The present invention provides a process for the removal of contaminants on a spent sputtering target used in Plasma Vapor Deposition by the steps of grit abrasion, organic solvent cleaning, and being subjected to an electric field in an acidic bath including a surfactant, and followed by subsequent water and air rinse and further grit abrasion. Removal of the contaminants is verified by spectroscopy.

Method and apparatus for treating dishware, in which the method comprises the steps of providing a treatment composition comprising a photoactive component, contacting in an appliance the treatment composition with the dishware, and irradiating the treatment composition with visible light. The step of irradiating the treatment composition with visible light is performed with a source of light that is tool free insertable into and removable from the appliance.

A lighted dispenser having a light housing comprising a power source and source of light conductively connected to the power source and a treatment composition reservoir operatively connected to the light housing, the reservoir having a dispensing outlet wherein the lighted dispenser is sized and dimensioned to fit within an interior portion of a washing appliance.

Systems and methods are provided for producing electrolyzed water. In exemplary embodiments, a fluid container capable of storing a brine solution therein is used. An electrolytic cell is disposed within the fluid container and in communication with the brine solution. A power source is in electrical communication with the electrolytic cell, a pump is disposed in the fluid container; as is a chlorometer. A fluid container head is in removable mechanical communication with the fluid container, the fluid container head including a nozzle in fluid communication with the pump, a trigger in electrical communication with the pump, and a power switch in communication with the power source. A controller is in communication with the chlorometer and the electrolytic cell, the controller operating the electrolytic cell to convert the brine solution to a cleaning solution.

A light activated cleaning composition comprising a photosensitizer and a singlet oxygen quenching molecule.

Methods for conditioning interior surfaces of a process chamber are provided herein. In one embodiment a method of conditioning interior surfaces of a process chamber is provided. The method comprises maintaining a process chamber at a first pressure and at a first temperature of less than about 800 degrees Celsius, providing a process gas to the process chamber at the first pressure and the first temperature, wherein the process gas comprises chlorine (Cl.sub.2) and high IR absorption gas, and exposing the process gas to radiant energy to remove residue disposed on interior surfaces of the process chamber.

An ultrasonic wave applying liquid is supplied to one principal surface of a substrate while a liquid film of a first liquid being formed on another principal surface of the substrate. The ultrasonic wave applying liquid is obtained by applying ultrasonic waves to a second liquid. Ultrasonic vibration is transmitted to the other principal surface and the liquid film, thereby ultrasonically cleaning the other principal surface. The first liquid has a higher cavitation intensity, which is a stress per unit area acting on the substrate by cavitation caused in the liquid when ultrasonic waves are transmitted to the liquid present on the principal surface of the substrate, than the second liquid.

An ultrasonic wave applying liquid is supplied to one principal surface of a substrate while a liquid film of a first liquid being formed on another principal surface of the substrate. The ultrasonic wave applying liquid is obtained by applying ultrasonic waves to a second liquid. Ultrasonic vibration is transmitted to the other principal surface and the liquid film, thereby ultrasonically cleaning the other principal surface. The first liquid has a higher cavitation intensity, which is a stress per unit area acting on the substrate by cavitation caused in the liquid when ultrasonic waves are transmitted to the liquid present on the principal surface of the substrate, than the second liquid.

A glycol ether-containing water-based composition useful for cleaning contaminants present on the surface of a substrate, such as the surface of a printed circuit board during the manufacturing process of the printed circuit board, the contaminants including for example, solder flux and photoresist on the printed circuit board; the glycol ether-containing water-based composition including: (a) at least one glycol ether having a high boiling point and a low VOC; (b) at least one organic amine; (c) at least one surfactant; and (d) water; a process for producing the above glycol ether-containing water-based composition; and a process for cleaning a printed circuit board using the above glycol ether-containing water-based composition.

The present invention is generally directed to a hydrogen peroxide-based lens care system for disinfecting contact lenses. Unlike hydrogen peroxide-based system known in the prior art, a lens care system of the present invention involves electrochemically neutralizing of hydrogen peroxide after any desired period of disinfection time for which contact lenses have been immersed in a hydrogen peroxide-based lens care solution.