C11D7/20

METHOD AND COMPOSITION
20220010241 · 2022-01-13 ·

A method for removing grease, oil or fat from a floor comprises applying expanded perlite particles in dry form to the floor and brushing said perlite across the affected area to strip or scour the grease, oil or fat, without applying water. The particle size of the perlite may be small, for example it may be the case that at least 90% by weight of the perlite has a particle size of less than 700 microns or less than 200 microns.

Delivery systems for peroxide compounds and their applications
11655437 · 2023-05-23 · ·

A peroxide delivery system is produced. The peroxide delivery system includes a dry powder that releases the peroxide quickly and completely when needed. The peroxide delivery system may be produced by combining a liquid peroxide or peroxide solution with an inorganic solid support that is inert to the peroxide and is capable of adsorbing large amounts of the liquid peroxide or peroxide solution while remaining dry to the touch. Methods of combining the inorganic solid support with the liquid peroxide or peroxide solution are disclosed. The peroxide delivery system can be formulated in preparations of powders, liquids, foams, sprays, gels, ointments, creams, sticks, or pastes that can be utilized in a variety of applications such as cleaning, stain removal and antiseptic products, for example.

Delivery systems for peroxide compounds and their applications
11655437 · 2023-05-23 · ·

A peroxide delivery system is produced. The peroxide delivery system includes a dry powder that releases the peroxide quickly and completely when needed. The peroxide delivery system may be produced by combining a liquid peroxide or peroxide solution with an inorganic solid support that is inert to the peroxide and is capable of adsorbing large amounts of the liquid peroxide or peroxide solution while remaining dry to the touch. Methods of combining the inorganic solid support with the liquid peroxide or peroxide solution are disclosed. The peroxide delivery system can be formulated in preparations of powders, liquids, foams, sprays, gels, ointments, creams, sticks, or pastes that can be utilized in a variety of applications such as cleaning, stain removal and antiseptic products, for example.

SUSPENSION CLEANING

A method of cleaning a contaminated surface, such as cleaning the elongate interior lumen of an endoscope contaminated with flesh, bone, blood, mucous, faeces or biofilm, said method comprising the steps of: providing a suspension of solid particles in a liquid to said contaminated surface, and flowing said suspension along said surface thereby to remove contaminant from the surface. The suspension is preferably a paste, where the solid material may be e.g. crystals of a salt, silicon oxide or organic material. The paste preferably has a solid fraction between 5 and 55%. A rheology modifier may be present.

SUSPENSION CLEANING

A method of cleaning a contaminated surface, such as cleaning the elongate interior lumen of an endoscope contaminated with flesh, bone, blood, mucous, faeces or biofilm, said method comprising the steps of: providing a suspension of solid particles in a liquid to said contaminated surface, and flowing said suspension along said surface thereby to remove contaminant from the surface. The suspension is preferably a paste, where the solid material may be e.g. crystals of a salt, silicon oxide or organic material. The paste preferably has a solid fraction between 5 and 55%. A rheology modifier may be present.

TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMOVING RESIST
20220260919 · 2022-08-18 · ·

A treatment liquid for a semiconductor device includes an alkanolamine; a hydroxylamine; an organic solvent; Ca; Fe; and Na, wherein the content of the alkanolamine in the treatment liquid is 0.1% to 5% by mass, the content of the hydroxylamine in the treatment liquid is 0.1% to 30% by mass, and each of the mass ratio of Ca, Fe, and Na with respect to the content of the alkanolamine and the hydroxylamine in the treatment liquid is 10.sup.−12 to 10.sup.−4.

TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMOVING RESIST
20220260919 · 2022-08-18 · ·

A treatment liquid for a semiconductor device includes an alkanolamine; a hydroxylamine; an organic solvent; Ca; Fe; and Na, wherein the content of the alkanolamine in the treatment liquid is 0.1% to 5% by mass, the content of the hydroxylamine in the treatment liquid is 0.1% to 30% by mass, and each of the mass ratio of Ca, Fe, and Na with respect to the content of the alkanolamine and the hydroxylamine in the treatment liquid is 10.sup.−12 to 10.sup.−4.

SYSTEM AND METHODS FOR SELECTIVE CLEANING OF TURBINE ENGINE COMPONENTS

System for selectively contacting a cleaning composition with a surface of a turbine engine component is presented. The system includes a cleaning apparatus and a manifold assembly. The cleaning apparatus includes an upper portion and a lower portion defining a cleaning chamber configured to allow selective contact between the cleaning composition and a surface of the first portion of the turbine engine component. The upper portion includes a plurality of fill holes in fluid communication with the cleaning chamber, and the lower portion includes a plurality of drain holes in fluid communication with the cleaning chamber. The manifold assembly is configured to selectively circulate the cleaning composition from a reservoir to the cleaning chamber via the plurality of fill holes, and recirculate the cleaning composition from the cleaning chamber to the reservoir via the plurality of drain holes. Methods for selectively cleaning a turbine engine component is also presented.

Composition for surface treatment, method for producing the same, and surface treatment method using the same

The present invention provides a means by which it is possible to sufficiently suppress an organic residue while favorably decreasing a ceria residue on a polished object to be polished obtained after being polished using a polishing composition containing ceria. The present invention relates to a composition for surface treatment, which is for a surface treatment of a polished object to be polished obtained after being polished using a polishing composition containing ceria, contains a carboxy group-containing (co)polymer having a structural unit derived from a monomer having a carboxy group or a salt group of the carboxy group, a SO.sub.x or NO.sub.y partial structure-containing compound having a partial structure represented by SO.sub.x or NO.sub.y (where x and y each independently denote a real number 1 to 5), and a dispersing medium, and has a pH of 1 or more and 8 or less.

Composition for surface treatment, method for producing the same, and surface treatment method using the same

The present invention provides a means by which it is possible to sufficiently suppress an organic residue while favorably decreasing a ceria residue on a polished object to be polished obtained after being polished using a polishing composition containing ceria. The present invention relates to a composition for surface treatment, which is for a surface treatment of a polished object to be polished obtained after being polished using a polishing composition containing ceria, contains a carboxy group-containing (co)polymer having a structural unit derived from a monomer having a carboxy group or a salt group of the carboxy group, a SO.sub.x or NO.sub.y partial structure-containing compound having a partial structure represented by SO.sub.x or NO.sub.y (where x and y each independently denote a real number 1 to 5), and a dispersing medium, and has a pH of 1 or more and 8 or less.