A composition for surface treatment according to the present invention is used for treating the surface of an object to be polished after polishing, the composition for surface treatment including: a water-soluble polymer having a constituent unit derived from glycerin; an acid; and water, wherein the composition for surface treatment has a pH of 5 or lower.

Described are methods for removing abrasive particles from a polymeric surface, such as from a polymeric surface of a cleaning brush used in a post chemical-mechanical processing cleaning step, as well as related cleaning solutions.

Described are methods for removing abrasive particles from a polymeric surface, such as from a polymeric surface of a cleaning brush used in a post chemical-mechanical processing cleaning step, as well as related cleaning solutions.

The present disclosure provides derivatives of amino acids that have surface-active properties. The amino acid can be naturally-occurring or synthetic, or they may be obtained via a ring-opening reaction of a lactam, such as caprolactam. The amino acid may be functionalized to form a compound that is surface-active and have advantageous surfactant characteristics. The compounds of the present disclosure have low critical micelle concentrations (CMC) as well as superior ability to lower the surface tension of a liquid.

The present invention relates to a composition, preferably a laundry detergent composition or a laundry additive composition, comprising at least one bleaching agent, at least one bleach activator, at least one oxygen transfer agent, and at least one protease, wherein: the composition comprises between 20 wt. % and 50 wt. % of said at least one bleaching agent, based on the total weight of the composition; and the composition comprises between 0.001 wt. % and 2 wt. % of said at least one oxygen transfer agent, based on the total weight of the composition, wherein said at last one oxygen transfer agent is selected from the group comprising 3-methyl-1,2-benzisothiazol-1,1-dioxide, 1,2,3-Benzoxathiazine, 2,2-dioxide, and combinations thereof. The invention further relates to a method of a laundering a fabric in a laundry washing machine. It also relates to the use of the composition for the removal of stains, malodour removal, and preferably whiteness improvement.

The present invention provides a composition for a semiconductor device, which is excellent in residue removability. In addition, the present invention provides a substrate washing method using the treatment liquid. The composition for a semiconductor device contains alcohol, an aprotic polar solvent, an azole compound, an alkanolamine, and water.

The present invention provides a composition for a semiconductor device, which is excellent in residue removability. In addition, the present invention provides a substrate washing method using the treatment liquid. The composition for a semiconductor device contains alcohol, an aprotic polar solvent, an azole compound, an alkanolamine, and water.

Methods of removing amine contaminants from equipment used in the production of polyether polyols. These methods include: (a) contacting the equipment with an aqueous solution of a first acid; (b) discharging the aqueous solution of the first acid from the equipment; (c) contacting the equipment with an aqueous solution of an acidic metal conditioner; (d) discharging the aqueous solution of the acidic metal conditioner from the equipment; (e) contacting the equipment with an aqueous solution of an alkali metal hydroxide; and (f) discharging the aqueous solution of the alkali metal hydroxide from the equipment.

Methods of removing amine contaminants from equipment used in the production of polyether polyols. These methods include: (a) contacting the equipment with an aqueous solution of a first acid; (b) discharging the aqueous solution of the first acid from the equipment; (c) contacting the equipment with an aqueous solution of an acidic metal conditioner; (d) discharging the aqueous solution of the acidic metal conditioner from the equipment; (e) contacting the equipment with an aqueous solution of an alkali metal hydroxide; and (f) discharging the aqueous solution of the alkali metal hydroxide from the equipment.

A treatment liquid for a semiconductor device includes an alkanolamine; a hydroxylamine; an organic solvent; Ca; Fe; and Na, wherein the content of the alkanolamine in the treatment liquid is 0.1% to 5% by mass, the content of the hydroxylamine in the treatment liquid is 0.1% to 30% by mass, and each of the mass ratio of Ca, Fe, and Na with respect to the content of the alkanolamine and the hydroxylamine in the treatment liquid is 10.sup.−12 to 10.sup.−4.