A transportable system for creating an oxidation reduction potential (ORP) in water employs a pipe assembly for in-line mixing. The pipe assembly includes a first flow path for water to flow through. The first flow path includes one or more ozone intake ports that are fluidically coupled to one or more ozone output ports of an ozone supply unit. The pipe assembly further includes a second flow path fluidically coupled in parallel with the first flow path. The second flow path includes a control valve that selectively permits a portion of the water to flow through the second flow path to produce a negative pressure in the first flow path so that ozone is drawn into the first flow path through the one or more ozone intake ports and mixed into the water flowing through the first flow path.

A transportable system for creating an oxidation reduction potential (ORP) in water employs a pipe assembly for in-line mixing. The pipe assembly includes a first flow path for water to flow through. The first flow path includes one or more ozone intake ports that are fluidically coupled to one or more ozone output ports of an ozone supply unit. The pipe assembly further includes a second flow path fluidically coupled in parallel with the first flow path. The second flow path includes a control valve that selectively permits a portion of the water to flow through the second flow path to produce a negative pressure in the first flow path so that ozone is drawn into the first flow path through the one or more ozone intake ports and mixed into the water flowing through the first flow path.

A composition including hydrogen peroxide is provided, which can be used for semiconductor device manufacturing and which exhibits an excellent storage stability and has a reduced effect of defects on a semiconductor substrate. Further, a method is provided for producing the composition including hydrogen peroxide, and a composition reservoir for storing the composition. The composition includes hydrogen peroxide, an acid, and an Fe component, in which the content of the Fe component is 10.sup.−5 to 10.sup.2 in terms of mass ratio with respect to the content of the acid.

A composition including hydrogen peroxide is provided, which can be used for semiconductor device manufacturing and which exhibits an excellent storage stability and has a reduced effect of defects on a semiconductor substrate. Further, a method is provided for producing the composition including hydrogen peroxide, and a composition reservoir for storing the composition. The composition includes hydrogen peroxide, an acid, and an Fe component, in which the content of the Fe component is 10.sup.−5 to 10.sup.2 in terms of mass ratio with respect to the content of the acid.

Dilute chemical solution production device has a plunger pump and a chemical solution supply pipe that supply a chemical solution from a chemical solution reservoir. The end of the chemical solution supply pipe serves as an injection point for the chemical solution. The chemical solution supply pipe is inserted to an approximately central position in the radial direction of an ultrapure water passage, which is a first pipe, via a bore-through joint. Conductivity meter as a conductivity measuring means is provided on the downstream side of the bore-through joint, which serves as the injection point, and is connected to the previously described control means so that the plunger pump can be controlled in accordance with the measured value of the conductivity meter. The dilute chemical solution production device is capable of producing, with a simple structure, a dilute chemical solution having an extremely low concentration of acid/alkali or the like.

Dilute chemical solution production device has a plunger pump and a chemical solution supply pipe that supply a chemical solution from a chemical solution reservoir. The end of the chemical solution supply pipe serves as an injection point for the chemical solution. The chemical solution supply pipe is inserted to an approximately central position in the radial direction of an ultrapure water passage, which is a first pipe, via a bore-through joint. Conductivity meter as a conductivity measuring means is provided on the downstream side of the bore-through joint, which serves as the injection point, and is connected to the previously described control means so that the plunger pump can be controlled in accordance with the measured value of the conductivity meter. The dilute chemical solution production device is capable of producing, with a simple structure, a dilute chemical solution having an extremely low concentration of acid/alkali or the like.

An air scrubber system including a system for creating an oxidation reduction potential (ORP) in water is disclosed. The system includes a pipe assembly for in-line mixing. The pipe assembly includes a first flow path for water to flow through. The first flow path includes one or more ozone intake ports that are fluidically coupled to one or more ozone output ports of an ozone supply unit. The pipe assembly further includes a second flow path fluidically coupled in parallel with the first flow path. The second flow path includes a control valve that selectively permits a portion of the water to flow through the second flow path to produce a negative pressure in the first flow path so that ozone is drawn into the first flow path through the one or more ozone intake ports and mixed into the water flowing through the first flow path.

An air scrubber system including a system for creating an oxidation reduction potential (ORP) in water is disclosed. The system includes a pipe assembly for in-line mixing. The pipe assembly includes a first flow path for water to flow through. The first flow path includes one or more ozone intake ports that are fluidically coupled to one or more ozone output ports of an ozone supply unit. The pipe assembly further includes a second flow path fluidically coupled in parallel with the first flow path. The second flow path includes a control valve that selectively permits a portion of the water to flow through the second flow path to produce a negative pressure in the first flow path so that ozone is drawn into the first flow path through the one or more ozone intake ports and mixed into the water flowing through the first flow path.

A toilet that includes a tank configured to hold water from a water supply; a reservoir fluidly connected to the tank and configured to hold a cleaning compound comprising a chemical compound and water from the water supply; and an actuator configured to control a flush cycle of the toilet upon a first activation, the actuator including at least one nozzle fluidly connected to the reservoir and configured to discharge an amount of the cleaning compound external to the tank upon at least one of the first activation or a second activation.

A toilet that includes a tank configured to hold water from a water supply; a reservoir fluidly connected to the tank and configured to hold a cleaning compound comprising a chemical compound and water from the water supply; and an actuator configured to control a flush cycle of the toilet upon a first activation, the actuator including at least one nozzle fluidly connected to the reservoir and configured to discharge an amount of the cleaning compound external to the tank upon at least one of the first activation or a second activation.