C11D7/28

Moderately alkaline cleaning compositions for proteinaceous and fatty soil removal at low temperatures

The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120° F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed.

HYDROCHLOROFLUOROOLEFINS AND METHODS OF USING SAME

A composition including a compound having structural formula (I): R.sub.f is a linear or branched perfluoroalkyl group having 1-3 atoms; n is 0-2; x is 1-3; and R.sub.f′ and R.sub.f″ are (i) independently, a linear or branched perfluoroalkyl group having 1-8 carbon atoms; or (ii) are bonded together to form a ring structure having 4-8 carbon atoms. The composition further includes a hydrocarbon contaminant.

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HYDROCHLOROFLUOROOLEFINS AND METHODS OF USING SAME

A composition including a compound having structural formula (I): R.sub.f is a linear or branched perfluoroalkyl group having 1-3 atoms; n is 0-2; x is 1-3; and R.sub.f′ and R.sub.f″ are (i) independently, a linear or branched perfluoroalkyl group having 1-8 carbon atoms; or (ii) are bonded together to form a ring structure having 4-8 carbon atoms. The composition further includes a hydrocarbon contaminant.

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CLEANING SOLVENT COMPOSITIONS EXHIBITING AZEOTROPE-LIKE BEHAVIOR AND THEIR USE
20220056368 · 2022-02-24 · ·

An azeotropic cleaning solvent composition has from about 96 to about 98 weight percent 1,1,1,3,3,3-hexafluoro-2-methoxypropane (“HFMOP”) and from about 2 to about 4 weight percent acetone, for example, about 97 weight percent HFMOP and about 3 weight percent acetone. Another composition of the invention has a weight ratio of HFMOP to acetone of about 24 to about 99, for example, about 24 to 49. Conventional additives such as surfactants, lubricants and co-solvents may be present in an amount not to exceed about 10 weight percent of the composition. A method of the invention comprises contacting an article of manufacture with the solvent composition in order to clean the article of manufacture and then removing the solvent composition from the article of manufacture.

Moderately alkaline cleaning compositions for proteinaceous and fatty soil removal at low temperatures

The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120° F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed.

Moderately alkaline cleaning compositions for proteinaceous and fatty soil removal at low temperatures

The present invention comprises chlorinated and non-chlorinated alkaline cleaning compositions for removal of proteinaceous and fatty soils at low temperature, i.e. less than 120° F., with little or no deleterious affect on cleaning performance. According to the invention, applicants have found that adding additional alkalinity makes protein removal more difficult and reducing the amount of alkalinity actually improves performance. According to the invention optimized combinations of chlorine and alkalinity components for low temperature cleaning as well as a surfactant system optimized for low temperature fatty soil removal are disclosed.

DETERGENT COMPOSITION, SUBSTRATE CLEANING METHOD, AND CLEANING METHOD FOR SUPPORT OR SUBSTRATE

A detergent composition is a detergent composition for removing temporary adhesive containing a silicone compound that is present on a substrate. The detergent composition contains: (A) an organic solvent: 75 to 99 parts by mass; (B) water: 0 to 5 parts by mass; and (C) an ammonium salt: 1 to 20 parts by mass (where (A)+(B)+(C)=100 parts by mass). The organic solvent does not contain an organic solvent having a hydroxy group and contains, in 100 parts by mass of the organic solvent, 50 parts by mass or more of an organic solvent having a heteroatom. The ammonium salt contains at least one kind of a hydroxide ion, a fluoride ion, and a chloride ion.

Aqueous composition and cleaning method using same

An aqueous composition may include: (A) a fluoride ion supply source in an amount that gives a fluoride ion concentration of 0.05 to 30 mmol/L in the composition; (B) a cation supply source in an amount that gives a mole ratio of cations of 0.3 to 20 to the fluoride ions in the composition; and (C) 0.0001 to 10 mass % of one or more compounds selected from a C.sub.4-13 alkylphosphonic acid, a C.sub.4-13 alkylphosphonate ester, a C.sub.4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the composition, wherein pH is in a range of from 2 to 6.

Aqueous composition and cleaning method using same

An aqueous composition may include: (A) a fluoride ion supply source in an amount that gives a fluoride ion concentration of 0.05 to 30 mmol/L in the composition; (B) a cation supply source in an amount that gives a mole ratio of cations of 0.3 to 20 to the fluoride ions in the composition; and (C) 0.0001 to 10 mass % of one or more compounds selected from a C.sub.4-13 alkylphosphonic acid, a C.sub.4-13 alkylphosphonate ester, a C.sub.4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the composition, wherein pH is in a range of from 2 to 6.

Treatment liquid, method for washing substrate, and method for removing resist

A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10.sup.−10 to 1.0×10.sup.−4.