C11D7/20

DELIVERY SYSTEMS FOR PEROXIDE COMPOUNDS AND THEIR APPLICATIONS
20200299621 · 2020-09-24 ·

A peroxide delivery system is produced. The peroxide delivery system includes a dry powder that releases the peroxide quickly and completely when needed. The peroxide delivery system may be produced by combining a liquid peroxide or peroxide solution with an inorganic solid support that is inert to the peroxide and is capable of adsorbing large amounts of the liquid peroxide or peroxide solution while remaining dry to the touch. Methods of combining the inorganic solid support with the liquid peroxide or peroxide solution are disclosed. The peroxide delivery system can be formulated in preparations of powders, liquids, foams, sprays, gels, ointments, creams, sticks, or pastes that can be utilized in a variety of applications such as cleaning, stain removal and antiseptic products, for example.

CLEANING AGENT FOR MOLDING-MACHINE CLEANING AND CLEANING METHOD
20200282606 · 2020-09-10 ·

The object of the present invention is to provide a cleaning agent that is superior in the initial cleaning effect and allows residues to be easily distributed evenly in the next fabricated molded article. The object is achieved by a cleaning agent used for a molding machine and including a thermoplastic resin and a glass wool.

CLEANING AGENT FOR MOLDING-MACHINE CLEANING AND CLEANING METHOD
20200282606 · 2020-09-10 ·

The object of the present invention is to provide a cleaning agent that is superior in the initial cleaning effect and allows residues to be easily distributed evenly in the next fabricated molded article. The object is achieved by a cleaning agent used for a molding machine and including a thermoplastic resin and a glass wool.

Cleaning compositions for removing residues on semiconductor substrates

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one water soluble organic solvent; 3) at least one metal-containing additive; 4) at least one cyclic amine, and 5) water.

Cleaning compositions for removing residues on semiconductor substrates

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one water soluble organic solvent; 3) at least one metal-containing additive; 4) at least one cyclic amine, and 5) water.

NAIL POLISH REMOVING COMPOSITION

The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.

POLYORGANOSILOXANE-COATED AND/OR AMORPHOUS SILICON DIOXIDE-COATED TEXTILE LAUNDRY ARTICLE
20200115659 · 2020-04-16 ·

A coated textile laundry article may include a water-insoluble textile substrate that is exposed to at least one modified or unmodified polyorganosiloxane and/or at least one amorphous silicon dioxide. Furthermore, the coated textile laundry article may be used for washing laundry and/or to prevent graying of laundry. A method for machine or manual washing of laundry using the coated textile laundry article and a method for its preparation is also described.

Cleaning formulations for removing residues on semiconductor substrates

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 3) at least one metal-containing additive; and 4) water.

Cleaning formulations for removing residues on semiconductor substrates

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 3) at least one metal-containing additive; and 4) water.

CLOTHING AROMA-ENHANCING BEAD COMPOSITION AND METHOD FOR PREPARING SAME

A clothing aroma-enhancing bead composition and a method for preparing same are provided. The clothing aroma-enhancing bead composition includes the following raw materials in percentage by weight: 60-95% of sugar granules, 1.0-20% of liquid essence, and 0.5-20% of silica. The clothing aroma-enhancing bead composition takes the sugar granules as a core, and surfaces of the sugar granules are coated with the liquid essence and the silica. The clothing aroma-enhancing bead composition is attractive in appearance, good in solubility, and simple in production process.