine atom, a silicon atom or a combination thereof. The content of water in the solvent is preferably no greater than 20% by mass. The cleaning composition preferably further contains an organic acid which is a non-polymeric acid. The organic acid is preferably a polyhydric carboxylic acid. The acid dissociation constant of the polymer is preferably less than that of the organic acid. The solubility of the organic acid in water at 25° C. is preferably no less than 5% by mass. The organic acid is preferably a solid at 25° C.

The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120° F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed.

The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120° F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed.

A viscoelastic, solid surfactant composition, containing, (i) a total amount of 0.1 to 70 wt % of at least one surfactant, (ii) a total amount of more than 1 wt % of at least one benzylidene alditol compound of formula (I), and (iii) water, is a readily soluble, aesthetically pleasing and storage-stable form of a solid composition for providing surfactant-containing liquors.

The present invention relates to a composition for reducing malodor, preferably a musty and/or mouldy malodor, methods for producing such a composition and the use of such a composition. Furthermore, the present invention relates to preparations containing such a composition, methods for producing such preparations and their use. The composition comprises the combination of 2-benzylheptanol (jasmol) with a compound selected from (I) 3,5-di-ter-butyl-4-hydroxytoluol (BHT), (II) octadecyl di-ter-butyl-4-hydroxy-hydrocinnamate (Tinogard TS) and (III) pentaerythrityl tetra-di-ter-butyl hydroxyhydrocinnamate (Tinogard TT).

The present invention relates to a composition for reducing malodor, preferably a musty and/or mouldy malodor, methods for producing such a composition and the use of such a composition. Furthermore, the present invention relates to preparations containing such a composition, methods for producing such preparations and their use. The composition comprises the combination of 2-benzylheptanol (jasmol) with a compound selected from (I) 3,5-di-ter-butyl-4-hydroxytoluol (BHT), (II) octadecyl di-ter-butyl-4-hydroxy-hydrocinnamate (Tinogard TS) and (III) pentaerythrityl tetra-di-ter-butyl hydroxyhydrocinnamate (Tinogard TT).

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desireable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

An anti-microbial laundry detergent composition comprising an anti-microbial agent that is a diphenyl ether, an organic acid and an anionic surfactant comprising a C.sub.6-C.sub.20 linear alkylbenzene sulfonate, wherein the composition has a neat pH of from 1.5 to 5.0.

Disclosed is a composition for removing polymers. The composition contains a fluorinated alkyl compound, a polar aprotic solvent, and an acyclic secondary or tertiary amine compound.

The invention provides a cleaning agent composition for use in removal of, for example, a polysiloxane adhesive. The composition contains a quaternary ammonium salt, an etching rate enhancer formed of an amphoteric surfactant, and an organic solvent.