Liquid peroxycarboxylic acid laundry compositions, namely bleaching and disinfecting compositions combining mixed peroxycarboxylic acids to provide synergistic efficacy are disclosed. Methods of using the liquid peroxycarboxylic acid laundry compositions for low temperatures and a use pH with detergent and water from about 6 to about 10 are also disclosed. Beneficially, the liquid peroxycarboxylic acid laundry compositions and methods of using the same do not include sulfonated peroxycarboxylic acids and sulfonated carboxylic acid, such as peroxy sulfonated oleic acid/sulfonated oleic acid (PSOA/SOA).

Cleaning systems employing detergent compositions in combination with builders comprising alkalinity and chelants are provided. The detergent compositions include amine oxide surfactant and alcohol ethoxylate surfactant blends having a mixture of chain lengths and branching provided. The detergent compositions are particularly efficacious for flexible cleaning systems for cosmetic and other soils as they provide the benefit of separate dosing of surfactants in the detergent from alkalinity sources in a builder composition. Methods of using the detergent compositions and/or the cleaning systems are provided.

Phosphate-free dishwasher detergents which contain a builder, bleaching agents, a nonionic surfactant, and also a) a copolymer comprising i) sulfonic acid group-containing monomers, ii) further ionic and/or nonionic monomers, b) methyl glycine diacetic acid. The detergents according to the invention have good cleaning and rinsing results which are comparable to those of phosphate-containing dishwasher detergents or even outdo them.

A neutral or acidic automatic dishwashing detergent composition including a pH regulator system and a cleaning agent selected from the group consisting of cleaning surfactants, soil suspending polymers and mixtures thereof wherein the weight ratio of the pH regulator system to the cleaning agent is from 3:1 to 1:1 system and wherein the detergent composition includes from 0.01% to 5% by weight of the composition of a perfume.

A neutral or acidic automatic dishwashing detergent composition including inorganic bleach, enzymes and a cleaning agent selected from the group consisting of cleaning surfactants, soil suspending polymers and mixtures thereof and from 0.01% to 5% by weight of the composition of a perfume and wherein the composition has a cleaning index of at least 60 and a care index of at least 4 as defined herein.

The present invention relates to an aqueous composition for removing soils from a surface to be cleaned, formed from water, a detergent mixture and a rinse aid, wherein the detergent mixture comprises a peroxidation catalyst and wherein the rinse aid comprises an oxygen source. Such a composition may provide a more effective cleaning behaviour. The present invention further relates to a method for removing soil from a surface to be cleaned comprising applying to the surface to be cleaned a composition according to the invention.

The present invention relates to the use of a composition comprising specific a-amino-ketones, H.sub.2O.sub.2, a H.sub.2O.sub.2 precursor or a peracid and optionally an activator as a bleaching mixture for textile materials or dishes either manually or in an automatic washing machine or dish washer. Further aspects of the invention are the composition comprising specific a-aminoketones and H.sub.2O.sub.2, a H.sub.2O.sub.2 precursor or a peracid and a process for bleaching of stains or of soiling on textile materials or dishes in the context of a washing process either manually or in an automatic washing machine or dish washer. Also aspects of the invention are detergent formulations comprising such a composition and novel compounds.

[Problem] To provide a liquid cleaning composition for removing a titanium nitride hard mask while suppressing damage to copper, a copper alloy, cobalt or a cobalt alloy upon fabricating a semiconductor device, a cleaning method using the same, and a method for fabricating a semiconductor device.

[Solution] A liquid cleaning composition of the present invention used for fabricating a semiconductor device comprises hydrogen peroxide at 1-30% by mass, potassium hydroxide at 0.01-1% by mass, aminopolymethylene phosphoric acid at 0.0001-0.05% by mass, a compound having a group 13 element at 0.00005-0.5% by mass and water.

Stabilized peroxide-containing compositions stabilized with urea and urea/chelator stabilizer blends are provided. The compositions are particularly suitable for, but not limited to, cleaning applications on surfaces within food and beverage industries which may require the use of materials that are acceptable for incidental food/food products/feed contact. Further, the stabilized compositions are particularly suitable for applications requiring materials that are generally regarded as safe (GRAS) or for applications where non-GRAS materials must be minimized. Methods of stabilizing peroxide-containing compositions and methods of using the compositions are also provided.

A peracid bleaching species is formed in situ in aqueous wash liquor by reaction of a peroxygen bleach precursor, such as perborate or percarbonate, and a bleach activator. The bleach activator is an acetylated ethylene diamine, that comprises at least 25% triacetyl ethylene diamine. The peracid is formed more rapidly even at low temperatures (F2) compared to use of conventional pure tetracetyl ethylene diamine (F1) and better disinfectant properties result.